Color filter, method for fabricating same, and display panel

Patent metadata

Field	Value
Publication number	US-12405496-B2
Application number	US-202217785082-A
Country	US
Kind code	B2
Filing date	Jun 8, 2022
Priority date	May 17, 2022
Publication date	Sep 2, 2025
Grant date	Sep 2, 2025

Abstract

A method for fabricating a color filter includes: providing a substrate; forming a first photoresist material layer on the substrate; patterning the first photoresist material layer to form a plurality of first photoresists; forming a second photoresist material layer on the first photoresists and the substrate, wherein the second photoresist material layer comprises a plurality of dye molecules; and patterning the second photoresist material layer to form a plurality of second photoresists. The patterning the first photoresist material layer to form the first photoresists includes: controlling curing process parameters of the first photoresists to increase a density of the first photoresists, thereby preventing the dye molecules from entering the first photoresists.

First claim

What is claimed is:

1. A method for fabricating a color filter, comprising:
providing a substrate;
forming a first photoresist material layer on the substrate;
patterning the first photoresist material layer to form a plurality of first photoresists;
forming a second photoresist material layer on the first photoresists and the substrate, wherein the second photoresist material layer comprises a plurality of dye molecules; and
patterning the second photoresist material layer to form a plurality of second photoresists;
wherein the patterning the first photoresist material layer to form forming the first photoresists comprises:
controlling curing process parameters of the first photoresists to increase a density of the first photoresists, thereby preventing the dye molecules from entering the first photoresists,
wherein each of the first photoresists comprises:
a first photoresist portion disposed on a side of the substrate; and
a second photoresist portion disposed on a side of the first photoresist portion away from the substrate;
wherein a density of the second photoresist portion is greater than a density of the first photoresist portion, so as to prevent the dye molecules from entering the first photoresists; or
wherein each of the first photoresists comprises:
a first photoresist portion disposed on a side of the substrate; and
a third photoresist portion covering the substrate and the first photoresist portion;
wherein a density of the third photoresist portion is greater than a density of the first photoresist portion, so as to prevent the dye molecules from entering the first photoresists.

2. The method for fabricating the color filter according to claim 1 , wherein the controlling the curing process parameters of the first photoresists comprises:
providing a first mask;
photo-curing the first photoresist material layer from a side of the first mask away from the substrate;
developing the photo-cured first photoresist material layer; and
heat-curing the developed first photoresist material layer to form the first photoresists;
wherein one or more of an exposure energy value of the photo-curing is adjusted, and/or a temperature of the heat-curing is increased, and/or and a time of the heat-curing are increased, so as to increase the density of the first photoresists, thereby preventing the dye molecules from entering the first photoresists.

3. The method for fabricating the color filter according to claim 2 , wherein the exposure energy value is 40 mJ/cm 2 to 90 mJ/cm 2 , the temperature of the heat-curing is 230° C. to 350° C., and the time of the heat-curing is 20 minutes to 90 minutes.

4. The method for fabricating the color filter according to claim 1 , wherein the patterning the second photoresist material layer to form forming the second photoresists comprises:
providing a second mask;
photo-curing the second photoresist material layer from a side of the second mask away from the substrate;
developing the photo-cured second photoresist material layer; and
heat-curing the developed second photoresist material layer to form the second photoresists.

5. The method for fabricating the color filter according to claim 1 , wherein the first photoresists comprise the same dye molecules as the second photoresists.

6. The method for fabricating the color filter according to claim 5 , wherein the dye molecules have a particle size of 1 nm to 3 nm.

7. The method for fabricating the color filter according to claim 1 , before forming the second photoresists or before forming the first photoresists, further comprising:
forming a plurality of third photoresists, which comprises:
controlling curing process parameters of the third photoresists to increase a density of the third photoresists, thereby preventing the dye molecules from entering the third photoresists.

8. The method for fabricating the color filter according to claim 7 , before forming the first photoresists and the second photoresists, further comprising:
forming a black matrix material layer on the substrate; and
patterning the black matrix material layer to form a plurality of black matrices spaced apart from each other;
wherein each of the first photoresists, the second photoresists, and the third photoresists is formed between at least two adjacent black matrices.

9. The method for fabricating the color filter according to claim 8 , wherein one of the first photoresist, the second photoresist, and the third photoresist is one of a red photoresist, a green photoresist, and a blue photoresist, and the first photoresist, the second photoresist, and the third photoresist have different colors.

10. A color filter, comprising a plurality of first photoresists and a plurality of second photoresists, wherein the second photoresists comprise a plurality of dye molecules, and a density of the first photoresists is greater than a predetermined value, thereby preventing the dye molecules from entering the first photoresists, wherein each of the first photoresists comprises:
a first photoresist portion disposed on a side of the substrate; and
a second photoresist portion disposed on a side of the first photoresist portion away from the substrate;
wherein a density of the second photoresist portion is greater than a density of the first photoresist portion, so as to prevent the dye molecules from entering the first photoresists; or
wherein each of the first photoresists comprises:
a first photoresist portion disposed on a side of the substrate; and
a third photoresist portion covering the substrate and the first photoresist portion;
wherein a density of the third photoresist portion is greater than a density of the first photoresist portion, so as to prevent the dye molecules from entering the first photoresists.

11. The color filter according to claim 10 , wherein the first photoresists comprise the same dye molecules as the second photoresists.

12. The color filter according to claim 10 , wherein the dye molecules have a particle size of 1 nm to 3 nm.

13. The color filter according to claim 10 , further comprising a plurality of third photoresists, wherein one of the first photoresist, the second photoresist, and the third photoresist is one of a red photoresist, a green photoresist, and a blue photoresist, and the first photoresist, the second photoresist, and the third photoresist have different colors.

14. The color filter according to claim 10 , further comprising a plurality of black matrices, wherein each of the first photoresists, the second photoresists, and the third photoresists is formed between at least two adjacent black matrices.

15. A display panel, comprising:
a color filter comprising a plurality of first photoresists and a plurality of second photoresists, wherein the second photoresists comprise a plurality of dye molecules, and a density of the first photoresists is greater than a predetermined value, thereby preventing the dye molecules from entering the first photoresists;
an array substrate disposed opposite to the color filter; and
a liquid crystal layer disposed between the array substrate and the color filter,
wherein each of the first photoresists comprises:
a first photoresist portion disposed on a side of the substrate; and
a second photoresist portion disposed on a side of the first photoresist portion away from the substrate;
wherein a density of the second photoresist portion is greater than a density of the first photoresist portion, so as to prevent the dye molecules from entering the first photoresists; or
wherein each of the first photoresists comprises:
a first photores

Assignees

• Guangzhou China Star Optoelectronics Semiconductor Display Tech Co Ltd

Inventors

• Zhang Yuxiu
• Wen Hailong

Classifications

• G03F7/0007

  Filters, e.g. additive colour filters; Components for display devices · CPC title

• G02F1/133512

  Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence) · CPC title

• G03F7/105

  having substances, e.g. indicators, for forming visible images · CPC title

• G02F1/133514

  Colour filters · CPC title

• G02F1/133516 Primary

  Methods for their manufacture, e.g. printing, electro-deposition or photolithography · CPC title