Metal surface layer treating method, metal assembly and electronic device

US12378664B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12378664-B2
Application numberUS-202217703385-A
CountryUS
Kind codeB2
Filing dateMar 24, 2022
Priority dateSep 27, 2021
Publication dateAug 5, 2025
Grant dateAug 5, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The disclosure provides a metal surface layer treating method, a metal assembly and an electronic device. The metal surface layer treating method includes: putting metal into a vacuum chamber, and vacuumizing the vacuum chamber to a first vacuum degree; adding a mixed gas of acetylene, nitrogen and hydrogen into the vacuum chamber; and heating the vacuum chamber to a temperature above an ambient temperature. In response to the temperature in the vacuum chamber reaching a first temperature value above the ambient temperature and a gas pressure of the vacuum chamber reaching a first pressure value, performing glow discharge so that a carbon-nitrogen gradient hardening layer is formed on a surface layer of the metal. The method includes removing part of a carbon layer of the surface layer of the carbon-nitrogen gradient hardening layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A metal assembly comprising: a metal body; and a carbon-nitrogen gradient hardening layer covering the metal body, wherein a hardness of the carbon-nitrogen gradient hardening layer is gradually reduced in a direction from an outside surface to an inside surface thereof, a thickness of the carbon-nitrogen gradient hardening layer is in the range of 3 μm to 35 μm, and the carbon-nitrogen gradient hardening layer has a hardness of 896 HV0.01 to 852 HV0.01 at a distance of 0 to 5 μm from a surface thereof. 2. The metal assembly according to claim 1 , wherein a carbon-nitrogen ratio in the carbon-nitrogen gradient hardening layer is 15:1. 3. The metal assembly according to claim 1 , wherein the carbon-nitrogen gradient hardening layer has a hardness of 811 HV0.01 to 437 HV0.01 at a distance of 10 μm to 15 μm from the surface thereof. 4. The metal assembly according to claim 3 , wherein the carbon-nitrogen gradient hardening layer has a hardness of 326 HV0.01 to 229 HV0.01 at a distance of 20 μm to 25 μm from the surface thereof. 5. The metal assembly according to claim 4 , wherein the carbon-nitrogen gradient hardening layer has a hardness of 195 HV0.01 to 152 HV0.01 at a distance of 30 μm to 35 μm from the surface thereof. 6. The metal assembly according to claim 1 , wherein a thickness of the carbon-nitrogen gradient hardening layer is 20 μm, and a hardness of an outermost layer of the carbon-nitrogen gradient hardening layer is in the range of 900 HV50gf to 1000 HV50gf. 7. The metal assembly according to claim 1 , further comprising: a housing which is at least partially ring-shaped and has the carbon-nitrogen gradient hardening layer on an outer side thereof. 8. A metal assembly comprising: a metal body; and a carbon-nitrogen gradient hardening layer covering the metal body, wherein a hardness of the carbon-nitrogen gradient hardening layer is gradually reduced in a direction from an outside surface to an inside surface thereof, and a carbon-nitrogen ratio in the carbon-nitrogen gradient hardening layer is 15:1.

Assignees

Inventors

Classifications

  • Housings · CPC title

  • metallic cases coated with a nonmetallic layer · CPC title

  • After-treatment · CPC title

  • using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title

  • with diffusion of elements, e.g. decarburising, nitriding · CPC title

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What does patent US12378664B2 cover?
The disclosure provides a metal surface layer treating method, a metal assembly and an electronic device. The metal surface layer treating method includes: putting metal into a vacuum chamber, and vacuumizing the vacuum chamber to a first vacuum degree; adding a mixed gas of acetylene, nitrogen and hydrogen into the vacuum chamber; and heating the vacuum chamber to a temperature above an ambien…
Who is the assignee on this patent?
Beijing Xiaomi Mobile Software Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C16/36. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 05 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).