Aromatic underlayer

Patent metadata

Field	Value
Publication number	US-12411409-B2
Application number	US-202117245326-A
Country	US
Kind code	B2
Filing date	Apr 30, 2021
Priority date	Nov 2, 2018
Publication date	Sep 9, 2025
Grant date	Sep 9, 2025

Abstract

Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.

First claim

What is claimed is:

1. A method comprising: (a) providing an electronic device substrate; (b) coating a layer of a coating composition comprising one or more curable compounds on a surface of the electronic device substrate, wherein the one or more curable compounds comprise an aromatic core chosen from a C 5-6 aromatic ring and a C 9-30 fused aromatic ring system and three or more substituents of formula (1)

wherein at least two substituents of formula (1) are attached to the aromatic core; and wherein Ar 1 is an aromatic ring or fused aromatic ring system having from 5 to 30 carbons; Z is a substituent chosen from OR 1 , protected hydroxyl, carboxyl, protected carboxyl, SR 1 , protected thiol, —O—C(═O)—C 1-6 -alkyl, halogen, and NHR 2 ; each R 1 is chosen from H, C 1-10 alkyl, C 2-10 unsaturated hydrocarbyl, and C 5-30 aryl; each R 2 is chosen from H, C 1-10 alkyl, C 2-10 unsaturated hydrocarbyl, C 5-30 aryl, C(═O)—R 1 , and S(═O) 2 —R 1 ; x is an integer from 1 to 4; and * denotes the point of attachment to the aromatic core; wherein Ar 1 is not further substituted beyond the Z substituent(s) and the alkyne-containing substituent; provided that no substituents of formula (1) are in an ortho position to each other on the same ring of the aromatic core; (c) curing the layer of the curable compound to form an underlayer; (d) coating a layer of a photoresist on the underlayer; (e) exposing the photoresist layer to actinic radiation through a mask; (f) developing the exposed photoresist layer to form a resist pattern; and (g) transferring the pattern to the underlayer to expose portions of the electronic device substrate.

2. The method of claim 1 further comprising the steps of patterning the substrate; and then removing the patterned underlayer.

3. The method of claim 1 further comprising the step of coating one or more of a silicon-containing layer, an organic antireflective coating layer and a combination thereof over the underlayer before step (d).

4. The method of claim 3 further comprising the step of transferring the pattern to the one or more of the silicon-containing layer, the organic antireflective coating layer and the combination thereof after step (f) and before step (g).

5. The method of claim 1 wherein each Z is independently chosen from OR 1 , protected hydroxyl, carboxyl, protected carboxyl, SH, fluorine and NR 2 .

6. The method of claim 1 wherein aromatic core is chosen from pyridine, benzene, naphthalene, quinoline, isoquinoline, anthracene, phenanthrene, pyrene, coronene, triphenylene, chrysene, phenalene, benz[a]anthracene, dibenz[a,h]anthracene, and benzo[a]pyrene.

7. The method of claim 1 wherein each Ar 1 is independently chosen from pyridine, benzene, naphthalene, quinoline, isoquinoline, anthracene, phenanthrene, pyrene, coronene, triphenylene, chrysene, phenalene, benz[a]anthracene, dibenz[a,h]anthracene, and benzo[a]pyrene.

8. The method of claim 1 wherein the coating composition further comprises one or more of an organic solvent, a curing agent, and a surface leveling agent.

9. An electronic device comprising an electronic device substrate having a layer of a polymer comprising as polymerized units one or more curable compounds on a surface of the electronic device substrate, wherein the one or more curable compounds comprise an aromatic core chosen from a C 5-6 aromatic ring and a C 9-30 fused aromatic ring system and three or more substituents of formula (1)

wherein at least two substituents of formula (1) are attached to the aromatic core; and wherein Ar 1 is an aromatic ring or fused aromatic ring system having from 5 to 30 carbons; Z is a substituent chosen from OR 1 , protected hydroxyl, carboxyl, protected carboxyl, SR 1 , protected thiol, —O—C(═O)—C 1-6 -alkyl, halogen, and NHR 2 ; each R 1 is chosen from H, C 1-10 alkyl, C 2-10 unsaturated hydrocarbyl, and C 5-30 aryl; each R 2 is chosen from H, C 1-10 alkyl, C 2-10 unsaturated hydrocarbyl, C 5-30 aryl, C(═O)—R 1 , and S(═O) 2 -R 1 ; x is an integer from 1 to 4; and * denotes the point of attachment to the aromatic core; wherein Ar 1 is not further substituted beyond the Z substituent(s) and the alkyne-containing substituent; provided that no substituents of formula (1) are in an ortho position to each other on the same ring of the aromatic core.

10. The method of claim 5 wherein each Z is OH.

11. The method of claim 1 wherein each Ar 1 is independently chosen from pyridine, benzene, naphthalene, quinoline, isoquinoline, anthracene, phenanthrene, pyrene, coronene, triphenylene, chrysene, phenalene, benz[a]anthracene, dibenz[a,h]anthracene, and benzo[a]pyrene.

12. The method of claim 11 wherein each Ar 1 is benzene.

13. The method of claim 12 wherein each Z is OH.

Assignees

• Rohm & Haas Elect Mat

Inventors

• Liu Sheng
• Cameron James F
• Yamada Shintaro
• Ke Iou-Sheng
• Zhang Keren
• Greene Daniel
• Labeaume Paul J
• Cui Li
• Coley Suzanne M

Classifications

• C09D5/006

  Anti-reflective coatings · CPC title

• G03F7/0752

  in non photosensitive layers or as additives, e.g. for dry lithography · CPC title

• G03F7/091

  characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement · CPC title

• G03F7/11 Primary

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title

• G03F7/094 Primary

  Multilayer resist systems, e.g. planarising layers · CPC title