Wound treatment apparatuses and methods with negative pressure source integrated into wound dressing

US12396895B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12396895-B2
Application numberUS-202318207601-A
CountryUS
Kind codeB2
Filing dateJun 8, 2023
Priority dateMar 7, 2016
Publication dateAug 26, 2025
Grant dateAug 26, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed embodiments relate to apparatuses and methods for wound treatment. In some embodiments, a negative pressure source is incorporated into a wound dressing apparatus so that the wound dressing and the negative pressure source are part of an integral or integrated wound dressing structure that applies the wound dressing and the negative pressure source simultaneously to a patient's wound. The negative pressure source and/or electronic components may be positioned between a wound contact layer and a cover layer of the wound dressing. The negative pressure source and/or electronic components may be separated and/or partitioned from an absorbent area of the dressing. A switch may be integrated with the wound dressing to control operation of the wound dressing apparatus. A connector may be direct air from an outlet of the negative pressure source to the environment. A non-return valve may inhibit back flow of air into the wound dressing.

First claim

Opening claim text (preview).

What is claimed is: 1. A wound dressing apparatus comprising: a wound contact layer configured to be positioned in contact with a wound; a first area over the wound contact layer comprising: a lower spacer layer; an absorbent layer; a second area over the wound contact layer comprising a plurality of spacer layers and a negative pressure source and/or electronic components positioned within or between the plurality of spacer layers, wherein the first area is positioned adjacent to the second area and separated by a partition; an upper spacer layer configured to cover the first area and the second area and to allow air to be communicated between the first area and second area around the partition; and a cover layer configured to cover and form a seal over the wound contact layer, the upper spacer layer, the first area, and the second area. 2. The wound dressing apparatus of claim 1 , wherein the plurality of spacer layers in the second area comprise a third spacer layer beneath the negative pressure source and/or electronic components and a fourth spacer layer positioned above the negative pressure source and/or electronic components, wherein the fourth spacer layer comprises one or more cutouts or recesses configured to receive the negative pressure source and/or electronic components. 3. The wound dressing apparatus of claim 1 , wherein the partition comprises a non-porous dam. 4. The wound dressing apparatus of claim 1 , further comprising one or more user interface components configured to allow a user to operate the negative pressure source and/or electronic components.

Assignees

Inventors

Classifications

  • having more than one layer with different fluid retention characteristics · CPC title

  • with absorbent fibrous layers, e.g. woven or non-woven absorbent pads or island dressings · CPC title

  • Valve comprising a resilient or deformable element, e.g. flap valve, deformable disc · CPC title

  • Check- or non-return valves · CPC title

  • Suction control (underwater drainage A61M1/61) · CPC title

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What does patent US12396895B2 cover?
Disclosed embodiments relate to apparatuses and methods for wound treatment. In some embodiments, a negative pressure source is incorporated into a wound dressing apparatus so that the wound dressing and the negative pressure source are part of an integral or integrated wound dressing structure that applies the wound dressing and the negative pressure source simultaneously to a patient's wound.…
Who is the assignee on this patent?
Smith & Nephew
What technology area does this patent fall under?
Primary CPC classification A61M1/784. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue Aug 26 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).