Wet clean spray process chamber for substrates

Patent metadata

Field	Value
Publication number	US-12460299-B2
Application number	US-202217880212-A
Country	US
Kind code	B2
Filing date	Aug 3, 2022
Priority date	Aug 5, 2021
Publication date	Nov 4, 2025
Grant date	Nov 4, 2025

Abstract

Embodiments of wet clean chambers are provided herein. In some embodiments, a wet clean chamber includes: a deck plate; a substrate support that is rotatable and configured to support a substrate; a rotor disposed about and configured to rotate with the substrate support, wherein the rotor includes an upper fluid collection region disposed radially outward of the substrate support in position to collect fluid leaving the substrate support during processing, and wherein the upper fluid collection region includes a plurality of drain openings along a radially outward perimeter of a bottom of the upper fluid collection region; a stationary housing surrounding the rotor and having a lower fluid collection region disposed beneath the drain openings of the rotor; and one or more fluid delivery arms coupled to the deck plate and configured to deliver fluid to the substrate.

First claim

The invention claimed is:

1 . A wet clean chamber, comprising:
a deck plate; a substrate support that is rotatable and configured to support a substrate; a rotor disposed about and configured to rotate with the substrate support, wherein the rotor includes an upper fluid collection region disposed radially outward of the substrate support in position to collect fluid leaving the substrate support during processing, and wherein the upper fluid collection region includes a plurality of drain openings along a radially outward perimeter of a bottom of the upper fluid collection region, wherein the rotor includes an annular base plate and an outer wall having an upper portion extending upward and radially inward from an outer perimeter of the annular base plate and a lower portion extending downward and radially outward from the annular base plate, wherein the rotor includes a first annular lip extending upward from the annular base plate, and wherein the substrate support includes an outer annular lip that extends downward from a body of the substrate support and surrounds the first annular lip; a stationary housing surrounding the rotor and having a lower fluid collection region disposed beneath the drain openings of the rotor and having one or more exhaust ports fluidly coupled to the lower fluid collection region, wherein the lower fluid collection region is disposed above the deck plate; and one or more fluid delivery arms coupled to the deck plate and configured to deliver fluid to the substrate.

2 . The wet clean chamber of claim 1 , wherein the one or more fluid delivery arms comprise a first arm configured to deliver a first fluid and a second arm configured to deliver a second fluid, wherein the one or more fluid delivery arms are configured for rotational and vertical movement with respect to the deck plate.

3 . A twin wet clean chamber, comprising:
the wet clean chamber of claim 1 , wherein the substrate support is configured to support a wafer; a second wet clean chamber, wherein the second wet clean chamber comprises:
a second deck plate;
a second substrate support that is rotatable and configured to support a second substrate comprising a tape frame substrate in a second support plane;
a second rotor disposed about and configured to rotate with the second substrate support, wherein the second rotor includes a second upper fluid collection region disposed radially outward of the second substrate support in position to collect fluid leaving the second substrate support during processing, and wherein the second upper fluid collection region includes a plurality of second drain openings along a radially outward perimeter of a bottom of the second upper fluid collection region;
a second stationary housing surrounding the second rotor and having a second lower fluid collection region disposed beneath the second drain openings of the second rotor; and
one or more second fluid delivery arms coupled to the second deck plate and configured to deliver fluid to the second substrate; and
a separation wall disposed between the wet clean chamber and the second wet clean chamber.

4 . The wet clean chamber of claim 1 , further comprising a gas purge line extending to a region between the substrate support and the rotor.

5 . The wet clean chamber of claim 1 , wherein the plurality of drain openings in the rotor comprise about 30 to about 90 openings.

6 . A wet clean chamber, comprising:
a substrate support that is rotatable and configured to support a substrate in a support plane; a rotor disposed about and configured to rotate with the substrate support, wherein the rotor includes an upper fluid collection region disposed radially outward of the substrate support in position to collect fluid leaving the substrate support during processing, wherein the rotor includes an annular base plate and an outer wall having an upper portion extending upward and radially inward from an outer perimeter of the annular base plate and a lower portion extending downward and radially outward from the annular base plate, wherein the upper fluid collection region includes a plurality of drain openings along a radially outward perimeter of a bottom of the upper fluid collection region, wherein the rotor includes a first annular lip extending upward from the annular base plate, and wherein the substrate support includes an outer annular lip that extends downward from a body of the substrate support and surrounds the first annular lip; and a stationary housing surrounding the rotor and having a lower fluid collection region disposed beneath the drain openings of the rotor.

7 . The wet clean chamber of claim 6 , wherein a lower portion of the stationary housing and a lower surface of the annular base plate at least partially define the lower fluid collection region.

8 . The wet clean chamber of claim 6 , wherein the rotor includes a second annular lip extending downward from the annular base plate and surrounds an inner lip of the stationary housing.

9 . The wet clean chamber of claim 6 , wherein the upper portion of the outer wall comprises a first annular wall extending upward and radially inward at a first angle and a second annular wall extending upward and radially inward from the first annular wall at a second angle greater than the first angle.

10 . The wet clean chamber of claim 6 , wherein the substrate support includes one or more substrate holders that include one or more fingers having a beveled surface to support an outer surface of the substrate and a lower outer surface of the substrate.

11 . The wet clean chamber of claim 6 , wherein the substrate is a tape frame substrate and the substrate support comprises a base plate and a support plate disposed over the base plate and configured to be raised with respect to the base plate.

12 . The wet clean chamber of claim 11 , wherein the support plate includes a plurality of support pins configured to raise the tape frame substrate off of the support plate and one or more hook fingers configured to clamp the tape frame substrate against the support pins.

13 . The wet clean chamber of claim 6 , wherein the stationary housing includes a body and a cover extending upward and radially inward from the body.

14 . The wet clean chamber of claim 13 , wherein the cover comprises an extendable cover.

15 . A multi-chamber processing tool, comprising:
a factory interface having one or more loadports; a transfer chamber coupled to the factory interface; and a wet clean chamber coupled to the transfer chamber, the wet clean chamber, comprising:
a substrate support that is rotatable and configured to support a substrate in a support plane;
a rotor disposed about and configured to rotate with the substrate support, wherein the rotor includes an upper fluid collection region disposed radially outward of the substrate support in position to collect fluid leaving the substrate support during processing, and wherein the upper fluid collection region includes a plurality of drain openings, wherein the rotor includes an annular base plate and an outer wall having an upper portion extending upward and radially inward from an outer perimeter of the annular base plate and a lower portion extending downward and radially outward from the annular base plate, wherein the rotor includes a first annular lip extending upward from the annular base plate, and wherein the substrate support includes an outer annular lip that extends downward from a body of the substrate support and surrounds the first annular lip; and
a stationary housing surrounding the rotor and having a lower flu

Assignees

• Applied Materials Inc

Inventors

• Rye Jason
• Zimmerman Nolan Layne

Classifications

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/7608

  characterised by a plurality of separate clamping members, e.g. clamping fingers · CPC title

• H10P72/3302

  Mechanical parts of transfer devices · CPC title