Bismuth-based modified electrode, manufacturing method thereof and use thereof

US12435432B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12435432-B2
Application numberUS-202217934541-A
CountryUS
Kind codeB2
Filing dateSep 22, 2022
Priority dateJul 4, 2022
Publication dateOct 7, 2025
Grant dateOct 7, 2025

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Abstract

Official abstract text for this publication.

A modified electrode, manufacturing method thereof and use thereof are provided. The manufacturing method includes steps of soaking a copper substrate in a solution to obtain a BiOI/copper(I) iodide, BiOI/copper(I) iodide/metallic bismuth, and copper(I) iodide/metallic bismuth composite modified electrodes by electroless plating method. The obtained electrodes, designated as bismuth-based modified electrode, can be used for the electrohydrodimerization of acrylonitrile to synthesize adiponitrile.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of manufacturing a bismuth-based modified electrode, comprising a step of: immersing a copper substrate in an aqueous solution for 1 to 20 minutes to obtain the bismuth-based modified electrode; wherein the aqueous solution comprises a bismuth solution and KI solution, and a concentration of the KI solution ranges from 0.4 M to 3.0 M, and the bismuth solution comprises bismuth nitrate, bismuth carbonate, bismuth acetate, or bismuth citrate, and a concentration of the bismuth nitrate, a concentration of the bismuth carbonate, a concentration of the bismuth acetate, and a concentration of the bismuth citrate range from 20 mM to 40 mM, respectively, wherein the aqueous solution further comprises an oxidizing agent and the oxidizing agent comprises p-benzoquinone with a concentration between 0.5 mM and 50 mM, hydrogen peroxide with a concentration between 1 mM and 10 mM, or 2,2′-azino-bis(3-ethylbenzthiazoline-6-sulfonic acid) diammonium salt with a concentration between 1 mM and 10 mM; and immersing the copper substrate in an electrolyte with a concentration of 0.1 M and a pH between 7.0 and 9.2, and performing an electrochemical reduction at an applied potential between −0.5 V and −1.75 V vs. NHE for 30 minutes to 2 hours, wherein the electrolyte is selected from the group consisting of phosphate solution, borate solution, and carbonate solution. 2. The method according to claim 1 , wherein the concentration of the KI solution is 0.4 M, and the bismuth solution comprises 40 mM bismuth nitrate, 20 mM bismuth carbonate, 40 mM bismuth acetate, or 40 mM bismuth citrate. 3. The method according to claim 1 , wherein the oxidizing agent comprises 50 mM p-benzoquinone, 5 mM hydrogen peroxide, or 5 mM 2,2′-azino-bis(3-ethylbenzothiazoline-6-sulfonic acid) diammonium salt. 4. The method according to claim 1 , wherein the copper substrate is immersed in 0.1 M borate buffer, pH 9.2. 5. The method according to claim 1 , wherein the electrochemical reduction is performed at the applied potential at −1.745 V vs. NHE for 30 minutes. 6. The method according to claim 1 , wherein the copper substrate is immersed in the aqueous solution for 4 minutes.

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Classifications

  • Characteristics of the product obtained · CPC title

  • Electrodes comprising one or more electrocatalytic coatings on a substrate · CPC title

  • Nitrogen containing compounds · CPC title

  • hydrodimerisation · CPC title

  • Metal or alloy · CPC title

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What does patent US12435432B2 cover?
A modified electrode, manufacturing method thereof and use thereof are provided. The manufacturing method includes steps of soaking a copper substrate in a solution to obtain a BiOI/copper(I) iodide, BiOI/copper(I) iodide/metallic bismuth, and copper(I) iodide/metallic bismuth composite modified electrodes by electroless plating method. The obtained electrodes, designated as bismuth-based modif…
Who is the assignee on this patent?
Univ Nat Cheng Kung
What technology area does this patent fall under?
Primary CPC classification C23C18/1646. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 07 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).