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US-2024077762-A1 · Mar 7, 2024 · US
US12436103B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12436103-B2 |
| Application number | US-202318178085-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 3, 2023 |
| Priority date | Mar 24, 2022 |
| Publication date | Oct 7, 2025 |
| Grant date | Oct 7, 2025 |
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Systems and methods presented herein generally relate to a tool for determining a refractive index of a formation fluid using attenuated total reflection. The tool includes a body having a fluid admitting assembly and a flow line that receives the formation fluid. The tool also includes two different crystals having faces in contact with fluid in the flow line. The tool further includes at least one light source coupled to the crystals and configured to direct light into the crystals. In addition, the wavelength, the refractive indices, and the angles of incidence are configured such that the light undergoes total internal reflection at interfaces between the crystals and the formation fluid. The tool also includes at least one light detector coupled to the crystals and configured to measure reflected light exiting the crystals. The tool further includes at least one processor coupled to the at least one light detector.
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The invention claimed is: 1. A tool for determining a refractive index of a formation fluid, comprising: a body having a fluid admitting assembly and a flow line that receives the formation fluid; two different crystals having faces in contact with fluid in the flow line, wherein the crystals comprise a first crystal and a second crystal, wherein the crystals have at least one of different refractive indices or different angles of incidence with respect to light directed to the crystals; at least one light source coupled to the crystals and configured to direct the light into the crystals, wherein the light has at least one wavelength, and wherein the wavelength, the refractive indices, and the angles of incidence are configured such that the light undergoes total internal reflection at interfaces between the crystals and the formation fluid; at least one light detector coupled to the crystals and configured to measure reflected light exiting the crystals; and at least one processor coupled to the at least one light detector, wherein the at least one processor is configured to continuously and iteratively, in substantially real-time: determine attenuations of the light entering the crystals; determine a crystal correction coefficient based on: a first ratio of a first refractive index of the first crystal to a reference refractive index at the at least one wavelength; and a second ratio of a second refractive index of the second crystal to the reference refractive index at the at least one wavelength, wherein the reference refractive index is between a third refractive index of diamond and a fourth refractive index of sapphire at the at least one wavelength; normalize the attenuations based at least in part on the crystal correction coefficient; and determine the refractive index of the formation fluid and a carbon dioxide concentration in the formation fluid utilizing the normalized attenuations to account for variations in the refractive index of the formation fluid. 2. The tool of claim 1 , wherein the at least one processor is configured to determine the refractive index of the formation fluid utilizing the attenuations to account for variations in penetration depth. 3. The tool of claim 1 , wherein the at least one processor is configured to determine the refractive index of the formation fluid at the temperature and pressure of the sampled fluid. 4. The tool of claim 1 , wherein the at least one processor is configured to determine the refractive index of the formation fluid correcting for background radiation. 5. The tool of claim 1 , wherein the at least one processor is configured to use a plurality of reference wavelengths to determine the refractive index of the formation fluid, wherein each reference wavelength of the plurality of reference wavelengths corresponds to a different attenuation coefficient of a component in the formation fluid. 6. The tool of claim 1 , wherein the at least one processor is configured to normalize the attenuations based on a gain of the attenuations with respect to a reference fluid. 7. The tool of claim 1 , wherein the at least one processor is configured to estimate optimal concentrations of components in the formation fluid. 8. The tool of claim 1 , wherein the at least one processor is configured to verify light and heavy component concentrations in the formation fluid. 9. The tool of claim 1 , wherein the two different crystals comprise different materials. 10. The tool of claim 1 , wherein each of the crystals comprises diamond, sapphire, or zirconia. 11. The tool of claim 1 , wherein the at least one processor is configured to normalize the attenuations based on the crystal correction coefficient based on a relationship between the attenuations and the crystal correction coefficient according to: [ 1 + F ˆ ( η κ η ref ) ( η κ η ref - 1 ) ( η f - η min η max - η min ) ] where {circumflex over (F)} is the crystal correction coefficient, η κ is the first refractive index of the first crystal or the second refractive index of the second crystal, η ref is the reference refractive index, η f is the refractive index of the formation fluid, Amin is a minimum refractive index for the normalization, and η max is a maximum refractive index for the normalization. 12. A method for determining a refractive index of a formation fluid, comprising: placing into a borehole a tool having a fluid admitting assembly, a flow line, two different crystals in contact with the formation fluid in the flow line, at least one light source, at least one light detector and associated signal processing circuitry, and at least one processor, wherein the crystals comprise a first crystal and a second crystal, wherein the crystals have at least one of different refractive indices or different angles of incidence with respect to light directed to the crystals; moving the fluid admitting assembly of the tool into contact with a formation at a location of interest in the formation; causing formation fluid to flow into the flow line of the tool and into contact with the crystals; directing the light from the at least one light source into the crystals; detecting with the at least one light detector the light exiting the crystals, wherein the crystals and the at least one light source are configured such that the light will undergo total internal reflection at interfaces between the crystals and the formation fluid; using the associated signal processing circuitry to compare the exiting light to a reference light value for the at least one light source associated with the at least one detector in order to obtain attenuation values; and using the at least one processor to continuousl
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