Liquid supply apparatus and substrate treatment apparatus including the same

Patent metadata

Field	Value
Publication number	US-12412754-B2
Application number	US-202318242003-A
Country	US
Kind code	B2
Filing date	Sep 5, 2023
Priority date	Nov 24, 2022
Publication date	Sep 9, 2025
Grant date	Sep 9, 2025

Abstract

A liquid supply apparatus is provided. The liquid supply apparatus includes: a base unit having an operating space, an inlet port, through which a treatment liquid is introduced, and an outlet port, through which the treatment liquid is discharged, formed therein; bellows having the operating space formed on its outside within the base unit, including an inlet and an outlet, which form ends of the inlet and outlet ports, respectively, of the base unit and communicate to create a storage space that the treatment liquid flows in and out of, and expanding or contracting to increase or reduce the volume of the storage space; an operating unit supplying operating fluid into or discharging the operating fluid from the operating space; and a drain line communicating with the storage space, from below the base unit, and discharging the treatment liquid, wherein the operating unit supplies the operating fluid into the operating space to enable the bellows to contract, or discharges the operating fluid from the operating space to enable the bellows to expand, and the drain line discharges residual treatment liquid remaining in the storage space to replace the treatment liquid.

First claim

What is claimed is:

1. A liquid supply apparatus comprising:
a base unit having an operating space, an inlet port, through which a treatment liquid is introduced, and an outlet port, through which the treatment liquid is discharged, formed therein;
bellows having the operating space formed on its outside within the base unit, including an inlet and an outlet, which form ends of the inlet and outlet ports, respectively, of the base unit and communicate to create a storage space that the treatment liquid flows in and out of, and expanding or contracting to increase or reduce the volume of the storage space;
an operating unit supplying an operating fluid into or discharging the operating fluid from the operating space; and
a drain line communicating with the storage space, from below the base unit, and discharging the treatment liquid,
wherein
the operating unit supplies the operating fluid into the operating space to enable the bellows to contract, or discharges the operating fluid from the operating space to enable the bellows to expand, and
the drain line discharges residual treatment liquid remaining in the storage space to replace the treatment liquid.

2. The liquid supply apparatus of claim 1 , wherein the outlet of the bellows is provided at a top of the bellows to discharge air along with the treatment liquid without being accumulated in the storage space.

3. The liquid supply apparatus of claim 2 , wherein the inlet of the bellows is provided at the top of the bellows, adjacent to the outlet of the bellows.

4. The liquid supply apparatus of claim 1 , wherein the operating unit includes an operating fluid supply line, which supplies the operating fluid to allow the bellows to expand, and an operating fluid discharge line, which discharges the operating fluid to allow the bellows to contract.

5. The liquid supply apparatus of claim 4 , wherein the operating unit further includes a bypass line, which diverges from the operating fluid supply line and bypasses the treatment liquid.

6. The liquid supply apparatus of claim 1 , wherein the operating fluid includes an inert gas or air.

7. The liquid supply apparatus of claim 1 , wherein the treatment liquid includes a cleaning fluid or a developing solution.

8. The liquid supply apparatus of claim 1 , wherein the drain line discharges the treatment liquid from the storage space with the bellows in its minimally contracted state.

9. A substrate treatment apparatus comprising:
a substrate support unit supporting a substrate;
a cup portion surrounding the substrate support unit;
a nozzle unit connected to a treatment liquid supply line and ejecting a treatment liquid onto the substrate; and
a liquid supply apparatus provided in the treatment liquid supply line and suppling the treatment liquid to the nozzle unit,
wherein
the liquid supply apparatus includes a base unit having an operating space, an inlet port, through which the treatment liquid is introduced, and an outlet port, through which the treatment liquid is discharged, formed therein, bellows having the operating space formed on its outside within the base unit, including an inlet and an outlet, which form ends of the inlet and outlet ports, respectively, of the base unit and communicate to create a storage space that the treatment liquid flows in and out of, and expanding or contracting to increase or reduce the volume of the storage space, an operating unit supplying an operating fluid into or discharging the operating fluid from the operating space, and a drain line communicating with the storage space, from below the base unit, and discharging the treatment liquid,
the operating unit supplies the operating fluid into the operating space to enable the bellows to contract, or discharges the operating fluid from the operating space to enable the bellows to expand, and
the drain line discharges residual treatment liquid remaining in the storage space to replace the treatment liquid.

10. The substrate treatment apparatus of claim 9 , wherein the outlet of the bellows is provided at a top of the bellows.

11. The substrate treatment apparatus of claim 10 , further comprising:
a bubble cutter provided downstream of the liquid supply apparatus and removing bubbles.

12. The substrate treatment apparatus of claim 10 , further comprising:
an air vent provided downstream of the liquid supply apparatus, in the treatment liquid supply line, and discharging dissolved gases.

13. The substrate treatment apparatus of claim 10 , wherein the inlet of the bellows is provided at the top of the bellows, adjacent to the outlet of the bellows.

14. The substrate treatment apparatus of claim 9 , wherein the operating unit includes an operating fluid supply line, which supplies the operating fluid to allow the bellows to expand, and an operating fluid discharge line, which discharges the operating fluid to allow the bellows to contract.

15. The substrate treatment apparatus of claim 14 , wherein the operating unit further includes a bypass line, which diverges from the operating fluid supply line and bypasses the treatment liquid.

16. The substrate treatment apparatus of claim 9 , wherein the operating fluid includes an inert gas or air.

17. The substrate treatment apparatus of claim 9 , wherein the treatment liquid includes a cleaning fluid or a developing solution.

18. The substrate treatment apparatus of claim 9 , wherein the drain line discharges the treatment liquid from the storage space with the bellows in its minimally contracted state.

19. A liquid supply apparatus having a treatment liquid supply line connected thereto and supplying the treatment liquid to a nozzle unit, which ejects the treatment liquid onto a substrate, the liquid supply apparatus comprising:
a base unit having an operating space, an inlet port, which is formed through an upper part of the base unit and through which treatment liquid is introduced, and an outlet port, which is formed through the upper part of the base unit adjacent to the inlet port and through which the treatment liquid is discharged, formed therein;
bellows having the operating space formed on its outside within the base unit, including an inlet and an outlet, which form ends of the inlet and outlet ports, respectively, of the base unit and communicate to create a storage space that the treatment liquid flows in and out of, and expanding or contracting to increase or reduce the volume of the storage space;
an operating unit supplying an operating fluid, which includes an inert gas or air, into or discharging the operating fluid from the operating space; and
a drain line communicating with the storage space, from below the base unit, and discharging the treatment liquid,
wherein
the operating unit supplies the operating fluid into the operating space to enable the bellows to contract, or discharges the operating fluid from the operating space to enable the bellows to expand, and
the drain line discharges residual treatment liquid remaining in the storage space in a state where the contraction and expansion of the bellows have stopped with the bellows in its minimally contracted state.

Assignees

• Semes Co Ltd

Inventors

• Kim Kang Sul
• Kim Tae Keun
• Lee Kyeong Min

Classifications

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0448

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/0404 Primary

  for general liquid treatment, e.g. etching followed by cleaning · CPC title

• F05B2210/12

  gaseous, i.e. compressible · CPC title