Gas supply system for high- and low-pressure gas consuming appliances

US12366331B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12366331-B2
Application numberUS-202118247302-A
CountryUS
Kind codeB2
Filing dateSep 28, 2021
Priority dateOct 2, 2020
Publication dateJul 22, 2025
Grant dateJul 22, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A gas supply system for a high-pressure gas consuming appliance and a low-pressure gas consuming appliance of a floating structure including a tank containing the gas is disclosed. The supply system includes: a first supply circuit and a second supply circuit; a gas return line; and a first heat exchanger and a second heat exchanger configured to carry out a heat exchange between the gas of the first supply circuit and the gas circulating in the return line. The first supply circuit includes an additional pump.

First claim

Opening claim text (preview).

The invention claimed is: 1. A system for supplying gas to at least one high-pressure gas consuming apparatus and at least one low-pressure gas consuming apparatus of a floating structure comprising at least one tank configured to contain the gas, the supply system comprising: at least a first gas supply circuit of the high-pressure gas consuming apparatus, comprising at least one pump configured to pump the gas collected in the liquid state into the tank, at least one high-pressure evaporator configured to evaporate the gas circulating in the first gas supply circuit, at least one second circuit supplying gas to the low-pressure gas-consuming apparatus, comprising at least one compressor configured to compress gas taken in the vapor state from the tank to a pressure compatible with the requirements of the low-pressure gas-consuming apparatus, and a gas return line connected to the second supply circuit downstream of the compressor and extending to the tank, the supply system comprising at least a first heat exchanger and at least a second heat exchanger each configured to exchange heat between the gas circulating in the return line in the vapor state and the gas in the liquid state circulating in the first supply circuit, the first supply circuit comprising an additional pump interposed between the first heat exchanger and the second heat exchanger. 2. The supply system according to claim 1 , wherein the return line comprises a divergence point dividing the return line into a first section and a second section both extending from the divergence point to the tank, the first heat exchanger being configured to exchange heat between the gas circulating in vapor state in the first section of the return line and the liquid-state gas circulating in the first supply circuit, the second section bypassing the first heat exchanger. 3. The supply system according to claim 2 , wherein the divergence point is arranged on the return line between the first heat exchanger and the second heat exchanger. 4. The supply system according to claim 2 , wherein the divergence point is arranged on the return line, between the connection to the second supply circuit and the second heat exchanger, the first section and the second section passing through the second heat exchanger. 5. The supply system according to claim 2 , wherein the second section of the return line comprises one end submerged in the liquid contained in the tank, the second section comprising an ejection member arranged at the submerged end. 6. The supply system according to claim 2 , wherein the second section of the return line comprises a flow control member. 7. The supply system according to claim 1 , wherein the first heat exchanger is configured to condense the gas circulating in the return line. 8. The supply system according to claim 1 , wherein the second heat exchanger is configured to pre-cool the gas circulating in the return line. 9. The supply system according to claim 1 , wherein the return line comprises an expansion member arranged downstream of the first heat exchanger. 10. The supply system according to claim 1 , comprising an auxiliary supply line connected to the first supply circuit, upstream of the first heat exchanger, and extending to the second supply circuit, downstream of the compressor, the supply system comprising a low-pressure evaporator configured to evaporate the gas circulating in the auxiliary supply line. 11. The supply system according to claim 1 , wherein the pump is configured to raise a pressure of the gas in the liquid state to a value of between 6 and 17 bar and the additional pump is configured to raise the pressure of the gas in the liquid state to a value of between 30 and 400 bar. 12. The supply system according to claim 1 , wherein the compressor is configured to raise a pressure of the gas to a value of between 6 and 20 bar absolute. 13. The supply system according to claim 1 , wherein the high-pressure evaporator is arranged downstream of the second heat exchanger on the first gas supply circuit of the high-pressure gas consuming apparatus. 14. The supply system according to claim 1 , wherein the second heat exchanger and the high-pressure evaporator form a single heat exchanger. 15. A floating structure for storing and/or transporting gas in the liquid state, comprising at least one tank for gas in the liquid state, at least one high-pressure gas consuming apparatus, at least one low-pressure gas consuming apparatus and at least one system for supplying gas to these apparatuses according to claim 1 . 16. A system for loading or unloading a liquid gas which combines at least one on-shore and/or port facility and at least one floating structure for storing and/or transporting liquid gas according to claim 15 . 17. A method for loading or unloading a liquid gas from a floating structure for storing and/or transporting gas according to claim 15 , wherein pipes for loading and/or unloading gas in the liquid state arranged on an upper deck of the floating structure can be connected, by means of appropriate connectors, to a maritime or port terminal in order to transfer the gas in the liquid state to or from the tank.

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What does patent US12366331B2 cover?
A gas supply system for a high-pressure gas consuming appliance and a low-pressure gas consuming appliance of a floating structure including a tank containing the gas is disclosed. The supply system includes: a first supply circuit and a second supply circuit; a gas return line; and a first heat exchanger and a second heat exchanger configured to carry out a heat exchange between the gas of the…
Who is the assignee on this patent?
Gaztransport Et Technigaz
What technology area does this patent fall under?
Primary CPC classification F17C9/04. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Jul 22 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).