Electromechanical responsive film, stacked arrangement and methods of forming the same

Patent metadata

Field	Value
Publication number	US-12464950-B2
Application number	US-202017623380-A
Country	US
Kind code	B2
Filing date	Jun 30, 2020
Priority date	Aug 30, 2019
Publication date	Nov 4, 2025
Grant date	Nov 4, 2025

Abstract

Various embodiments may provide an electromechanical responsive film. The electromechanical responsive film may include a composition including sodium (Na), potassium (K), niobium (Nb) and oxygen (O). The composition may have a formula (Na x K y )NbO 3-δ , wherein 0≤x<1, wherein 0≤y<1, and wherein 0<x+y<1. The composition may satisfy at least one condition selected from a group consisting of a first condition of (x+y+4)/2≤(3−δ)≤(x+y+5)/2 and a second condition of 0<δ<1.

First claim

The invention claimed is:

1 . An electromechanical responsive film including:
a composition including sodium (Na), potassium (K), niobium (Nb) and oxygen (O); wherein the composition has a formula of (Na x K y )NbO 3-δ ; wherein 0≤x<1; wherein 0≤y<1; wherein 0<x+y<1; and wherein the composition satisfies at least one condition selected from a group consisting of a first condition of (x+y+4)/2≤(3-δ)≤(x+y+5)/2 and a second condition of 0<δ<1.

2 . The electromechanical responsive film according to claim 1 , wherein the electromechanical responsive film is an epitaxial film.

3 . The electromechanical responsive film according to claim 1 , wherein the electromechanical responsive film is a polycrystalline film.

4 . The electromechanical responsive film according to claim 1 , wherein the electromechanical responsive film has an effective longitudinal piezoelectric strain coefficient (|d 33 |) higher than 250 pm/V.

5 . The electromechanical responsive film according to claim 4 , wherein the effective longitudinal piezoelectric strain coefficient (|d 33 |) is higher than 500 pm/V.

6 . The electromechanical responsive film according to claim 1 , wherein x is equal to 0.

7 . The electromechanical responsive film according to claim 1 , wherein y is equal to 0.

8 . The electromechanical responsive film according to claim 7 , wherein the formula is Na 0.86 NbO 2.93 .

9 . The electromechanical responsive film according to claim 1 , wherein the formula is (K 0.17 Na 0.65 )NbO 2.91 .

10 . The electromechanical responsive film according to claim 1 , wherein the electromechanical responsive film has a ferroelectric phase-paraelectric phase transition temperature of about 450° C.

11 . The electromechanical responsive film according to claim 1 , wherein the electromechanical responsive film has an orthorhombic phase-tetragonal phase transition temperature of about 210° C.

12 . The electromechanical responsive film according to claim 1 , wherein the electromechanical responsive film has a thickness of any value selected from 50 nm to 10 μm.

13 . A stacked arrangement including:
an electromechanical responsive film including a composition including sodium (Na), potassium (K), niobium (Nb) and oxygen (O); wherein the composition has a formula of (Na x K y )NbO 3-δ ; wherein 0≤x<1; wherein 0≤y<1; wherein 0<x+y<1; and wherein the composition satisfies at least one condition selected from a group consisting of a first condition of (x+y+4)/2≤(3−δ)≤(x+y+5)/2 and a second condition of 0<δ<1.

14 . The stacked arrangement according to claim 13 , wherein the stacked arrangement includes:
a substrate; a bottom electrode layer on the substrate; and a top electrode layer such that the electromechanical responsive film is between the top electrode layer and the bottom electrode layer.

15 . The stacked arrangement according to claim 14 ,
wherein the substrate is a silicon wafer including a silicon oxide layer; wherein the bottom electrode includes platinum; and wherein the electromechanical responsive film is a polycrystalline film of Na 0.86 NbO 2.93 .

16 . The stacked arrangement according to claim 13 , wherein the stacked arrangement includes:
a substrate; and an electrode layer such that the electromechanical responsive film is between the electrode layer and the substrate.

17 . The stacked arrangement according to claim 16 ,
wherein the substrate includes a single crystal of niobium-doped strontium titanate (Nb-doped SrTiO 3 ); and wherein the electromechanical responsive film is an epitaxial film of Na 0.86 NbO 2.93 or (K 0.17 Na 0.65 )NbO 2.91 .

18 . A method of forming an electromechanical responsive film, the method including:
forming the electromechanical responsive film such that the electromechanical responsive film includes a composition including sodium (Na), potassium (K), niobium (Nb) and oxygen (O); wherein the composition has a formula of (Na x K y )NbO 3-δ ; wherein 0≤x<1; wherein 0≤y<1; wherein 0<x+y<1; and wherein the composition satisfies at least one condition selected from a group consisting of a first condition of (x+y+4)/2≤(3−δ)≤(x+y+5)/2 and a second condition of 0<δ<1.

19 . The method according to claim 18 , wherein the electromechanical responsive film is formed over a substrate via sputtering.

20 . A method of forming a stacked arrangement, the method including:
forming an electromechanical responsive film including a composition including sodium (Na), potassium (K), niobium (Nb) and oxygen (O); wherein the composition has a formula of (Na x K y )NbO 3-δ ; wherein 0≤x<1; wherein 0≤y<1; wherein 0<x+y<1; and wherein the composition satisfies at least one condition selected from a group consisting of a first condition of (x+y+4)/2≤(3−δ)≤(x+y+5)/2 and a second condition of 0<δ<1.

Assignees

• Agency Science Tech & Res

Inventors

• Liu Huajun
• Yao Kui

Classifications

• H10N30/074

  by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing · CPC title

• H10N30/877

  Conductive materials · CPC title

• H10N30/076

  by vapour phase deposition · CPC title

• C30B29/32

  Titanates; Germanates; Molybdates; Tungstates · CPC title

• C30B29/30

  Niobates; Vanadates; Tantalates · CPC title