Electrode for electrolysis

Patent metadata

Field	Value
Publication number	US-12428742-B2
Application number	US-202017311850-A
Country	US
Kind code	B2
Filing date	Feb 17, 2020
Priority date	Feb 22, 2019
Publication date	Sep 30, 2025
Grant date	Sep 30, 2025

Abstract

The present invention provides an electrode for electrolysis in which a planarized metal substrate having a mesh structure such that the aspect ratio of an individual cross-section of a wire constituting the mesh structure is 120% or greater is used to increase the surface area of a coating layer, thereby increasing adhesion to a membrane and gas trap is reduced to reduce overvoltage.

First claim

The invention claimed is:

1. An electrode for electrolysis comprising:
a metal substrate layer having a mesh structure; and
a coating layer having a composition ratio that includes a ruthenium-based oxide, a cerium-based oxide, a platinum-based oxide, and an amine-based compound, respectively, wherein the coating layer is formed on the surface of a planarized wire constituting the mesh structure, and the metal substrate layer is a planarized metal substrate layer forming an individual cross-section of the wire with an aspect ratio of from 130% to 150%,
wherein the cross-section is perpendicular to a length direction of the wire, and
wherein the amine-based compound is urea, and
the composition ratio including:
the cerium-based oxide in an amount of 0.05-0.35 mole based on 1 mole of the ruthenium-based oxide;
the platinum-based oxide in an amount of 0.02-0.5 mole based on 1 mole of the ruthenium-based oxide; and
the amine-based compound in an amount of 0.6-0.9 mole based on 1 mole of the ruthenium-based oxide, respectively;

wherein the electrode is a cathode and the electrode has improved durability with the composition ratio as compared to without the composition ratio; and
wherein the planarized metal substrate has a higher adhesion to the coating layer, and a reduced gas trap to allow effective gas desorption for reduced overvoltage as compared to non-planarized metal substrate having similar substrate thickness, and metal substrate composition.

2. The electrode for electrolysis of claim 1 , wherein a metal of the metal substrate layer is one of nickel, titanium, tantalum, aluminum, hafnium, zirconium, molybdenum, tungsten, stainless steel, or an alloy thereof.

3. The electrode for electrolysis of claim 1 , wherein a thickness of the metal substrate layer is 100-300 μm.

4. A method for manufacturing an electrode for electrolysis, comprising:
planarizing a metal substrate for forming a planarized metal substrate having a mesh structure such that an aspect ratio of an individual cross-section of a wire constituting the mesh structure is from 130% to 150%;
applying a coating composition on a surface of the wire of the planarized metal substrate; and
performing coating by drying and firing the metal substrate applied with the coating composition,
wherein the coating composition has a composition ratio that includes a ruthenium-based precursor, a cerium-based precursor, a platinum-based precursor, and an amine-based precursor, the composition ratio including:
the cerium-based precursor in an amount of 0.05-0.35 mole based on 1 mole of the ruthenium-based precursor;
the platinum-based precursor in an amount of 0.02-0.5 mole based on 1 mole of the ruthenium-based precursor; and
the amine-based precursor in an amount of 0.6-0.9 mole based on 1 mole of the ruthenium-based precursor, respectively;

wherein the amine-based precursor is urea,
wherein the electrode is a cathode; and the electrode has improved durability with the composition ratio as compared to without the composition ratio; and
wherein the planarized metal substrate has a higher adhesion to the coating composition, and a reduced gas trap to allow effective gas desorption for reduced overvoltage as compared to non-planarized metal substrate having similar substrate thickness, and metal substrate composition.

5. The method of claim 4 , wherein the planarizing is performed by roll-pressing or chemical etching.

6. The method of claim 4 , wherein the metal substrate is a nickel substrate.

7. The method of claim 4 , wherein
the ruthenium-based precursor is one or more selected from the group consisting of ruthenium hexafluoride (ruf 6 ), ruthenium (III) chloride (rucl 3 ), ruthenium (III) chloride hydrate (rucl 3 ·xh 2 o), ruthenium (III) bromide (rubr 3 ), ruthenium (III) bromide hydrate (rubr 3 ·xh 2 o), ruthenium (III) iodide (rui 3 ), and acetic acid ruthenium salt,
the cerium-based precursor is one or more selected from the group consisting of cerium (III) nitrate hexahydrate (Ce(NO 3 ) 3 ·6H 2 O), cerium (IV) sulfate tetrahydrate (Ce(SO 4 ) 2 ·4H 2 O), and cerium (III) chloride heptahydrate (cecl 3 ·7H 2 O), and
the platinum-based precursor is one or more selected from the group consisting of chloroplatinic acid hexahydrate (h 2 ptcl 6 ·6H 2 O), diamine dinitro platinum (Pt(NH 3 ) 2 (NO) 2 ), platinum (IV) chloride (ptcl 4 ), platinum (II) chloride (ptcl 2 ), potassium tetrachloroplatinate (k 2 ptcl 4 ), and potassium hexachloroplatinate (k 2 ptcl 6 ).

8. The method of claim 4 , wherein the applying, drying, and firing are each performed 5-20 times, repeatedly.

Assignees

• Lg Chemical Ltd

Inventors

• Eom Hee Jun
• Kim Yeon Yi
• Kim Myung Hun
• Lee Dong Chul
• Jung Sang Yun
• Hwang Gyo Hyun
• Jung Jong Wook
• Bang Yong Ju

Classifications

• C25B11/03

  perforated or foraminous · CPC title

• C25B1/34

  Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis · CPC title

• C25B11/093

  at least one noble metal or noble metal oxide and at least one non-noble metal oxide · CPC title

• C25B11/095 Primary

  at least one of the compounds being organic · CPC title

• C25B11/061

  Metal or alloy · CPC title