Solar cell and manufacturing method thereof, photovoltaic module, and photovoltaic system

Patent metadata

Field	Value
Publication number	US-12453209-B2
Application number	US-202418754287-A
Country	US
Kind code	B2
Filing date	Jun 26, 2024
Priority date	Jul 20, 2023
Publication date	Oct 21, 2025
Grant date	Oct 21, 2025

Abstract

A solar cell includes: a substrate including a first surface and a second surface arranged opposite to each other and a plurality of lateral surfaces adjacent to and located between the first surface and the second surface; a plurality of pyramid base shaped textured structures being constructed on the second surface and each of the lateral surfaces, wherein a minimum side length of each of top surfaces of the pyramid base shaped textured structures arranged on the lateral surfaces is L1, a maximum side length of each of top surfaces of the pyramid base shaped textured structures arranged on the second surface is L2, and L1>L2; a doped conductive layer arranged on the first surface; and a passivated contact layer including a polysilicon doped conductive layer, the passivated contact layer being arranged on the second surface.

First claim

The invention claimed is:

1. A solar cell, comprising:
a substrate comprising a first surface and a second surface arranged opposite to each other and a plurality of lateral surfaces adjacent to and located between the first surface and the second surface; a plurality of pyramid base shaped textured structures being constructed on the second surface and each of the lateral surfaces, wherein each of the pyramid base shaped textured structures has a shape of a truncated pyramid and has a top surface, and wherein a minimum side length of each of the top surfaces of the pyramid base shaped textured structures arranged on the lateral surfaces is L1, a maximum side length of each of the top surfaces of the pyramid base shaped textured structures arranged on the second surface is L2, and L1>L2;
a doped conductive layer arranged on the first surface; and
a passivated contact layer comprising a polysilicon doped conductive layer, the passivated contact layer being arranged on the second surface.

2. The solar cell according to claim 1 , wherein the minimum side length L1 of each of the top surfaces of the pyramid base shaped textured structures arranged on the lateral surfaces satisfies: L1>15 μm.

3. The solar cell according to claim 2 , wherein any side length L3 of each of the top surfaces of the pyramid base shaped textured structures arranged on the lateral surfaces satisfies: 15 μm<L3≤40 μm.

4. The solar cell according to claim 1 , wherein the maximum side length L2 of each of the top surfaces of the pyramid base shaped textured structures arranged on the second surface satisfies: L2<15 μm.

5. The solar cell according to claim 4 , wherein any side length L4 of each of the top surfaces of the pyramid base shaped textured structures arranged on the second surface satisfies: 7 μm≤L4≤10 μm.

6. The solar cell according to claim 1 , wherein a top end of each of the pyramid base shaped textured structures is provided with depressions, and a depression depth D of each of the depressions satisfies: 50 nm≤D≤1000 nm.

7. The solar cell according to claim 1 , wherein the solar cell further comprises:
a first passivation film layer stacked on the doped conductive layer; and
a second passivation film layer stacked on the passivated contact layer.

8. A solar cell, comprising:
a substrate comprising a first surface and a second surface arranged opposite to each other and a plurality of lateral surfaces adjacent to and located between the first surface and the second surface; a plurality of pyramid base shaped textured structures being constructed on the second surface and each of the lateral surfaces, wherein each of the pyramid base shaped textured structures has a shape of a truncated pyramid and has a top surface, wherein a perimeter of each of the top surfaces of the pyramid base shaped textured structures arranged on the lateral surfaces is C1, a perimeter of each of the top surfaces of the pyramid base shaped textured structures arranged on the second surface is C2, and C1>C2;
a doped conductive layer arranged on the first surface; and
a passivated contact layer comprising a polysilicon doped conductive layer, the passivated contact layer being arranged on the second surface.

