Color film substrate and method for preparing color film substrate, liquid crystal display panel

US12379623B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12379623-B2
Application numberUS-202218558208-A
CountryUS
Kind codeB2
Filing dateNov 9, 2022
Priority dateNov 9, 2022
Publication dateAug 5, 2025
Grant dateAug 5, 2025

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A color film substrate includes a base substrate, a black matrix layer, a color-resist layer, a protective layer, and a supporting post layer that are stacked and provided in sequence; the black matrix layer is provided with light-transmitting windows distributed in an array, and the color-resist layer covers each light-transmitting window; the supporting post layer is provided with a supporting post; the color film substrate includes a plurality of different subregions; in at least part of the subregions, the color-resist layer is provided with a partition slot located between rows of light-transmitting windows and exposing the black matrix layer, and an orthographic projection of the supporting post on the base substrate at least partially overlaps with an orthographic projection of the partition slot on the base substrate; in at least two of the subregions, the partition slot is provided with different widths.

First claim

Opening claim text (preview).

What is claimed is: 1. A color film substrate, comprising a base substrate, a black matrix layer, a color-resist layer, a protective layer, and a supporting post layer that are stacked and provided in sequence; wherein, the black matrix layer is provided with light-transmitting windows distributed in an array, the color-resist layer covers each light-transmitting window, and the supporting post layer is provided with a supporting post; the color film substrate comprises a plurality of different subregions; in at least part of the subregions, the color-resist layer is provided with a partition slot located between rows of the light-transmitting windows and exposing the black matrix layer, and an orthographic projection of the supporting post on the base substrate at least partially overlaps with an orthographic projection of the partition slot on the base substrate; wherein, in at least two of the subregions, the partition slot is provided with different widths, and a width of the partition slot is a size of the partition slot in a column direction. 2. The color film substrate according to claim 1 , wherein, along the column direction, a size between two adjacent light-transmitting windows is a sub-pixel pitch; and, a ratio of the width of the partition slot to the sub-pixel pitch is no more than 90%. 3. The color film substrate according to claim 1 , wherein, along the column direction, a size between two adjacent light-transmitting windows is a sub-pixel pitch; and, a ratio of the width of the partition slot to the sub-pixel pitch is greater than 10%. 4. The color film substrate according to claim 1 , wherein a difference between an average value of a height of each supporting post in any one of the subregions and an average value of a height of each supporting post in another one of the subregions is no more than 0.12 microns; and the height of the supporting post refers to a segment difference between a top end surface of the supporting post and a surface of the protective layer away from the base substrate. 5. The color film substrate according to claim 1 , wherein, in at least part of the subregions, a surface of the protective layer away from the base substrate is provided with a recessed region overlapping with the partition slot, and an orthographic projection of the supporting post on the protective layer is located in the recessed region. 6. The color film substrate according to claim 1 , wherein, in any one of the subregions, a number of the supporting post is one or more. 7. The color film substrate according to claim 1 , wherein, in two subregions where widths of the partition slot are different, a top-to-bottom segment difference of the supporting post is larger in a subregion where the width of the partition slot is larger; and the top-to-bottom segment difference of the supporting post refers to a segment difference between a top end surface of the supporting post and a bottom end surface of the supporting post. 8. A liquid crystal display panel, comprising a color film substrate, and a driving substrate provided in a box opposite to the color film substrate; wherein the color film substrate comprises a base substrate, a black matrix layer, a color-resist layer, a protective layer, and a supporting post layer that are stacked and provided in sequence; wherein, the black matrix layer is provided with light-transmitting windows distributed in an array, the color-resist layer covers each light-transmitting window, and the supporting post layer is provided with a supporting post; the color film substrate comprises a plurality of different subregions; in at least part of the subregions, the color-resist layer is provided with a partition slot located between rows of the light-transmitting windows and exposing the black matrix layer, and an orthographic projection of the supporting post on the base substrate at least partially overlaps with an orthographic projection of the partition slot on the base substrate; wherein, in at least two of the subregions, the partition slot is provided with different widths, and a width of the partition slot is a size of the partition slot in a column direction. 9. A method for preparing a color film substrate, the color film substrate comprising a base substrate, a black matrix layer, a color-resist layer, a protective layer, and a supporting post layer that are stacked and provided in sequence; wherein, the black matrix layer is provided with light-transmitting windows distributed in an array, the color-resist layer covers each light-transmitting window, and the supporting post layer is provided with a supporting post; the color film substrate comprises a plurality of different subregions; in at least part of the subregions, the color-resist layer is provided with a partition slot located between rows of the light-transmitting windows and exposing the black matrix layer, and an orthographic projection of the supporting post on the base substrate at least partially overlaps with an orthographic projection of the partition slot on the base substrate; the method for preparing the color film substrate comprises: preparing a test color film substrate; obtaining an average value of a supporting post height of at least one subregion of the test color film substrate; obtaining correction relationship information, the correction relationship information comprising a mapping relationship between a relevant parameter of a partition slot width and a relevant parameter of the supporting post height; determining a target value of the relevant parameter of the partition slot width of the subregion according to the relevant parameter of the partition slot width and the average value of the supporting post height of the at least one subregion of the test color film substrate, a target value of the supporting post height and the correction relationship information; and preparing a target color film substrate according to a target value of the relevant parameter of the partition slot width of each subregion. 10. The method for preparing the color film substrate according to claim 9 , wherein, determining a target value of the relevant parameter of the partition slot width of the subregion according to the relevant parameter of the partition slot width of the at least one subregion of the test color film substrate, the average value of the supporting post height, a target value of the supporting post height, and the correction relationship information comprises: determining, according to an average value of the supporting post height of a subregion of the test color film substrate and a target value of the supporting post height of the subregion, a compensation parameter of the supporting post height of the subregion; determining, according to a relevant parameter of the partition slot width of the subregion of the test color film substrate and the correction relationship information, a relevant parameter of the supporting post height corresponding to the relevant parameter of the partition slot width of the subregion, and taking the determined relevant parameter of the supporting post height as a basic parameter of the supporting post height of the subregion; determining, according to the basic parameter of the supporting post height of the subregion and the compensation parameter of the supporting post height of the subregion, a correction parameter of the supporting post height of the subregion; and determining, according to the correction parameter of the supporting post height of the subregion and the correction relationship information, a relevant parameter of the partition slot width corresponding to the correction parameter of the supporting post height, and taking the d

Assignees

Inventors

Classifications

  • Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence) · CPC title

  • spacers regularly patterned on the cell subtrate, e.g. walls, pillars (G02F1/133377 takes precedence) · CPC title

  • Structural association of cells with optical devices, e.g. polarisers or reflectors · CPC title

  • by control of light from an independent source · CPC title

  • Methods for their manufacture, e.g. printing, electro-deposition or photolithography · CPC title

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What does patent US12379623B2 cover?
A color film substrate includes a base substrate, a black matrix layer, a color-resist layer, a protective layer, and a supporting post layer that are stacked and provided in sequence; the black matrix layer is provided with light-transmitting windows distributed in an array, and the color-resist layer covers each light-transmitting window; the supporting post layer is provided with a supportin…
Who is the assignee on this patent?
Ordos Yuansheng Optoelectronics Co Ltd, Boe Technology Group Co Ltd
What technology area does this patent fall under?
Primary CPC classification G02F1/133516. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 05 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).