Spray evaporation of a liquid raw material for preparation of silicon dioxide and metal oxides

US12410061B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12410061-B2
Application numberUS-201816628664-A
CountryUS
Kind codeB2
Filing dateJun 27, 2018
Priority dateJul 5, 2017
Publication dateSep 9, 2025
Grant dateSep 9, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to a process for preparing a metal oxide,comprising a) spraying a liquid raw material comprising at least one metal compound by mixing it with a gas to form an aerosol;b) forming a gaseous reaction mixture from the aerosol obtained in step a) by complete evaporation thereof;c) converting the gaseous reaction mixture obtained in step b) to metal oxide in the presence of oxygen.

First claim

Opening claim text (preview).

The invention claimed is: 1. A process for preparing silicon dioxide and/or a metal oxide, comprising the following steps: a) forming an aerosol by spraying a liquid raw material comprising at least one silicon compound and/or a metal compound into a gas stream; b) forming a gaseous reaction mixture by complete evaporation of the aerosol obtained in step a); c) converting the gaseous reaction mixture that was formed by complete evaporation in step b) to silicon dioxide and/or a metal oxide by reacting the gaseous reaction mixture in a flame at an adiabatic flame temperature of more than 500° C. in the presence of oxygen; wherein the process takes place in a reactor comprising reaction zones A and B, and wherein: step b) takes place entirely in zone A; step c) takes place entirely in zone B. 2. The process of claim 1 , wherein evaporation in step b) comprises heating the aerosol and/or reducing the partial pressure of the evaporated liquid in the gas stream. 3. The process of claim 2 , wherein evaporation in step b) comprises preheating the gas to a temperature of 50 to 400° C. 4. The process of claim 2 , wherein evaporation in step b) comprises preheating the gas to a temperature of 80 to 350° C. 5. The process of claim 4 , and wherein the adiabatic flame temperature during step c) is 1000-2500° C. 6. The process of claim 1 , wherein the aerosol formed in step a) comprises liquid droplets having a numerical average particle size of not more than 2 mm, wherein the aerosol is a biphasic liquid/gas mixture with the liquid droplets finely distributed in the gas. 7. The process of claim 1 , wherein the silicon compound is used for preparation of silicon dioxide. 8. The process of claim 7 , wherein the silicon compound is a non-halogenated compound selected from the group consisting of: tetraalkoxyorthosilicates; silanes; silicone oils; polysiloxanes and cyclic polysiloxanes; silazanes; and mixtures thereof. 9. The process of claim 7 , wherein the silicon compound is a chlorinated compound selected from the group consisting of: silicon tetrachloride; dichlorosilane; trichlorosilane; methyltrichlorosilane; dimethyldichlorosilane; methyldichlorosilane; dibutyldichloro-silane; ethyltrichlorosilane; propyltrichlorosilane; and mixtures thereof. 10. The process of claim 9 , wherein evaporation in step b) comprises preheating the gas to a temperature of 80 to 350° C. 11. The process of claim 10 , and wherein the adiabatic flame temperature during step c) is 1000-2500° C. 12. The process of claim 11 , wherein the aerosol formed in step a) comprises liquid droplets having a numerical average particle size of not more than 2 mm. 13. The process of claim 11 , wherein the ratio of gas volume in standard cubic metres used in total in steps a) and b) to the amount of the liquid raw material used in kilograms is from 0.1 to 100 m 3 (STP)/kg. 14. The process of claim 1 , wherein a metal oxide is prepared comprising at least one of the elements Al, Ce, Fe, Mg, In, Ti, Sn, Y, Zn and/or Zr as the metal component. 15. The process of claim 14 , wherein evaporation in step b) comprises preheating the gas to a temperature of 80 to 350° C. 16. The process of claim 15 , and wherein the adiabatic flame temperature during step c) is 1000-2500° C. 17. The process of claim 16 , wherein the aerosol formed in step a) comprises liquid droplets having a numerical average particle size of not more than 2 mm. 18. The process of claim 16 , wherein the ratio of gas volume in standard cubic metres used in total in steps a) and b) to the amount of the liquid raw material used in kilograms is from 0.1 to 100 m 3 (STP)/kg. 19. The process of claim 1 , wherein the liquid raw material used in step a), prior to performance of step a), has a pressure of at least 1.5 bar and the gas mixture obtained in step b) has a pressure of not more than 1.2 bar. 20. The process of claim 19 , wherein the aerosol formed in step a) comprises liquid droplets having a numerical average particle size of not more than 2 mm and the ratio of gas volume in standard cubic metres used in total in steps a) and b) to the amount of the liquid raw material used in kilograms is from 0.1 to 100 m 3 (STP)/kg.

Assignees

Inventors

Classifications

  • Particles characterised by their size · CPC title

  • C01G23/07Primary

    Producing by vapour phase processes, e.g. halide oxidation · CPC title

  • by oxidation or hydrolysis of sprayed or atomised solutions · CPC title

  • C01B33/183Primary

    by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane · CPC title

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What does patent US12410061B2 cover?
The present invention relates to a process for preparing a metal oxide,comprising a) spraying a liquid raw material comprising at least one metal compound by mixing it with a gas to form an aerosol;b) forming a gaseous reaction mixture from the aerosol obtained in step a) by complete evaporation thereof;c) converting the gaseous reaction mixture obtained in step b) to metal oxide in the presenc…
Who is the assignee on this patent?
Evonik Operations Gmbh
What technology area does this patent fall under?
Primary CPC classification C01G23/07. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 09 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).