9. A manufacturing method of a solar cell, comprising:
providing a base plate, the base plate comprising a substrate, pyramid shaped textured structures being constructed on surfaces of the substrate, element-doped conductive material layers being stacked on the surfaces of the substrate, the surfaces of the substrate comprising a first surface and a second surface arranged opposite to each other and a plurality of lateral surfaces adjacent to and located between the first surface and the second surface;
etching and removing the element-doped conductive material layers on the second surface and the lateral surfaces, and etching the pyramid shaped textured structures on the second surface and the lateral surfaces into pyramid base shaped textured structures, to form a doped conductive layer on the first surface of the substrate, wherein each of the pyramid base shaped textured structures has a shape of a truncated pyramid and has a top surface;
forming a passivated contact material layer on the second surface of the substrate, so that the passivated contact material layer is formed on the second surface of the substrate and the passivated contact material layer is further wraparound deposited onto the first surface and the lateral surfaces of the substrate, the passivated contact material layer comprising a polysilicon doped conductive material layer; and
etching and removing the passivated contact material layer wraparound deposited on the first surface and the lateral surfaces of the substrate and etching the pyramid base shaped textured structures on the lateral surfaces, to form a passivated contact layer comprising a polysilicon doped conductive material layer on the second surface, and to make a minimum side length L1 of each of the top surfaces of the pyramid base shaped textured structures arranged on the lateral surfaces and a maximum side length L2 of each of the top surfaces of the pyramid base shaped textured structures arranged on the second surface satisfying: L1>L2.

10. The manufacturing method of a solar cell according to claim 9 , wherein the element-doped conductive material layers each comprise an emitter material layer and a first oxide material layer located on a side of the emitter material layer that faces away from the pyramid shaped textured structures; and
the step of etching and removing the element-doped conductive material layers on the second surface and the lateral surfaces, and the etching the pyramid shaped textured structures on the second surface and the lateral surfaces into pyramid base shaped textured structures comprises:
etching and removing the first oxide material layers on the second surface and the lateral surfaces of the substrate in a chain machine; and
etching and removing the emitter material layers on the second surface and the lateral surfaces of the substrate in a trough machine, and etching the pyramid shaped textured structures on the second surface and the lateral surfaces into the pyramid base shaped textured structures.

11. The manufacturing method of a solar cell according to claim 10 , wherein in the step of etching and removing the first oxide material layers on the second surface and the lateral surfaces of the substrate in the chain machine,
an HF solution with a concentration of 2% to 35% is used for etching in the step of the etching performed in the chain machine.

12. The manufacturing method of a solar cell according to claim 10 , wherein in the step of etching and removing the emitter material layers on the second surface and the lateral surfaces of the substrate in the trough machine, and the etching the pyramid shaped textured structures on the second surface and the lateral surfaces into the pyramid base shaped textured structures,
a temperature under which the step of etching is performed in the trough machine ranges from 45° C. to 90° C., and the etching is performed through a first etching solution; wherein the first etching solution comprises a NaOH or KOH solution with a concentration of 5% to 20% and an organic complex additive.

13. The manufacturing method of a solar cell according to claim 12 , wherein the organic complex additive comprises a cationic surfactant, sodium glycolate, and sodium formate.

14. The manufacturing method of a solar cell according to claim 9 , wherein the step of forming the passivated contact material layer on the second surface of the substrate comprises:
sequentially sta

Assignees

• Trina Solar Co Ltd

Inventors

• Liu Chengfa
• Chen Hong
• Chen Daming
• Chen Yifeng

Classifications

• H10F77/311

  for photovoltaic cells · CPC title

• H10F10/166

  the Group IV-IV heterojunctions being heterojunctions of crystalline and amorphous materials, e.g. silicon heterojunction [SHJ] photovoltaic cells · CPC title

• Y02P70/50

  Manufacturing or production processes characterised by the final manufactured product · CPC title

• H10F71/00

  Manufacture or treatment of devices covered by this subclass (patterning processes to connect thin photovoltaic cells in integrated devices, or assemblies of multiple devices, having photovoltaic cells H10F19/33; manufacture or treatment of encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells H10F19/80; manufacture or treatment of integrated devices, or assemblies of multiple devices, comprising at least one element in which radiation controls the flow of current H10F39/00) · CPC title

• H10F10/10

  having potential barriers · CPC title