High throughput electro-thermal poling

US12404208B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12404208-B2
Application numberUS-202318244992-A
CountryUS
Kind codeB2
Filing dateSep 12, 2023
Priority dateJan 31, 2020
Publication dateSep 2, 2025
Grant dateSep 2, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An apparatus for continuous electro-thermal poling of glass or glass ceramic material, includes a lower support conveying and contacting electrode structure, an upper contacting electrode structure positioned above the lower support structure, and one or more DC bias voltage sources connected to one or both of the upper contacting structure and the lower support structure. A process for continuous electro-thermal poling of glass or glass ceramic sheets or substrates includes heating the sheet or substrate, feeding the sheet or substrate continuously or continually, while applying a DC voltage bias, and cooling the sheet or substrate to within 0-30° C. of ambient temperature.

First claim

Opening claim text (preview).

What is claimed is: 1. A process for continuous electro-thermal poling a sheet or substrate of glass or glass ceramic material comprising a first surface and a second surface, the process comprising: heating the sheet or substrate to a temperature Te within a range of from 100° C. to Tg, where Tg is the glass transition temperature of the material of the sheet or substrate; feeding the sheet or substrate continuously or continually while applying a DC voltage bias VB within a range of from 100V to 10 kV, wherein the feeding and applying comprise physically and electrically contacting the first surface with at least one first roller that is one of an anode or a cathode electrically connected to a DC voltage source and contacting the second surface with the other of the anode or the cathode electrically connected to the DC voltage source; applying the DC voltage bias VB, whether constant or ramped or both, for a time Ti within a range of from 2 seconds to 30 minutes; and cooling the sheet or substrate to within 0-30° C. of ambient temperature. 2. The process of claim 1 , wherein the step of heating is conducted in continuous fashion. 3. The process of claim 1 , wherein the other of the anode or the cathode comprises at least one second roller. 4. The process of claim 3 , wherein the at least one first roller comprises a first plurality of rollers connected electrically in parallel and the at least one second roller comprises a second plurality of rollers connected electrically in parallel. 5. The process of claim 3 , wherein the at least one first roller comprises a first plurality of rollers and the at least one second roller comprises a second plurality of rollers, and further comprising controlling the applied DC voltage bias VB to at least some rollers of the first plurality of rollers and the second plurality of rollers independently. 6. The process of claim 1 , wherein the sheet or substrate is cooled within 0-10° C. of ambient temperature.

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What does patent US12404208B2 cover?
An apparatus for continuous electro-thermal poling of glass or glass ceramic material, includes a lower support conveying and contacting electrode structure, an upper contacting electrode structure positioned above the lower support structure, and one or more DC bias voltage sources connected to one or both of the upper contacting structure and the lower support structure. A process for continu…
Who is the assignee on this patent?
Corning Inc
What technology area does this patent fall under?
Primary CPC classification C03C23/009. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 02 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).