Quartz glass crucible and manufacturing method thereof

Patent metadata

Field	Value
Publication number	US-12371812-B2
Application number	US-202017783616-A
Country	US
Kind code	B2
Filing date	Oct 30, 2020
Priority date	Dec 23, 2019
Publication date	Jul 29, 2025
Grant date	Jul 29, 2025

Abstract

A quartz glass crucible ( 1 ) has a structure wherein a peak of a distribution of a total concentration of Na, K, and Ca in a depth direction from an inner surface ( 10 i ) of the crucible is present at a position deeper than the inner surface ( 10 i ). In an exemplary embodiment, the quartz glass crucible is capable of improving the yield of a silicon single crystal by suppressing peeling-off of brown rings.

First claim

What is claimed:

1. A quartz glass crucible characterized in that a peak of a distribution of a total concentration of Na, K, and Ca in a depth direction from an inner surface of the crucible is present at a position within a depth range of 16 μm or more than 32 μm or less from the inner surface, and
the peak value of the total concentration of Na, K, and Ca within the range of 16 μm or more and 32 μm or less from the inner surface is 2 times or more and 19 times or less an average value of the total concentration of Na, K, and Ca within a depth range of 0 μm or more and 8 μm or less from the inner surface.

2. The quartz glass crucible according to claim 1 , wherein
an average value of the total concentration of Na, K, and Ca within the depth range of 32 μm or more and 1000 μm or less from the inner surface is 0.6 times or more and 1 time or less the average value of the total concentration of Na, K, and Ca within a depth range of 0 μm or more and 8 μm or less from the inner surface.

3. The quartz glass crucible according to claim 2 , wherein
the total concentration of Na, K, and Ca within the depth range of 32 μm or more and 1000 μm or less from the inner surface has a negative concentration gradient with the depth direction as a positive direction.

4. The quartz glass crucible according to claim 3 , wherein
an average value of a total concentration of Li, Al, Na, K, and Ca within the depth range of 0 μm or more and 8 μm or less from the crucible inner surface is 3.6×10 16 atoms/cc or more and 5.5×10 17 atoms/cc or less.

5. The quartz glass crucible according to claim 3 comprising:
a transparent layer made of silica glass containing no bubbles and constituting the inner surface; and
a bubble layer made of silica glass containing a large number of bubbles and provided outside the transparent layer, wherein
a thickness of the transparent layer is 1 mm or more.

6. The quartz glass crucible according to claim 2 , wherein
an average value of a total concentration of Li, Al, Na, K, and Ca within the depth range of 0 μm or more and 8 μm or less from the crucible inner surface is 3.6×10 16 atoms/cc or more and 5.5×10 17 atoms/cc or less.

7. The quartz glass crucible according to claim 2 comprising:
a transparent layer made of silica glass containing no bubbles and constituting the inner surface; and
a bubble layer made of silica glass containing a large number of bubbles and provided outside the transparent layer, wherein
a thickness of the transparent layer is 1 mm or more.

8. The quartz glass crucible according to claim 1 , wherein
an average value of a total concentration of Li, Al, Na, K, and Ca within the depth range of 0 μm or more and 8 μm or less from the crucible inner surface is 3.6×10 16 atoms/cc or more and 5.5×10 17 atoms/cc or less.

9. The quartz glass crucible according to claim 1 comprising:
a transparent layer made of silica glass containing no bubbles and constituting the inner surface; and
a bubble layer made of silica glass containing a large number of bubbles and provided outside the transparent layer, wherein
a thickness of the transparent layer is 1 mm or more.

10. A quartz glass crucible characterized in that a peak of a distribution of a total concentration of Na, K, and Ca in a depth direction from an inner surface of the crucible is present at a position within a depth range of 16 μm or more or more and 32 μm or less from the inner surface, and
an average value of the total concentration of Na, K, and Ca within a depth range of 32 μm or more and 1000 μm or less from the inner surface is 0.6 time or more and 1 time or less the average value of the total concentration of Na, K, and Ca within a depth range of 0 μm or more and 8 μm or less from the inner surface.

11. The quartz glass crucible according to claim 10 , wherein
a total concentration of Na, K, and Ca within the depth range of 32 μm or more and 1000 μm or less form the inner surface has a negative concentration gradient with the depth direction as a positive direction.

12. The quartz glass crucible according to claim 10 , wherein an average value of a total concentration of Li, Al, Na, K, and Ca within the depth range of 0 μm or more and 8 μm or less from the crucible inner surface is 3.6×10 16 atoms/cc or more and 5.5×10 17 atoms/cc or less.

13. The quartz glass crucible according to claim 10 , comprising:
a transparent layer made of silica glass containing no bubbles and constituting the inner surface; and
a bubble layer made of silica glass containing bubbles and provided outside the transparent layer, wherein
a thickness of the transparent layer is 1 mm or more.

14. A quartz glass crucible characterized in that a peak of a distribution of a total concentration of Na, K, and Ca in a depth direction from an inner surface of the crucible is present at a position within a depth range of 16 μm or more and 32 μm or less from the inner surface, and
an average value of at total concentration of Li, Al, Na, and Ca within a depth range of 0 μm or more and 8 μm or less form the crucible inner surface is 3.6×10 16 atoms/cc or more and 5.5×10 17 atoms/cc or less.

15. The quartz glass crucible according to claim 14 comprising:
a transparent layer made of silica glass containing no bubbles and constituting the inner surface; and
a bubble layer made of silica glass containing bubbles and provided outside the transparent layer, wherein
a thickness of the transparent layer is 1 mm or more.

Assignees

• Sumco Corp

Inventors

• Ohara Masami
• Kishi Hiroshi
• Kitahara Eriko

Classifications

• C03B20/00

  Processes specially adapted for the production of quartz or fused silica articles {, not otherwise provided for (C03B19/01, C03B19/066, C03B19/106, C03B19/12, C03B19/14, C03B37/00 take precedence)} · CPC title

• Y02P40/57

  Improving the yield, e-g- reduction of reject rates · CPC title

• C30B29/06 Primary

  Silicon · CPC title

• C03C2201/54

  containing beryllium, magnesium or alkaline earth metals · CPC title

• C03C2201/50

  containing alkali metals · CPC title