Electro-absorption modulators with stacked waveguide tapers
US-2024085624-A1 · Mar 14, 2024 · US
US12386116B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12386116-B2 |
| Application number | US-202318125428-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 23, 2023 |
| Priority date | Jun 21, 2022 |
| Publication date | Aug 12, 2025 |
| Grant date | Aug 12, 2025 |
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A semiconductor optical device includes a substrate a spot-size converter, an optical detector, a core layer and a first III-V compound semiconductor layer, the core layer is disposed between the substrate and the first III-V compound semiconductor layer, the optical detector includes a light absorbing layer, a second III-V compound semiconductor layer, and an insulating film, the light absorbing layer is disposed between the substrate and the second III-V compound semiconductor layer, the second III-V compound semiconductor layer is disposed between the light absorbing layer and the insulating film, the light absorbing layer is optically coupled to the core layer, the spot-size converter has a first end face connected to the optical detector and a second end face opposite to the first end face, and the first III-V compound semiconductor layer is connected to the second III-V compound semiconductor layer and the insulating film at the first end face.
Opening claim text (preview).
What is claimed is: 1. A semiconductor optical device comprising: a substrate having a main surface including a first region and a second region adjacent to the first region; a spot-size converter disposed in the first region; and an optical detector disposed in the second region, wherein the spot-size converter includes a core layer and a first III-V compound semiconductor layer, wherein the core layer is disposed between the substrate and the first III-V compound semiconductor layer, wherein the optical detector includes a light absorbing layer, a second III-V compound semiconductor layer, and an insulating film, wherein the light absorbing layer is disposed between the substrate and the second III-V compound semiconductor layer, wherein the second III-V compound semiconductor layer is disposed between the light absorbing layer and the insulating film, wherein the light absorbing layer is optically coupled to the core layer, wherein the spot-size converter has a first end face connected to the optical detector and a second end face opposite to the first end face, wherein the first III-V compound semiconductor layer is connected to the second III-V compound semiconductor layer and the insulating film at the first end face, wherein the first III-V compound semiconductor layer has a top surface and a side surface, wherein the core layer has a top surface and a side surface, wherein the first III-V compound semiconductor layer covers the top surface and the side surface of the core layer, and wherein 0.9≤XD/YD≤1.1 is satisfied, where YD represents a distance between the top surface of the core layer and the top surface of the first III-V compound semiconductor layer in a first direction orthogonal to the main surface, and XD represents a distance between the side surface of the core layer and the side surface of the first III-V compound semiconductor layer in a second direction orthogonal to the first direction. 2. The semiconductor optical device according to claim 1 , wherein 0.9≤XC/YC≤1.1 is satisfied, where XC represents a length of the top surface of the core layer and YC represents a length of the side surface of the core layer. 3. The semiconductor optical device according to claim 1 , wherein the optical detector has a third end face connected to the first end face, and wherein a distance from the main surface to a top surface of the insulating film at the third end face is larger than or equal to a distance from the main surface to the top surface of the first III-V compound semiconductor layer at the first end face. 4. The semiconductor optical device according to claim 1 , further comprising: an electrode, wherein the insulating film has an opening, and wherein the electrode is connected to the second III-V compound semiconductor layer through the opening. 5. The semiconductor optical device according to claim 1 , wherein the insulating film contains titanium oxide. 6. A semiconductor optical device comprising: a substrate having a main surface including a first region and a second region adjacent to the first region; a spot-size converter disposed in the first region; and an optical detector disposed in the second region, wherein the spot-size converter includes a core layer and a first III-V compound semiconductor layer, wherein the core layer is disposed between the substrate and the first III-V compound semiconductor layer, wherein the optical detector includes a light absorbing layer, a second III-V compound semiconductor layer, and an insulating film, wherein the light absorbing layer is disposed between the substrate and the second III-V compound semiconductor layer, wherein the second III-V compound semiconductor layer is disposed between the light absorbing layer and the insulating film, wherein the light absorbing layer is optically coupled to the core layer, wherein the spot-size converter has a first end face connected to the optical detector and a second end face opposite to the first end face, wherein the first III-V compound semiconductor layer is connected to the second III-V compound semiconductor layer and the insulating film at the first end face, wherein the core layer has a top surface and a side surface, and wherein 0.9≤XC/YC≤1.1 is satisfied, where XC represents a length of the top surface of the core layer and YC represents a length of the side surface of the core layer. 7. The semiconductor optical device according to claim 6 , wherein the first III-V compound semiconductor layer has a top surface and a side surface, wherein the first III-V compound semiconductor layer covers the top surface and the side surface of the core layer, and wherein 0.9≤XD/YD≤1.1 is satisfied, where YD represents a distance between the top surface of the core layer and the top surface of the first III-V compound semiconductor layer in a first direction orthogonal to the main surface, and XD represents a distance between the side surface of the core layer and the side surface of the first III-V compound semiconductor layer in a second direction orthogonal to the first direction. 8. The semiconductor optical device according to claim 6 , wherein the optical detector has a third end face connected to the first end face, and wherein a distance from the main surface to a top surface of the insulating film at the third end face is larger than or equal to a distance from the main surface to a top surface of the first III-V compound semiconductor layer at the first end face. 9. The semiconductor optical device according to claim 6 , further comprising: an electrode, wherein the insulating film has an opening, and wherein the electrode is connected to the second III-V compound semiconductor layer through the opening. 10. The semiconductor optical device according to claim 6 , wherein the insulating film contains titanium oxide.
having three or more elements, e.g. GaAlAs, InGaAs or InGaAsP · CPC title
directly associated or integrated with the devices, e.g. back reflectors (directly associated or integrated with photovoltaic cells H10F77/42) · CPC title
for devices having potential barriers · CPC title
for devices having potential barriers · CPC title
the potential barrier working in avalanche mode, e.g. avalanche photodiodes · CPC title
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