Polyamide resin, and polymer film, resin laminate using the same

Patent metadata

Field	Value
Publication number	US-12466917-B2
Application number	US-201916972485-A
Country	US
Kind code	B2
Filing date	Nov 1, 2019
Priority date	Nov 5, 2018
Publication date	Nov 11, 2025
Grant date	Nov 11, 2025

Abstract

The present invention relates to a polyamide resin in which an average particle size of individual crystals measured by a small-angle X-ray scattering apparatus is 8.0 nm or less, and a UV-cut slope (dT/dλ) measured for a specimen having a thickness of 45 μm or more and 55 μm or less according to ASTM E424 is 0.25 or more in the range of 10% to 80% transmittance, and a polymer film and resin laminate using the same. In addition, the present invention relates to a polyamide resin with characteristic profile in which a small-angle X-ray scattering function obtained by irradiating the polyamide resin with X-rays having an energy of 10 KeV to 20 KeV using a small-angle X-ray scattering apparatus satisfies Equation 1 and Equation 2, and a polymer film and resin laminate using the same.

First claim

The invention claimed is:

1 . A polyamide resin in which an average particle size of individual crystals measured by a small-angle X-ray scattering apparatus is 8.0 nm or less, and a UV-cut slope (dT/dλ) measured for a polyamide resin specimen having a thickness of 45 μm or more and 55 μm or less according to ASTM E424 is at least 0.25 in the range of 10% to 80% transmittance,
wherein amorphous polymer chains are present between the individual crystals having the average particle size of 8.0 nm or less,
wherein a first polyamide segment is included in the individual crystals having the average particle size of 8.0 nm or less,
wherein a second polyamide segment is included in the amorphous polymer chains present between the individual crystals having the average particle size of 8.0 nm or less, and,
wherein the first polyamide segment and the second polyamide segment form a main chain including an alternating-repeating unit represented by the following Chemical Formula 4:

in the Chemical Formula 4,
Ar 1 and Ar 2 are each independently a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, or a substituted or unsubstituted heteroarylene group having 2 to 20 carbon atoms,
a1 and a2 are each independently an integer of 1 to 10, and
b1 and b2 are each independently an integer of 1 to 5.

2 . The polyamide resin according to claim 1 , wherein
the average particle size of the individual crystals is measured through an analytical equipment by fitting a scattering pattern obtained by irradiating X-rays with energies of 10 KeV to 20 KeV in the small-angle X-ray scattering apparatus to a solid sphere model.

3 . The polyamide resin according to claim 1 , wherein
a distance between the individual crystals having the average particle size of 8.0 nm or less is 0.1 nm to 100 nm.

4 . The polyamide resin according to claim 1 , wherein
the individual crystals having the average particle size of 8.0 nm or less comprises a first polyamide segment including a repeating unit represented by the following Chemical Formula 1, or a block comprised thereof:

in the Chemical Formula 1, Ar 1 is a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, or a substituted or unsubstituted heteroarylene group having 2 to 20 carbon atoms.

5 . The polyamide resin according to claim 1 , wherein
a degree of crystallinity measured by the small-angle X-ray scattering apparatus is 20% or less.

6 . The polyamide resin according to claim 4 , wherein
amorphous polymer chains present between the individual crystals having the average particle size of 8.0 nm or less including the first polyamide segment including the repeating unit represented by the Chemical Formula 1 or the block composed thereof comprise a second polyamide segment including a repeating unit represented by the following Chemical formula 2, or a block composed thereof:

in the Chemical Formula 2,
Ar 2 is a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, or a substituted or unsubstituted heteroarylene group having 2 to 20 carbon atoms.

