Acoustically decoupled MEMS devices

US12407322B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12407322-B2
Application numberUS-202318451675-A
CountryUS
Kind codeB2
Filing dateAug 17, 2023
Priority dateMar 5, 2018
Publication dateSep 2, 2025
Grant dateSep 2, 2025

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Abstract

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A resonator element of the monocrystalline 4H or 6H polytype of silicon carbide. A MEMS device including the resonator element and a substrate, wherein the resonator element and the substrate are not coplanar, and acoustic decoupling of the resonator element and the substrate is at least partially dependent upon a degree to which the resonator element and the substrate are not coplanar. A MEMS gyroscope including the resonator element, a substrate, one or more electrodes disposed proximate the resonator element, and a capacitive gap disposed between each electrode and the resonator element. A MEMS device including the resonator element having has a Q greater than 1,000,000, a phononic crystal substrate, and a gap disposed between a perimeter edge of the resonator element and the phononic crystal substrate, wherein acoustic decoupling of the resonator element and the phononic crystal substrate is at least partially dependent upon a size of the gap.

First claim

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What is claimed is: 1. A MEMS device comprising: a resonator element having a frequency and comprising a transversely isotropic monocrystalline material; and a quarter-wavelength matched phononic crystal substrate; wherein: the resonator element is anchored to the quarter-wavelength matched phononic crystal substrate; the resonator element and the quarter-wavelength matched phononic crystal substrate are not coplanar; the resonator element and the quarter-wavelength matched phononic crystal substrate are configured to preserve resonant mode symmetry to minimize frequency split between resonant modes; and acoustic decoupling of the resonator element and the quarter-wavelength matched phononic crystal substrate is at least partially dependent upon the frequency of the resonator element. 2. The MEMS device of claim 1 , wherein the resonator element has a quality factor (Q) greater than 5,000,000. 3. The MEMS device of claim 1 , wherein the resonator element comprises the monocrystalline 4H or 6H polytype of silicon carbide (SIC). 4. The MEMS device of claim 1 , wherein the resonator element is fabricated using lithography-based batch fabrication processing at wafer level. 5. The MEMS device of claim 1 , wherein the resonator element is a bulk acoustic wave (BAW) resonator element. 6. The MEMS device of claim 1 further comprising: a pedestal having an aspect-ratio and being disposed between the resonator element and the quarter-wavelength matched phononic crystal substrate; wherein: the MEMS device is gyroscope; the acoustic decoupling is further at least partially dependent by the aspect-ratio of the pedestal; and the resonator element operates in gyroscopic modes with frequency above 1 MHz. 7. The MEMS device of claim 6 , wherein the resonator element is a BAW resonator element having gyroscopic modes. 8. The MEMS device of claim 7 further comprising: transducers disposed proximate the BAW resonator element; wherein the BAW resonator element and transducers are integrated with the quarter-wavelength matched phononic crystal substrate. 9. The MEMS device of claim 8 , wherein each of the transducers is selected from the group consisting of a drive transducer, a sense transducer, and a control transducer. 10. The MEMS device of claim 9 , wherein each of the transducers have the same size. 11. The MEMS device of claim 1 further comprising: one or more electrodes disposed proximate a surface of the resonator element; and a capacitive gap disposed between each electrode and the surface of the resonator element. 12. The MEMS device of claim 11 further comprising: an Si wafer; wherein: the resonator element comprises a 4H-SiC wafer having a Si-face on one side and a C-face on the other side; and the Si wafer is fusion bonded on the C-face of the 4H-SiC wafer. 13. The MEMS device of claim 11 , wherein: each electrode is disposed proximate a perimeter edge of the resonator element; each capacitive gap is disposed between the electrode and the perimeter edge of the resonator element; and each electrode is selected from the group consisting of a capacitively-coupled drive electrode, a sense electrode, and a control electrode. 14. The MEMS device of claim 13 , wherein the resonator element has a quality factor (Q) greater than 5,000,000. 15. The MEMS device of claim 13 , wherein the resonator element has gyroscopic modes. 16. The MEMS device of claim 13 , wherein the resonator element is fabricated using lithography-based batch fabrication processing at wafer level. 17. The MEMS device of claim 13 , wherein the resonator element is a bulk acoustic wave (BAW) resonator element. 18. The MEMS device of claim 13 comprising two or more electrodes; wherein each of the electrodes share at least one common characteristic. 19. The MEMS device of claim 18 , wherein one common characteristic is selected from the group consisting of a size and a shape. 20. A MEMS device comprising: a resonator element having a frequency and comprising a transversely isotropic monocrystalline material with a perimeter edge and having has a quality factor (Q) greater than 5,000,000; a quarter wavelength-matched phononic crystal substrate; and a gap disposed between the perimeter edge of the resonator element and the quarter wavelength-matched phononic crystal substrate; wherein: a native frequency split and a quality factor mismatch are minimized by preserving resonant mode symmetry; and acoustic decoupling of the resonator element and the quarter-wavelength matched phononic crystal substrate is at least partially dependent upon; a size of the gap; and the frequency of the resonator element. 21. The MEMS device of claim 20 further comprising: a pedestal having an aspect-ratio and being disposed between the resonator element and the quarter-wavelength matched phononic crystal substrate; wherein acoustic decoupling of the resonator element and the quarter-wavelength matched phononic crystal substrate is further at least partially dependent by the aspect-ratio of the pedestal.

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What does patent US12407322B2 cover?
A resonator element of the monocrystalline 4H or 6H polytype of silicon carbide. A MEMS device including the resonator element and a substrate, wherein the resonator element and the substrate are not coplanar, and acoustic decoupling of the resonator element and the substrate is at least partially dependent upon a degree to which the resonator element and the substrate are not coplanar. A MEMS …
Who is the assignee on this patent?
Georgia Tech Res Inst
What technology area does this patent fall under?
Primary CPC classification H03H9/2436. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 02 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).