Measurement method, imprint apparatus, and article manufacturing method

Patent metadata

Field	Value
Publication number	US-12429764-B2
Application number	US-202418635168-A
Country	US
Kind code	B2
Filing date	Apr 15, 2024
Priority date	Apr 10, 2020
Publication date	Sep 30, 2025
Grant date	Sep 30, 2025

Abstract

The present invention provides a measurement method including while driving a measurement target region of a surface of a substrate in a first direction with respect to a measurement unit, obtaining first measurement information indicating a height of the measurement target region in each of a plurality of first measurement lines parallel to the first direction and different from each other by measuring each measurement line by the measurement unit, and while driving the measurement target region with respect to the measurement unit in a second direction crossing all of the plurality of first measurement lines, obtaining second measurement information indicating a height of the measurement target region in one second measurement line parallel to the second direction by measuring the second measurement line by the measurement unit.

First claim

What is claimed is:

1. An imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the apparatus comprising:
a holding unit including a holding surface configured to hold the substrate;
a drive unit configured to drive the holding unit in a floating state;
a measurement unit configured to measure a height of a pattern surface of the mold or a height of the substrate held by the holding surface; and
a control unit configured to perform processing of controlling an attitude of at least one of the mold and the substrate such that the pattern surface of the mold and a surface of the substrate become parallel to each other,
wherein the processing comprises:
while relatively driving the measurement unit with respect to a measurement target region of the pattern surface of the mold or the surface of the substrate in a first direction by the drive unit, obtaining first measurement information indicating a height of the pattern surface of the mold or a height of the surface of the substrate in each of a plurality of first measurement lines parallel to the first direction and different from each other by measuring each of the plurality of first measurement lines by the measurement unit,
while driving the measurement unit with respect to the measurement target region of the pattern surface of the mold or the surface of the substrate in a second direction crossing all of the plurality of first measurement lines by the drive unit, obtaining second measurement information indicating a height of the pattern surface of the mold or a height of the surface of the substrate in one second measurement line parallel to the second direction by measuring the second measurement line by the measurement unit,
generating first distribution information indicating a height distribution of the pattern surface of the mold or a height distribution of the surface of the substrate based on the first measurement information and the second measurement information, and
generating second distribution information indicating a height distribution of the holding surface configured to hold the substrate based on the first measurement information and the second measurement information obtained in the obtaining the first measurement information and in the obtaining the second measurement information, respectively, in a state in which an angle of the substrate around a vertical axis of the substrate on the holding surface is set to a first angle, and the first measurement information and the second measurement information obtained in the obtaining the first measurement information and in the obtaining the second measurement information, respectively, in a state in which the angle of the substrate around the vertical axis of the substrate on the holding surface is set to a second angle different from the first angle.

2. The imprint apparatus according to claim 1 , wherein
a plurality of first measurement points to be measured by the measurement unit are set in each of the plurality of first measurement lines,
a plurality of second measurement points to be measured by the measurement unit are set in the second measurement line, and
the plurality of first measurement points and the plurality of second measurement points are set such that, for each of the plurality of first measurement lines, one measurement point of the plurality of first measurement points overlaps one measurement point of the plurality of second measurement points.

3. The imprint apparatus according to claim 1 , wherein
the first direction and the second direction are orthogonal to each other.

4. The imprint apparatus according to claim 3 , wherein
the drive unit includes two guides parallel to two directions orthogonal to each other,
the first direction is a direction parallel to one guide of the two guides, and
the second direction is a direction parallel to the other guide of the two guides.

5. The imprint apparatus according to claim 1 , wherein
an angle difference between the first angle and the second angle is one of 90° and 180°.

6. The imprint apparatus according to claim 1 , wherein
the measurement target region is an entire region of the surface of the substrate.

7. The imprint apparatus according to claim 1 , wherein
the measurement target region is a partial region of the surface of the substrate.

8. An article manufacturing method comprising:
forming a pattern on a substrate using an imprint apparatus defined in claim 1 ;
processing the substrate on which the pattern is formed in the forming; and
manufacturing an article from the processed substrate.

9. An imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the apparatus comprising:
a first holding unit including a first holding surface configured to hold the substrate;
a second holding unit including a second holding surface configured to hold the mold;
a drive unit configured to drive the first holding unit in a floating state;
a measurement unit provided in the drive unit and configured to measure a height of a pattern surface of the mold; and
a control unit configured to perform processing of controlling an attitude of at least one of the mold and the substrate such that the pattern surface of the mold and a surface of the substrate become parallel to each other,
wherein the processing comprises:
while driving the measurement unit in a first direction with respect to the pattern surface of the mold by the drive unit, obtaining first measurement information indicating a height of the pattern surface of the mold in each of a plurality of first measurement lines parallel to the first direction and different from each other by measuring each of the plurality of first measurement lines by the measurement unit,
while driving the measurement unit with respect to the pattern surface of the mold in a second direction crossing all of the plurality of first measurement lines by the drive unit, obtaining second measurement information indicating a height of the pattern surface of the mold in one second measurement line parallel to the second direction by measuring the second measurement line by the measurement unit,
generating first distribution information indicating a height distribution of the pattern surface of the mold based on the first measurement information and the second measurement information, and
generating second distribution information indicating a height distribution of the second holding surface configured to hold the mold based on the first measurement information and the second measurement information obtained in the obtaining the first measurement information and in the obtaining the second measurement information, respectively, in a state in which an angle of the mold around a vertical axis of the mold on the second holding surface is set to a first angle, and the first measurement information and the second measurement information obtained in the obtaining the first measurement information and in the obtaining the second measurement information, respectively, in a state in which the angle of the mold around the vertical axis of the mold on the second holding surface is set to a second angle different from the first angle.

10. An article manufacturing method comprising:
forming a pattern on a substrate using an imprint apparatus defined in claim 9 ;
processing the substrate on which the pattern is formed in the forming; and
manufacturing an article from the processed substrate.

Assignees

• Canon Kk

Inventors

• Shudo Shinichi
• Yasukawa Masataka

Classifications

• G01B13/16

  for measuring contours or curvatures · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• G01B21/04

  by measuring coordinates of points · CPC title

• G03F9/7034

  Leveling · CPC title

• G01B11/0608

  Height gauges · CPC title