Organic electroluminescent devices

US12371777B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12371777-B2
Application numberUS-202418610937-A
CountryUS
Kind codeB2
Filing dateMar 20, 2024
Priority dateApr 11, 2016
Publication dateJul 29, 2025
Grant dateJul 29, 2025

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.

First claim

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We claim: 1. A device for deposition of a material onto a substrate, the device comprising: a deposition nozzle comprising: a first exhaust aperture having a long edge and a short edge that is shorter than the long edge; a second exhaust aperture having a long edge and a short edge that is shorter than the long axis edge; a first deposition aperture disposed between the first exhaust aperture and the second exhaust aperture, at least partially crossing a line extending that extends between and perpendicular to the long edge of the first exhaust aperture and the long edge of the second exhaust aperture without crossing any exhaust aperture, the first deposition aperture being disposed and closer to the first exhaust aperture than the second aperture; and a second deposition aperture disposed between the first exhaust aperture and the second exhaust aperture and closer to the second exhaust aperture than the first exhaust aperture, and wherein, for any line drawn between and perpendicular to the first exhaust aperture and the second exhaust aperture, the line crosses no more than one of the first deposition aperture or the second deposition aperture. 2. The device of claim 1 , wherein the first deposition aperture and the second deposition aperture have the same dimensions. 3. The device of claim 2 , wherein a longest edge of each deposition aperture is arranged along a direction of relative movement of the device and the substrate when the device is in operation. 4. The device of claim 3 , wherein each of the first deposition aperture and the second deposition aperture are rectangular. 5. The device of claim 1 , wherein the first exhaust aperture and the second exhaust aperture are continuous. 6. The device of claim 5 , wherein the first exhaust aperture and the second exhaust aperture are rectangular, and the longest edge of each of the first exhaust aperture and the second exhaust aperture is arranged along a direction of relative movement of the device and the substrate when the device is in operation. 7. The device of claim 5 , further comprising a third deposition aperture disposed between, and continuous with, the first and second deposition apertures. 8. The device of claim 1 , wherein the first exhaust aperture and the second exhaust aperture extend ahead of and behind each of the first deposition aperture and the second deposition aperture in the direction of relative movement of the device and the substrate when the device is in operation. 9. The device of claim 1 , further comprising a source of material to be deposited on the substrate, the source of material in fluid communication with the first deposition aperture and the second deposition aperture. 10. The device of claim 1 , further comprising an external vacuum source in fluid communication with the first exhaust aperture and the second exhaust aperture. 11. The device of claim 1 , further comprising a source of confinement gas in fluid communication with the first exhaust aperture and the second exhaust aperture. 12. The device of claim 1 , wherein the first exhaust aperture and the second exhaust aperture each have a constant width along a direction of relative motion of the substrate and the device. 13. The device of claim 1 , wherein the device comprises a print head. 14. A deposition system comprising the print head of claim 13 . 15. The device of claim 1 , wherein the second deposition aperture is offset from the first deposition aperture along an axis of the nozzle. 16. The device of claim 1 , wherein there are no more than two deposition apertures disposed between the first exhaust aperture and the second exhaust aperture.

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What does patent US12371777B2 cover?
A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.
Who is the assignee on this patent?
Universal Display Corp
What technology area does this patent fall under?
Primary CPC classification C23C14/24. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 29 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).