Systems and methods for drying patterned OLED formulations

US12379159B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12379159-B2
Application numberUS-201916519724-A
CountryUS
Kind codeB2
Filing dateJul 23, 2019
Priority dateJul 23, 2018
Publication dateAug 5, 2025
Grant dateAug 5, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A drying chamber for drying a substrate patterned with display areas wetted by OLED materials dissolved or suspended in a volatile carrier liquid and separated from one another by dry boundary regions. A mask adjusts drying rate of the carrier liquid during vacuum extraction using vapor-transmissive areas opposite the wet areas and vapor-barrier regions opposite the dry boundary regions, or by confining the wet areas collectively in a chamber volume small enough to quickly saturate with the carrier liquid before vacuum extraction.

First claim

Opening claim text (preview).

What is claimed is: 1. A drying chamber comprising: a substrate support disposed within an enclosure, the substrate support having a support surface; a gas source coupled to the enclosure; a vacuum source coupled to a ceiling of the enclosure; a movable mask having vapor-transmissive areas and vapor-barrier regions disposed across the support surface of the substrate support within the enclosure and spaced apart from a ceiling of the enclosure to provide an adjustable distance between the mask and the support surface; and a gas distribution element disposed between the mask and the vacuum source, the gas distribution element comprising a vapor barrier surrounding a gap between the mask and the gas distribution element. 2. The drying chamber of claim 1 , wherein the mask has mask supports that extend outside the enclosure. 3. The drying chamber of claim 2 , wherein the mask supports are located on two opposite sides of the mask. 4. The drying chamber of claim 1 , wherein the gas source is coupled to the enclosure at a location that provides a gas flow outside the vapor barrier. 5. The drying chamber of claim 1 , wherein the mask includes a wall extending from a proximate surface of the mask toward the support surface. 6. The drying chamber of claim 1 , wherein the substrate support includes temperature-control elements. 7. The drying chamber of claim 1 , wherein the mask comprises a rigid material disposed over and spaced apart from the substrate. 8. The drying chamber of claim 1 , wherein each vapor-transmissive area has a single opening, a plurality of openings, a mesh, a screen, or a porous material. 9. A method for drying a substrate having wet areas wet with a carrier liquid separated by dry boundary regions, the method comprising: orienting a mask and a gas distribution element having a vapor barrier relative to the substrate within an enclosure, the mask having vapor-transmissive areas and vapor-barrier regions; supporting the mask on movable mask supports located on opposite sides of the mask to vary a gap between the mask and a ceiling of the enclosure; positioning the vapor barrier to surround a gap between the mask and the gas distribution element; and drawing the carrier liquid from the wet areas of the substrate through the vapor-transmissive areas of the mask using a vacuum port coupled to the ceiling of the enclosure. 10. The method of claim 9 , wherein orienting a mask relative to the substrate positions the vapor-transmissive areas opposite the wet areas and the vapor-barrier regions opposite the dry boundary regions. 11. The method of claim 10 , further comprising setting a gap between the substrate and the mask. 12. The method of claim 9 , wherein the gas distribution element is perforated, and the drawing the carrier liquid from the wet areas of the substrate comprises passing the carrier liquid through the perforated gas-distribution element. 13. The method of claim 12 , wherein each of the wet areas are of a first shape and each of the vapor-transmissive areas extend over a similar second shape, the method further comprising aligning the wet areas relative to the vapor-transmissive areas.

Assignees

Inventors

Classifications

  • F26B21/35Primary

    Temperature; Pressure · CPC title

  • H10K71/00Primary

    Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

  • Thermal treatment, e.g. annealing in the presence of a solvent vapour · CPC title

  • the products to be dried being disposed on one or more containers, which may have at least partly gas-previous walls, e.g. trays or shelves in a stack (F26B9/003 takes precedence; in combination with duct systems F26B21/00) · CPC title

  • for drying materials in a batch operation in an enclosure having a plurality of shelves which may be heated (F26B5/045 takes precedence) · CPC title

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What does patent US12379159B2 cover?
A drying chamber for drying a substrate patterned with display areas wetted by OLED materials dissolved or suspended in a volatile carrier liquid and separated from one another by dry boundary regions. A mask adjusts drying rate of the carrier liquid during vacuum extraction using vapor-transmissive areas opposite the wet areas and vapor-barrier regions opposite the dry boundary regions, or by …
Who is the assignee on this patent?
Kateeva Inc
What technology area does this patent fall under?
Primary CPC classification F26B21/35. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Aug 05 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).