Pump, apparatus for supplying chemical liquid and apparatus for processing substrate

US12366239B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12366239-B2
Application numberUS-202318105878-A
CountryUS
Kind codeB2
Filing dateFeb 5, 2023
Priority dateApr 5, 2022
Publication dateJul 22, 2025
Grant dateJul 22, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are a pump, an apparatus for supplying a chemical liquid and an apparatus for processing a substrate. The pump includes a tube having elasticity and having a flow path through which a chemical liquid flows in; and a case having an internal space partitioned into at least two chambers through which gas is supplied or discharged, where the at least two chambers cover an outer circumference of the tube. Using the pump, the apparatus for supplying a chemical liquid and the apparatus for processing a substrate, by an operation in which gas is supplied or discharged into each partitioned chamber in the case, by applying or releasing pressure to the outer circumference of each corresponding tube independently without interfering between the internal pressures between the chambers, efficient pumping operation of the pump may be obtained, and precise control of the discharge pressure of the liquid may be implemented.

First claim

Opening claim text (preview).

What is claimed is: 1. A pump, comprising: a tube having elasticity and having a flow path through which a chemical liquid flows in, wherein the tube has a toroid shape having central portions inwardly recessed toward the flow path and peripheral ring portions circularly surrounding the central portions and outwardly protruding away from the flow path; and a case having an internal space partitioned into at least two chambers through which gas is supplied or discharged, where the at least two chambers cover an outer circumference of the tube. 2. The pump of claim 1 , wherein the internal space of the case is partitioned into a first chamber and a second chamber by a partition wall connecting the tube to an internal side surface of the case, and wherein the first chamber and the second chamber are configured to selectively form one of a vacuum state in which gas is discharged and a pressurized state in which gas is supplied. 3. The pump of claim 2 , wherein a gas discharge unit connected to the first chamber and discharging gas to form the vacuum state and a gas supply unit connected to the second chamber and supplying gas to form the pressurized state are disposed in the case. 4. The pump of claim 2 , wherein a gas outlet connected to the first chamber and discharging gas to form the vacuum state is disposed on a first sidewall opposite to one side surface of the tube facing the first chamber in the case, and wherein a gas supply unit connected to the second chamber and supplying gas to form the pressurized state is disposed on a second sidewall opposite to the other side surface of the tube facing the second chamber in the case. 5. The pump of claim 2 , wherein a chemical liquid inlet and a chemical liquid outlet connected to an inlet and an outlet of the flow path of the tube and disposed on the same linear line as the inlet and outlet are disposed in the case. 6. The pump of claim 1 , wherein the tube has a shape symmetrical about a center, and each chamber has the same size. 7. The pump of claim 1 , further comprising: a protective unit covering an outer circumference of the tube between the tube and the case and having elasticity. 8. The pump of claim 7 , wherein the protective unit includes a protective wall surrounding an outer circumferential surface of the tube with a space and a protective layer filling the space between the tube and the protective wall. 9. The pump of claim 8 , wherein the protective layer is formed of chemical liquid or gas. 10. An apparatus comprising: a chemical liquid supply unit for supplying a chemical liquid; a filter unit connected to the chemical liquid supply unit and filtering the chemical liquid; a pump device connected to the filter unit and pumping the chemical liquid; and a nozzle portion connected to a downstream side of the pump device and discharging the chemical liquid, wherein the pump device includes: a tube having a flow path through which the chemical liquid flows in and having elasticity, wherein the tube has a toroid shape having central portions inwardly recessed toward the flow path and peripheral ring portions circularly surrounding the central portions and outwardly protruding away from the flow path; and a case having an internal space divided into at least two chambers through which gas is supplied or discharged, where the at least two chambers cover an outer circumference of the tube. 11. The apparatus of claim 10 , wherein the pump device includes: a first pump connected between a downstream side of the liquid supply unit and an upstream side of the filter unit and a second pump connected between a downstream side of the filter unit and an upstream side of the nozzle portion; and an inlet valve disposed on an upstream side of the first pump, a first valve disposed between a downstream side of the first pump and an upstream side of the filter unit, a second valve disposed between an upstream side of the second pump and a downstream side of the filter unit, and a valve portion including an outlet valve disposed on a downstream side of the second pump. 12. The apparatus of claim 11 , wherein the first pump and the second pump are disposed side by side between the filter unit and a valve box of the valve portion. 13. The apparatus of claim 10 , wherein an internal space of the case is partitioned into a first chamber and a second chamber by a partition wall connecting the tube to the internal side surface of the case, and wherein the first chamber and the second chamber are configured to selectively form one of a vacuum state in which gas is discharged and a pressurized state in which gas is supplied. 14. The apparatus of claim 13 , wherein a gas discharge unit connected to the first chamber and discharging gas to form the vacuum state and a gas supply unit connected to the second chamber and supplying gas to form the pressurized state are disposed in the case. 15. The apparatus of claim 10 , wherein a protective unit covering an outer circumference of the tube between the tube and the case and having elasticity. 16. The apparatus of claim 15 , wherein the protective unit includes a protective wall surrounding an outer circumferential surface of the tube with a space and a protective layer filling the space between the tube and the protective wall. 17. An apparatus comprising: a processing container having a space for processing a substrate therein; a substrate support member disposed in the processing container and supporting a substrate; a liquid supply unit for supplying a liquid; a filter unit connected to the liquid supply unit and filtering the liquid; a pump connected to the filter unit and pumping the liquid; and a nozzle portion connected to a downstream side of the pump and discharging the liquid to the substrate, wherein the pump includes: a tube having a flow path through which the liquid flows in, and having elasticity; and a case having an internal space partitioned into at least two chambers through which gas is supplied or discharged, where the at least two chambers cover an outer circumference of the tube, wherein the case is partitioned into three chambers by partition walls connecting the tube to an internal side surface of the case, and wherein an outer circumferential surface of the tube corresponding to each of the chambers includes a recess groove, recessed toward the flow path.

Assignees

Inventors

Classifications

  • Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

  • of tubular flexible members · CPC title

  • with several pumps · CPC title

  • liquid, i.e. incompressible · CPC title

  • Filtering · CPC title

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What does patent US12366239B2 cover?
Provided are a pump, an apparatus for supplying a chemical liquid and an apparatus for processing a substrate. The pump includes a tube having elasticity and having a flow path through which a chemical liquid flows in; and a case having an internal space partitioned into at least two chambers through which gas is supplied or discharged, where the at least two chambers cover an outer circumferen…
Who is the assignee on this patent?
Semes Co Ltd
What technology area does this patent fall under?
Primary CPC classification F04B43/0072. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Jul 22 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).