Shape-stable structures with ablative cooling

US12365635B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12365635-B2
Application numberUS-202217878808-A
CountryUS
Kind codeB2
Filing dateAug 1, 2022
Priority dateAug 1, 2022
Publication dateJul 22, 2025
Grant dateJul 22, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A shape-stable structure that is configured to provide ablative cooling. The structure is used to form a component that includes shape-stable bulk structure and an ablative material. The bulk structure is infiltrated with the ablative material so that the ablative material is disposed in pathways defined by the bulk structure.

First claim

Opening claim text (preview).

What is claimed is: 1. A product, comprising: a bulk structure defining an outer surface and a plurality of pathways, wherein the pathways intersect the outer surface, and wherein the bulk structure is constructed from at least one high temperature material that: is shape-stable in a fluid flow and at an operating temperature of at least 2000° C., and includes a base element that is a transition metal or a rare earth element; and an ablative material disposed within the pathways, wherein the ablative material is configured to transition between a solid phase and a vapor phase over an operating temperature range. 2. The product of claim 1 , wherein the high temperature material is a high-temperature oxide. 3. The product of claim 2 , wherein the high temperature oxide includes the base element. 4. The product of claim 1 , wherein the high temperature material is a mixture of high-temperature oxides. 5. The product of claim 1 , wherein the high temperature material includes HfO 2 , ZrO 2 , Ta 2 O 5 , Eu 2 O 3 , Yb 2 O 3 , Dy 2 O 3 , Ho 2 O 3 , Er 2 O 3 , Y 2 O 3 , or combinations thereof. 6. The product of claim 1 , wherein porosity of the bulk structure forms the pathways. 7. The product of claim 1 , wherein the ablative material is phenolic resin. 8. A method of making the product of claim 1 , the method comprising: forming a bulk structure defining an outer surface and a plurality of pathways, wherein the pathways intersect the outer surface, and wherein the bulk structure is constructed from at least one high temperature material that is shape-stable in a fluid flow and at an operating temperature of at least 2000° C., infiltrating the bulk structure with an ablative material so that the ablative material is disposed within the pathways, and curing the ablative material disposed in the pathways of the bulk structure. 9. The method of claim 8 , wherein the high temperature material is a high-temperature oxide. 10. The method of claim 9 , wherein the high temperature oxide includes a base element that is a transition metal or a rare earth element. 11. The method of claim 8 , wherein the high temperature material is a mixture of high-temperature oxides. 12. The method of claim 8 , wherein forming the bulk structure includes gel casting the bulk structure and/or an additive manufacturing process. 13. A product, comprising: a bulk structure defining an outer surface and a plurality of pathways, wherein the pathways intersect the outer surface, and wherein the bulk structure is constructed from at least one high temperature material that is shape-stable in a fluid flow and at an operating temperature of at least 2000 ° C.; and an ablative material disposed within the pathways, wherein the ablative material is configured to transition between a solid phase and a vapor phase over an operating temperature range, wherein the high temperature material includes a material selected from the group consisting of: HfO 2 —Ta 2 O 5 , HfO 2 —Lu 2 O 3 , and ZrO 2 —Y 2 O 3 . 14. A product, comprising: a bulk structure defining an outer surface and a plurality of pathways, wherein the pathways intersect the outer surface, and wherein the bulk structure is constructed from at least one high temperature oxide that includes a material selected from the group consisting of: HfO 2 —Ta 2 O 5 , HfO 2 —Lu 2 O 3 , and ZrO 2 —Y 2 O 3 ; and an ablative material disposed within the pathways, wherein the ablative material is configured to transition between a solid phase and a vapor phase over an operating temperature range. 15. The product of claim 14 , wherein the at least one high temperature oxide is a mixture of high-temperature oxides. 16. The product of claim 14 , wherein the at least one high temperature oxide further includes HfO 2 , ZrO 2 , Ta 2 O 5 , Eu 2 O 3 , Yb 2 O 3 , Dy 2 O 3 , Ho 2 O 3 , Er 2 O 3 , Y 2 O 3 , or combinations thereof. 17. The product of claim 14 , wherein porosity of the bulk structure forms the pathways. 18. The product of claim 14 , wherein the ablative material is phenolic resin. 19. The product of claim 14 , wherein the bulk structure is shape-stable in a fluid flow and at an operating temperature of at least 2000° C.

Assignees

Inventors

Classifications

  • Products made by additive manufacturing · CPC title

  • Stabilised zirconias, e.g. YSZ or cerium stabilised zirconia · CPC title

  • Niobium oxides, niobates, tantalum oxides, tantalates, or oxide-forming salts thereof · CPC title

  • based on zirconium or hafnium oxides, zirconates, {zircon} or hafnates · CPC title

  • Macromolecular compounds (C04B38/062 takes precedence) · CPC title

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What does patent US12365635B2 cover?
A shape-stable structure that is configured to provide ablative cooling. The structure is used to form a component that includes shape-stable bulk structure and an ablative material. The bulk structure is infiltrated with the ablative material so that the ablative material is disposed in pathways defined by the bulk structure.
Who is the assignee on this patent?
L Livermore Nat Security Llc
What technology area does this patent fall under?
Primary CPC classification C04B38/0093. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 22 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).