Vapor spin cleaning of additively manufactured parts

US12384114B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12384114-B2
Application numberUS-202217937544-A
CountryUS
Kind codeB2
Filing dateOct 3, 2022
Priority dateOct 9, 2020
Publication dateAug 12, 2025
Grant dateAug 12, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of cleaning residual resin from an additively manufactured object, includes: (a) enclosing an additively manufactured object in an inner chamber of a centrifugal separator, the additively manufactured object including a light polymerized resin with a surface coating of viscous, unpolymerized, residual resin; (b) flooding the chamber with a volatile organic solvent vapor without contacting liquid organic solvent to the object, the vapor present in an amount sufficient to reduce the viscosity of the residual resin; and (c) spinning the additively manufactured object in the chamber to centrifugally separate at least a first portion of the residual resin from the object.

First claim

Opening claim text (preview).

We claim: 1. An apparatus for separating residual resin from additively manufactured objects, comprising: (a) a chamber; (b) a rotor in said chamber; (c) at least one, or a plurality of, stereolithography build platform mount connected to said rotor; and (d) an organic solvent vapor generator operatively associated with said chamber. 2. The apparatus of claim 1 , further comprising: (e) a heater operatively associated with said chamber. 3. The apparatus of claim 1 , further comprising: (f) a balancer operatively associated with said rotor. 4. The apparatus of claim 3 , wherein said balancer comprises a Leblanc balancer, a ball balancer, or a pendulum balancer. 5. The apparatus of claim 1 , wherein said vapor generator comprises a solvent pool in said chamber, a gas line operatively associated with said pool for bubbling gas through solvent in said pool, and optionally a heater operatively associated with said gas line, said pool, or both said gas line and said pool. 6. The apparatus of claim 1 , wherein said vapor generator is positioned outside said chamber and in fluid communication with said chamber, for generating a vapor outside said chamber and passing said vapor into said chamber. 7. The apparatus of claim 1 , wherein said solvent vapor generator comprises a liquid solvent pool in said chamber, a liquid solvent supply operatively associated with said pool, and optionally a heater operatively associated with said pool. 8. The apparatus of claim 1 , further comprising: (e) a solvent vapor condenser operatively associated with said chamber. 9. The apparatus of claim 1 , further comprising: (f) a residual resin drain in fluid communication with said chamber. 10. The apparatus of claim 1 , wherein said build platform mount(s) are configured for adjusting an angle at which said build platform(s) are positioned with respect to said rotor.

Assignees

Inventors

Classifications

  • by a combination of operations · CPC title

  • by distortion, beating, or vibration of the surface to be cleaned {(B08B7/0007 takes precedence)} · CPC title

  • Cleaning by methods involving the use of air flow or gas flow (cleaning hollow articles by methods or apparatus specially adapted thereto B08B9/00) · CPC title

  • the liquid having chemical or dissolving effect · CPC title

  • Post-treatment, e.g. curing, coating or polishing · CPC title

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Frequently asked questions

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What does patent US12384114B2 cover?
A method of cleaning residual resin from an additively manufactured object, includes: (a) enclosing an additively manufactured object in an inner chamber of a centrifugal separator, the additively manufactured object including a light polymerized resin with a surface coating of viscous, unpolymerized, residual resin; (b) flooding the chamber with a volatile organic solvent vapor without contact…
Who is the assignee on this patent?
Carbon Inc
What technology area does this patent fall under?
Primary CPC classification B29C64/35. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Aug 12 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).