Method for producing glass substrate

US12415744B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12415744-B2
Application numberUS-202017620139-A
CountryUS
Kind codeB2
Filing dateMay 22, 2020
Priority dateJun 18, 2019
Publication dateSep 16, 2025
Grant dateSep 16, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a method for producing a glass substrate that can reduce the dimensional change during heat treatment while avoiding shortening of facilities' service lives. A method for producing a glass substrate includes melting and forming a glass raw material to produce a glass substrate having a strain point of 690 to 750° C., wherein an average cooling rate in a temperature range from (an annealing point plus 150° C.) to (the annealing point minus 200° C.) in a cooling process during the forming is adjusted to 100 to 400° C./min to obtain the glass substrate having a degree of thermal contraction of 15 ppm or less when subjected to a heat treatment at 500° C. for an hour.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing a glass substrate, comprising: melting and forming a glass raw material to produce a glass substrate having a strain point of 710 to 750° C., wherein an average cooling rate in a temperature range from (an annealing point plus 150° C.) to (the annealing point minus 200° C. in a cooling process during the forming is adjusted to 200 to 400° C./min to obtain the glass substrate having a degree of thermal contraction of 15 ppm or less when subjected to a heat treatment at 500° C. for an hour and β-OH value of 0.30/mm or less; and the glass substrate containing, as a glass composition in terms of % by mole, 60 to 75% SiO 2 , 10 to 15% Al 2 O 3 , 0 to 5% B 2 O 3 , 0 to 0.1% Li 2 O, 0 to 0.1% Na 2 O, 0 to 1% K 2 O, 0 to 8% MgO, 0 to 10% CaO, 0 to 10% SrO, 0.1 to 10% BaO, 0 to 10% ZnO, 0 to 10% P 2 O 5 , and 0 to 1% SnO 2 . 2. The method for producing a glass substrate according to claim 1 , wherein the forming is performed by an overflow downdraw method. 3. The method for producing a glass substrate according to claim 1 , obtaining the glass substrate having a width of 3 m or more. 4. The method for producing a glass substrate according to claim 1 , wherein after the forming into the glass substrate, the glass substrate is split into two or more glass substrates of G6 size (1.5 m×1.8 m).

Assignees

Inventors

Classifications

  • Heat-treatment · CPC title

  • containing beryllium, magnesium or alkaline earth metals · CPC title

  • containing titanium · CPC title

  • containing aluminium (C03C2201/36 takes precedence) · CPC title

  • containing boron (C03C2201/14 takes precedence) · CPC title

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What does patent US12415744B2 cover?
Provided is a method for producing a glass substrate that can reduce the dimensional change during heat treatment while avoiding shortening of facilities' service lives. A method for producing a glass substrate includes melting and forming a glass raw material to produce a glass substrate having a strain point of 690 to 750° C., wherein an average cooling rate in a temperature range from (an an…
Who is the assignee on this patent?
Nippon Electric Glass Co
What technology area does this patent fall under?
Primary CPC classification C03B25/12. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 16 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).