7 . A polyamide resin having a small-angle X-ray scattering function I(q) that satisfies the following Equation 1 and Equation 2,
wherein X-axis is a wavenumber q and Y-axis is a scattering intensity I in the small-angle X-ray scattering function I(q) and the small angle X-ray scattering function I(q) is obtained by irradiating a polyamide resin specimen having a thickness of 45 μm or more and 55 μm or less with X-rays using a small-angle X-ray scattering apparatus:
d 2 I ( q )/ dq 2 >0  [Equation 1]

in the Equation 1, 0.003 Å −1 ≤q≤0.03 Å −1 ,
I ( q )≥1 a.u.  [Equation 2]

in the Equation 2, q≥0.08 Å −1 , wherein the polyamide resin comprises a first polyamide segment including a repeating unit represented by the following Chemical Formula 1 , or a block comprised thereof,

in the Chemical Formula 1, Ar 1 is a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, or a substituted or unsubstituted heteroarylene group having 2 to 20 carbon atoms,
wherein the polyamide resin further comprises a second polyamide segment including a repeating unit represented by the following Chemical formula 2, or a block composed thereof,

in the Chemical Formula 2,
Ar 2 is a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, or a substituted or unsubstituted heteroarylene group having 2 to 20 carbon atoms, and,
wherein the first polyamide segment and the second polyamide segment form a main chain including an alternating-repeating unit represented by the following Chemical Formula 4:

in the Chemical Formula 4,
Ar 1 and Ar 2 are each independently a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, or a substituted or unsubstituted heteroarylene group having 2 to 20 carbon atoms,
a1 and a2 are each independently an integer of 1 to 10, and
b1 and b2 are each independently an integer of 1 to 5.

8 . The polyamide resin according to claim 7 , wherein
the polyamide resin further satisfies the following Equation 3 for the polyamide resin specimen having the thickness of 45 μm or more and 55 μm or less:
I (0.003 Å −1 )≥1000 a.u.  [Equation 3]

9 . The polyamide resin according to claim 7 , wherein
the polyamide resin further satisfies the following Equation 4 for the polyamide resin specimen having the thickness of 45 μm or more and 55 μm or less:
dI ( q )/ dq< 0  [Equation 4]

in the Equation 4, 0.003 Å −1 ≤q≤0.03 Å −1 .

10 . The polyamide resin according to claim 7 , wherein
the polyamide resin further satisfies the following Equation 5 for the polyamide resin specimen having the thickness of 45 μm or more and 55 μm or less:
100≤ I (0.003 Å −1 )/ I (0.08 Å −1 )≤1000.  [Equation 5]

11 . The polyamide resin according to claim 4 , wherein
the first polyamide segment has a number average molecular weight of 100 g/mol or more and 5000 g/mol or less.

12 . The polyamide resin according to claim 6 , wherein
based on the total repeating units contained in the polyamide resin, a content of the repeating units represented by Chemical Formula 1 is 60 mol % to 95 mol %, and a content of the repeating units represented by Chemical Formula 2 is 5 mol % to 40 mol %.

13 . A polymer film comprising the polyamide resin according to claim 1 .

14 . A resin laminate comprising:
a substrate including the polyamide resin according to claim 1 ; and a hard coating layer formed on at least one side of the substrate.

15 . A polymer film comprising the polyamide resin according to claim 7 .

16 . A resin laminate comprising:
a substrate including the polyamide resin according to claim 7 ; and a hard coating layer formed on at least one side of the substrate.

Assignees

• Lg Chemical Ltd

Inventors

• Choi Il Hwan
• Park Soonyong
• Ryu Bi Oh
• Tae Young Ji
• Park Youngseok

Classifications

• C08G81/00

  Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers (involving only carbon-to-carbon unsaturated bond reactions C08F299/00 {; polyester-amides C08G69/44; polyester-imides C08G73/16; polyamides-imides C08G73/14; block- or graft polymers containing polysiloxane sequences C08G77/42}) · CPC title

• C08J7/046

  Forming abrasion-resistant coatings; Forming surface-hardening coatings · CPC title

• C08J2377/10

  Polyamides derived from aromatically bound amino and carboxyl groups of amino carboxylic acids or of polyamines and polycarboxylic acids · CPC title

• C08J5/18

  Manufacture of films or sheets · CPC title

• C08G69/265

  from at least two different diamines or at least two different dicarboxylic acids · CPC title