Mg2Si single crystal, Mg2Si single crystal substrate, infrared light receiving element and method for producing Mg2Si single crystal

US12448704B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12448704-B2
Application numberUS-202117420593-A
CountryUS
Kind codeB2
Filing dateFeb 25, 2021
Priority dateSep 25, 2020
Publication dateOct 21, 2025
Grant dateOct 21, 2025

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Abstract

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Provided is a Mg 2 Si single crystal in which generation of low-angle grain boundaries in the crystal is satisfactorily suppressed. A Mg 2 Si single crystal, wherein a variation in crystal orientation as measured by XRD is in a range of ±0.020°.

First claim

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The invention claimed is: 1. A Mg 2 Si single crystal, wherein a variation in crystal orientation as measured by XRD is in a range of ±0.020°, and the single crystal comprises at least one of B, Li, Al, P, and As as a dopant. 2. The Mg 2 Si single crystal according to claim 1 , wherein the variation in crystal orientation as measured by XRD is in a range of ±0.016°. 3. A Mg 2 Si single crystal substrate, comprising the Mg 2 Si single crys…

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What does patent US12448704B2 cover?
Provided is a Mg 2 Si single crystal in which generation of low-angle grain boundaries in the crystal is satisfactorily suppressed. A Mg 2 Si single crystal, wherein a variation in crystal orientation as measured by XRD is in a range of ±0.020°.
Who is the assignee on this patent?
Univ Ibaraki, Jx Nippon Mining & Metals Corp, Jx Advanced Metals Corp
What technology area does this patent fall under?
Primary CPC classification C30B29/52. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 21 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).