Resist underlayer film-forming composition containing substituted crosslinkable compound

Patent metadata

Field	Value
Publication number	US-12405533-B2
Application number	US-202016986921-A
Country	US
Kind code	B2
Filing date	Aug 6, 2020
Priority date	Jun 26, 2013
Publication date	Sep 2, 2025
Grant date	Sep 2, 2025

Abstract

A resist underlayer film-forming composition includes a resin; and a crosslinkable compound of Formula (1) or Formula (2):

wherein the crosslinkable compound of Formula (1) or Formula (2) is a compound obtained by reacting a compound of Formula (3) or Formula (4):

with an ether compound comprising a hydroxy group or a C 2-10 alcohol.

First claim

The invention claimed is:

1. A resist underlayer film-forming composition comprising:
a resin, wherein the resin is a novolac resin obtained by condensing an aromatic ring-containing compound with an aldehyde compound or a ketone compound, wherein the aromatic ring-containing compound is selected from the group consisting of benzene, naphthalene, phloroglucinol, hydroxynaphthalene, fluorene, carbazole, bisphenol, bisphenol S, diphenylamine, triphenylamine, phenylnaphthylamine, anthracene, hydroxyanthracene, phenothiazine, phenoxazine and phenylindole;
a crosslinkable compound,
wherein the crosslinkable compound is selected from the group consisting of

and
an acid catalyst, wherein the acid catalyst is one or more of p-toluenesulfonic acid, trifluoromethanesulfonic acid, pyridinium p-toluenesulfonate, salicylic acid, 5-sulfosalicylic acid, 4-phenolsulfonic acid, 4-chlorobenzenesulfonic acid, benzenedisulfonic acid, 1-naphthalenesulfonic acid, citric acid, benzoic acid, hydroxybenzoic acid, and naphthalene carboxylic acid.

2. A resist underlayer film-forming composition comprising:
a novolac resin, wherein the novolac resin is obtained by reacting an aromatic ring-containing compound with an aldehyde compound or a ketone compound, the aromatic ring-containing compound being at least one selected from the group consisting of benzene, naphthalene, fluorene, carbazole, diphenylamine, triphenylamine, phenylnaphthylamine, anthracene, phenothiazine, phenoxazine, and phenylindole; the aldehyde compound being at least one selected from the group consisting of acetaldehyde, propylaldehyde, butyraldehyde, isobutyraldehyde, valeraldehyde, capronaldehyde, 2-methylbutyraldehyde, hexylaldehyde, undecanealdehyde, 7-methoxy-3,7-dimethyloctylaldehyde, cyclohexanealdehyde, 3-methyl-2-butyraldehyde, glyoxal, malonaldehyde, succinaldehyde, glutaraldehyde, adipaldehyde, heterocyclic aldehydes and aromatic aldehydes; and
a crosslinkable compound selected from the group consisting of

Assignees

• Nissan Chemical Ind Ltd

Inventors

• Hashimoto Keisuke
• Takase Kenji
• Shinjo Tetsuya
• Sakamoto Rikimaru
• Endo Takafumi
• Nishimaki Hirokazu

Classifications

• H10P50/287

  by chemical means · CPC title

• H10P50/73

  using masks for insulating materials · CPC title

• C07C43/1785

  having more than one ether bound · CPC title

• C07C39/10

  Polyhydroxy benzenes; Alkylated derivatives thereof (C07C39/08 takes precedence) · CPC title

• G03F7/40

  Treatment after imagewise removal, e.g. baking · CPC title