Scintillator material and radiation detector
US-2019113635-A1 · Apr 18, 2019 · US
US12399288B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12399288-B2 |
| Application number | US-202318106789-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 7, 2023 |
| Priority date | Feb 16, 2022 |
| Publication date | Aug 26, 2025 |
| Grant date | Aug 26, 2025 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A method of manufacturing a scintillator material includes providing a substrate made of a quartz glass and having a recess formed therein; filling the recess with a raw material powder obtained by mixing an iodide raw material and SiO 2 fine particles; after filling the recess, disposing a lid on the substrate to cover the recess; and after disposing the lid, heating the substrate, thereby forming a nanocomposite layer in which an iodide phosphor is introduced into a cristobalite structure.
Opening claim text (preview).
What is claimed is: 1. A method of manufacturing a scintillator material, the method comprising: providing a substrate made of a quartz glass and having a recess formed therein; filling the recess with a raw material powder obtained by mixing an iodide raw material and SiO 2 fine particles; after filling the recess, disposing a lid on the substrate to cover the recess; and after disposing the lid, heating the substrate, thereby forming a nanocomposite layer in which an iodide phosphor is introduced into a cristobalite structure. 2. The method according to claim 1 , wherein an average particle diameter (D50) of the SiO 2 fine particles falls in a range of 0.1 μm or more and 10 μm or less. 3. The method according to claim 1 , wherein a content of the SiO 2 fine particles is 10 mol % or more and 600 mol % or less with respect to the iodide raw material. 4. The method according to claim 1 , wherein in the filling the recess, alkali halide is added into the recess. 5. The method according to claim 1 , wherein a depth of the recess falls in a range of 0.5 mm or more and 3.0 mm or less. 6. The method according to claim 1 , wherein a thickness of the nanocomposite layer is 0.1 mm or more. 7. A scintillator material excited by an irradiation to emit visible light, the scintillator material comprising: a substrate made of a quartz glass and having a recess formed therein; and a nanocomposite layer in which an iodide phosphor is introduced into a cristobalite structure, in the recess, wherein a thickness of the nanocomposite layer is 0.1 mm or more.
Pure silica glass, e.g. pure fused quartz · CPC title
SiO2 · CPC title
Halides · CPC title
Mixtures · CPC title
consisting of particles only · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.