Aluminum nitride plate

US12415728B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12415728-B2
Application numberUS-202017030895-A
CountryUS
Kind codeB2
Filing dateSep 24, 2020
Priority dateMar 27, 2018
Publication dateSep 16, 2025
Grant dateSep 16, 2025

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  1. Title

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  2. Abstract

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Abstract

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An aluminum nitride plate satisfies both of a “relation 1: c1>97.5%” and a “relation 2: c2/c1<0.995” where c1 is a c-plane degree of orientation that is defined as a ratio of a diffraction intensity of (002) plane to a sum of the diffraction intensity of (002) plane and a diffraction intensity of (100) plane when the surface layer of the aluminum nitride plate is subjected to an X-ray diffraction measurement, and c2 is a c-plane degree of (002) plane to the sum of the diffraction intensity of (002) plane and the diffraction intensity of (100) plane when a portion other than the surface layer of the aluminum nitride plate is subjected to the X-ray diffraction. Moreover, in the aluminum nitride plate, a difference in nitrogen content between the surface layer and the portion other than the surface layer is less than 0.15% in weight ratio.

First claim

Opening claim text (preview).

The invention claimed is: 1. An aluminum nitride plate, wherein the aluminum nitride plate satisfies-both all three of following relations (1), (2) and (3), c 1>97.5%  (1): c 2>97%  (2): c 2 /c 1<0.995  (3): where c1 is a c-plane degree of orientation that is defined as a ratio of a diffraction intensity of (002) plane to a sum of the diffraction intensity of (002) plane and a diffraction intensity of (100) plane when a surface layer of the aluminum nitride plate is subjected to an X-ray diffraction measurement along a thickness direction of the surface layer, and c2 is a c-plane degree of orientation that is defined as a ratio of the diffraction intensity of (002) plane to the sum of the diffraction intensity of (002) plane and the diffraction intensity of (100) plane when a portion other than the surface layer of the aluminum nitride plate is subjected to the X-ray diffraction measurement along a thickness direction of the portion, and a difference in nitrogen content between the surface layer and the portion other than the surface layer is less than 0.15 percent in weight ratio, wherein the surface layer is a portion included in a layer located at one end of the aluminum nitride plate out of 10 layers obtained by splitting the aluminum nitride plate into 10 along its thickness direction, and the portion is exposed at a surface of the aluminum nitride plate on the one end. 2. The aluminum nitride plate according to claim 1 , wherein a half-value width in an X-ray rocking curve profile of (102) plane of an aluminum nitride crystal in the surface layer is 2.5 degrees or less.

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What does patent US12415728B2 cover?
An aluminum nitride plate satisfies both of a “relation 1: c1>97.5%” and a “relation 2: c2/c1<0.995” where c1 is a c-plane degree of orientation that is defined as a ratio of a diffraction intensity of (002) plane to a sum of the diffraction intensity of (002) plane and a diffraction intensity of (100) plane when the surface layer of the aluminum nitride plate is subjected to an X-ray diffracti…
Who is the assignee on this patent?
Ngk Insulators Ltd
What technology area does this patent fall under?
Primary CPC classification C01B21/072. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 16 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).