Anti freeze valve apparatus and semiconductor processing device including the same and manufacturing method thereof

US12480595B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12480595-B2
Application numberUS-202217973495-A
CountryUS
Kind codeB2
Filing dateOct 25, 2022
Priority dateNov 4, 2021
Publication dateNov 25, 2025
Grant dateNov 25, 2025

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure provides a valve apparatus that prevents defects in the valve apparatus and prevents damage to the heat insulating material due to a cryogenic liquid fluid, and a semiconductor processing device including the same and a manufacturing method thereof.

First claim

Opening claim text (preview).

What is claimed is: 1 . A valve apparatus, comprising: a spring; an adjusting member that transmits force to the spring to cause the spring to contract or relax; a safety valve body configured to contract or relax with the spring; a valve piston pressurized by a movement of the safety valve body to also contract or relax with the spring; a piston ring configured to surround the valve piston; a valve housing configured to surround the adjusting member, the spring, the safety valve body, the valve piston, and the piston ring; an airtight member configured to form a sealed space that blocks penetration of external materials by surrounding the valve housing; a heat insulating material configured to surround the airtight member; a first gas supplier that supplies gas into the valve apparatus; and second gas supplier that receives the gas from the first gas supplier, wherein the valve housing is spaced apart from the airtight member and separated by the sealed space, and wherein a portion of the valve housing making up the first gas supplier and the second gas supplier is not surrounded by the airtight member such that sealed space is not formed around the first gas supplier and the second gas supplier. 2 . The valve apparatus of claim 1 , wherein the airtight member is made up of resin. 3 . The valve apparatus of claim 2 , wherein the airtight member is made up of plastic. 4 . The valve apparatus of claim 1 , wherein the heat insulating material is made up of a polystyrene material. 5 . The valve apparatus of claim 1 , further comprising: a first path within the valve housing in connection with the first gas supplier; a second path within the valve housing in connection with the second gas supplier and the first path, wherein the first path is connected to the second path based on a position of the valve piston where the first path is connected to the second path when the valve piston is in an open state and the first path is blocked from the second path when the valve piston is in a closed state; and wherein a portion of the valve housing making up the first path and the second path is not surrounded by the airtight member such that sealed space is also not formed around the first path and the second path. 6 . A valve apparatus, comprising: a spring; an adjusting member that transmits force to the spring to cause the spring to contract or relax; a safety valve body configured to contract or relax with the spring; a valve piston pressurized by a movement of the safety valve body to also contract or relax with the spring; a piston ring configured to surround the valve piston; a valve housing configured to surround the adjusting member, the spring, the safety valve body, the valve piston, and the piston ring; an airtight member configured to form a sealed space that blocks penetration of external materials by surrounding the valve housing; and a heat insulating material configured to surround the airtight member, wherein the heat insulating material is different and separate from the airtight member and an internal layer of the heat insulating material is directly attached to an external layer of the airtight member as the heat insulating material surrounds the airtight member. 7 . A valve apparatus, comprising: a spring; an adjusting member that transmits force to the spring to cause the spring to contract or relax; a safety valve body configured to contract or relax with the spring; a valve piston pressurized by a movement of the safety valve body to also contract or relax with the spring; a piston ring configured to surround the valve piston; a valve housing configured to surround the adjusting member, the spring, the safety valve body, the valve piston, and the piston ring; an airtight member configured to form a sealed space that blocks penetration of external materials by surrounding the valve housing; and a heat insulating material configured to surround the airtight member, wherein the valve housing, the airtight member, and the heat insulating material are different and separate components, and the valve piston comprises a pneumatic passage that penetrates through a body of the valve piston.

Assignees

Inventors

Classifications

  • Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

  • Means to prevent accidental or unauthorised actuation · CPC title

  • of lift valves (for reducing the flow resistance of screw-spindle lift-valves F16K1/06) · CPC title

  • one side of the piston being spring-loaded · CPC title

  • Arrangements specially adapted to local requirements at flanges, junctions, valves or the like · CPC title

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Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US12480595B2 cover?
The present disclosure provides a valve apparatus that prevents defects in the valve apparatus and prevents damage to the heat insulating material due to a cryogenic liquid fluid, and a semiconductor processing device including the same and a manufacturing method thereof.
Who is the assignee on this patent?
Semes Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/0402. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 25 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).