Dielectric barrier discharge plasma generator

Patent metadata

Field	Value
Publication number	US-12432841-B2
Application number	US-202218689005-A
Country	US
Kind code	B2
Filing date	Feb 28, 2022
Priority date	Sep 10, 2021
Publication date	Sep 30, 2025
Grant date	Sep 30, 2025

Abstract

The dielectric barrier discharge plasma generator includes: a dielectric substrate that exhibits a plate shape extending in a first direction and has a first surface and a second surface located on an opposite side of the first surface in a second direction orthogonal to the first direction; a first electrode disposed on the dielectric substrate on a side of the first surface; a second electrode disposed at a position separated from the second surface of the dielectric substrate in the second direction; a gas flow path that is formed by a gap between the dielectric substrate and the second electrode and through which a gas flows in a third direction orthogonal to the first direction and the second direction; and an outlet provided at a first end which is one end portion of the gas flow path in the third direction.

First claim

The invention claimed is:

1. A dielectric barrier discharge plasma generator comprising:
a dielectric substrate that exhibits a plate shape extending in a first direction and has a first surface and a second surface located on an opposite side of the first surface in a second direction orthogonal to the first direction;
a first electrode disposed on the dielectric substrate on a side of the first surface;
a second electrode disposed at a position separated from the second surface of the dielectric substrate in the second direction;
a gas flow path that is formed by a gap between the dielectric substrate and the second electrode and through which a gas flows in a third direction orthogonal to the first direction and the second direction; and
an outlet provided at a first end and extending in the first direction, the first end being one end portion of the gas flow path in the third direction, wherein
the first surface of the dielectric substrate is a flat surface parallel to the third direction, extending at least from a second end to a first reference location, the second end being an end portion opposite to the outlet in the third direction,
the second surface of the dielectric substrate is a flat surface parallel to the third direction, extending at least from the second end to a second reference location in the third direction,
a third surface is a flat surface parallel to the third direction, extending at least from the second end to a third reference location in the third direction, the third surface being a main surface of the second electrode that faces the second surface of the dielectric substrate via the gas flow path,
at least one of the first surface in a first specific area from the first reference location to the first end, the second surface in a second specific area from the second reference location to the first end, or the third surface in a third specific area from the third reference location to the first end is an inclined surface in the third direction,
the first electrode is disposed at least between the first reference location and the first end, and
when viewed in the first direction, an angle α formed by the first surface in the first specific area and the third direction, an angle β formed by the second surface in the second specific area and the third direction, and an angle γ formed by the third surface in the third specific area and the third direction satisfy both of Formula (1) and Formula (2) below:

[

Math
⁢

1

]



sin
⁢

α

+

(

ε
r

-
1

)

⁢

sin
⁢

β

-

ε
r

⁢

sin
⁢

γ

<
0

(
1
)

A
α

⁢

sin
⁢

α

+

d
⁢
1
⁢

(
0
)

>

A
β

⁢

sin
⁢

β

>

A
γ

⁢

sin
⁢

γ

-

d
⁢
2
⁢

(
0
)

(
2
)

(where ε r in Formula (1) is a relative permittivity of the dielectric substrate, and in Formula (2), A α , A β , and A 65 respectively correspond to lengths of the first specific area, the second specific area, and the third specific area in the third direction, and d 1 ( 0 ) represents a thickness of the dielectric substrate in the second direction at a reference location on a side closer to the second end in the third direction, the reference location being one of the first reference location or the second reference location, and d 2 ( 0 ) represents a height of the gas flow path in the second direction at a reference location on a side closer to the second end in the third direction, the reference location being one of the second reference location or the third reference location.).

2. The dielectric barrier discharge plasma generator according to claim 1 , wherein the dielectric substrate exhibits a shape in which a thickness of the dielectric substrate in the second direction is constant regardless of a position in the third direction, or a thickness of the dielectric substrate in the second direction gradually increases from the first reference location toward the first end.

3. The dielectric barrier discharge plasma generator according to claim 1 , wherein the first electrode is a high-voltage side electrode, and the second electrode is a low-voltage side electrode.

Assignees

• Ushio Electric Inc

Inventors

• Nakamura Kensuke
• Hiraoka Takahiro

Classifications

• H10P14/60

  of insulating materials · CPC title

• H10P50/242 Primary

  of Group IV materials · CPC title

• H05H1/2441

  characterised by the physical-chemical properties of the dielectric, e.g. porous dielectric · CPC title

• H05H1/2439

  Surface discharges, e.g. air flow control · CPC title

• C23C16/513

  using plasma jets · CPC title