Process for preparation of triazole compound

US12441692B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12441692-B2
Application numberUS-202318180367-A
CountryUS
Kind codeB2
Filing dateMar 8, 2023
Priority dateMar 9, 2022
Publication dateOct 14, 2025
Grant dateOct 14, 2025

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Processes for preparation of a high purity cyproconazole, i.e., (2RS,3RS;2RS,3SR)-2-(4-chlorophenyl)-3-cyclopropyl-1-(1H-1,2,4-triazol-1-yl) butan-2-ol; and its compound i.e., 2-(4-chlorophenyl)-2-(1-cyclopropylethyl) oxirane generally includes reacting a ketone of formula (II) with a sulfonium salt in the presence of a base to obtain the oxirane compound of formula (III);wherein the sulfonium salt is obtained by reacting dimethyl sulfide and dimethyl sulfate in the presence of water; followed by reacting the oxirane compound of formula (III) with 1,2,4-triazole or its alkali metal salt to obtain a crude cyproconazole; and treating the crude cyproconazole with an aqueous alcohol to obtain a higher purity cyproconazole.

First claim

Opening claim text (preview).

The invention claimed is: 1. A process for preparing high purity cyproconazole of formula (I), the process, free of column chromatography, comprising: a) reacting a ketone of formula (II) with a sulfonium salt in the presence of a base to obtain a compound of formula (III); wherein the sulfonium salt is obtained by reacting dimethyl sulfide and dimethyl sulfate in the presence of water; b) reacting the compound of formula (III) with 1,2,4-triazole or its alkali metal salt to obtain a crude cyproconazole; and c) treating the crude cyproconazole with an aqueous alcohol to obtain the high purity cyproconazole. 2. The process as claimed in claim 1 , wherein reacting the compound of formula (III) in step b) is the alkali metal salt of 1,2,4-triazole. 3. The process as claimed in claim 1 , wherein said alkali metal salt of 1,2,4-triazole is prepared in situ, by reacting the 1,2,4-triazole with an alkali metal base. 4. The process as claimed in claim 3 , wherein said alkali metal base is selected from the group consisting of alkali metal hydroxides, carbonates and bicarbonates. 5. The process as claimed in claim 1 , wherein the aqueous alcohol comprises methanol and water, and wherein the weight ratio of water to alcohol in the aqueous alcohol is in a range from about 10:90 to about 90:10. 6. The process for preparing a compound of formula (III) of claim 1 , wherein the high purity cyproconazole has a purity greater than 98%. 7. The process as claimed in claim 6 , wherein said base is an organic base or an inorganic base. 8. The process as claimed in claim 6 , wherein said base comprises sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, or potassium bicarbonate. 9. The process as claimed in claim 6 , wherein said sulfonium salt is prepared in situ by reacting the dimethyl sulfide, dimethyl sulfate and water. 10. The process of claim 6 , wherein reacting the ketone of formula (II) with the sulfonium salt in the presence of the base and dimethyl sulfide is at a temperature from 35° C. to 60° C.; and wherein the sulfonium salt is obtained by reacting the dimethyl sulfide and dimethyl sulfate in the presence of water at a temperature from 20° C. to 40° C.

Assignees

Inventors

Classifications

  • Synthesis of the oxirane ring · CPC title

  • with hydrocarbon radicals, substituted by halogen atoms, nitro radicals or nitroso radicals · CPC title

  • Crystalline forms, e.g. polymorphs · CPC title

  • Fungicides · CPC title

  • 1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles · CPC title

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What does patent US12441692B2 cover?
Processes for preparation of a high purity cyproconazole, i.e., (2RS,3RS;2RS,3SR)-2-(4-chlorophenyl)-3-cyclopropyl-1-(1H-1,2,4-triazol-1-yl) butan-2-ol; and its compound i.e., 2-(4-chlorophenyl)-2-(1-cyclopropylethyl) oxirane generally includes reacting a ketone of formula (II) with a sulfonium salt in the presence of a base to obtain the oxirane compound of formula (III);wherein the sulfonium …
Who is the assignee on this patent?
Upl Ltd
What technology area does this patent fall under?
Primary CPC classification C07D249/08. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 14 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).