Photomechanical polymers, compositions, and methods

US12426494B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12426494-B2
Application numberUS-202318189461-A
CountryUS
Kind codeB2
Filing dateMar 24, 2023
Priority dateMar 25, 2022
Publication dateSep 23, 2025
Grant dateSep 23, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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Photopolymers, monomers, compositions including photopolymers and a dopant, and methods, including methods for eliciting a photomechanical response. The dopant may be a triplet sensitizing dopant. The exposing of compositions to the one or more wavelengths of electromagnetic radiation may elicit a photomechanical response via a triplet excited state mechanism.

First claim

Opening claim text (preview).

The invention claimed is: 1. A composition comprising: a photopolymer comprising at least one stilbene-based monomer, and a dopant dispersed in the photopolymer; wherein the dopant comprises a triplet excited state sensitizing dopant; and wherein a mole ratio of the stilbene-based monomer to the dopant in the composition is about 1:0.01 to about 1:0.5. 2. The composition of claim 1 , wherein the photopolymer is a polyimide photopolymer. 3. The composition of claim 1 , wherein the at least one stilbene-based monomer has the following structure when unpolymerized: 4. The composition of claim 1 , wherein the photopolymer has the following structure: wherein n is 2 to 100,000. 5. The composition of claim 1 , wherein the dopant comprises a quantum dot. 6. The composition of claim 1 , wherein the dopant comprises an iridium(III) cyclometallated sensitizer. 7. The composition of claim 6 , wherein the dopant comprises bis[2-(4,6-difluorophenyl)pyridinato-C 2 ,N](picolinato)iridium(III). 8. The composition of claim 1 , wherein the dopant is substantially uniformly dispersed in the polymer. 9. The composition of claim 1 , wherein the dopant is present in the composition at an amount of about 1 mol % to about 20 mol %, relative to the at least one stilbene-based monomer. 10. The composition of claim 1 , wherein the composition is in the form of a film. 11. The composition of claim 10 , wherein the film has a thickness of about 15 micrometers to about 40 micrometers. 12. A method of eliciting a photomechanical response, the method comprising: providing the composition of claim 1 ; and irradiating the composition with one or more wavelengths of electromagnetic radiation effective to elicit the photomechanical response of the composition. 13. The method of claim 12 , wherein the photomechanical response comprising a bending of the composition, a constriction of the composition, or a combination thereof. 14. The method of claim 12 , wherein the one or more wavelengths of electromagnetic radiation comprise at least one wavelength within the visible spectrum. 15. The method of claim 14 , wherein the one or more wavelengths of electromagnetic radiation are from about 400 nm to about 450 nm. 16. The method of claim 12 , wherein the photomechanical response occurs via a triplet excited state mechanism. 17. A composition comprising: a photopolymer, and a dopant dispersed in the photopolymer; wherein the photopolymer comprises a stilbene-based monomer, the stilbene-based monomer having the following structure when unpolymerized—  and wherein the dopant comprises an iridium(III) cyclometallated sensitizer. 18. The composition of claim 17 , wherein a mole ratio of the stilbene-based monomer to the dopant in the composition is about 1:0.01 to about 1:0.5. 19. The composition of claim 17 , wherein the composition is in the form of a film. 20. A compound of the following structure:

Assignees

Inventors

Classifications

  • Organic radiation-sensitive molecular electronic devices · CPC title

  • with only one nitrogen atom in the ring · CPC title

  • Triplet emission · CPC title

  • comprising iridium · CPC title

  • Wholly aromatic polyimides containing oxygen in the form of ether bonds in the main chain · CPC title

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What does patent US12426494B2 cover?
Photopolymers, monomers, compositions including photopolymers and a dopant, and methods, including methods for eliciting a photomechanical response. The dopant may be a triplet sensitizing dopant. The exposing of compositions to the one or more wavelengths of electromagnetic radiation may elicit a photomechanical response via a triplet excited state mechanism.
Who is the assignee on this patent?
Univ Florida State Res Found Inc
What technology area does this patent fall under?
Primary CPC classification H10K85/141. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 23 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).