High magnetic field scanning probe microscope employing liquid helium-free room-temperature bore superconducting magnet
US-2019025339-A1 · Jan 24, 2019 · US
US12360136B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12360136-B2 |
| Application number | US-202117996246-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 6, 2021 |
| Priority date | May 8, 2020 |
| Publication date | Jul 15, 2025 |
| Grant date | Jul 15, 2025 |
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An apparatus, including a scanning probe microscope base that includes a configured to be secured to an end of an insert in a cryostat; a top configured to be connected to a base of a scanning probe microscope head that is configured to be disposed inside the insert; and a damping system disposed between the frame and the top and comprising a bellows that seals the end of the insert. This sealing separates an ultra-high vacuum (UHV) environment in the insert from a high vacuum (HV) environment surrounding the end of the insert and also positions an upper surface of the top in the UHV environment.
Opening claim text (preview).
What is claimed is: 1. An apparatus, comprising a scanning probe microscope base comprising: a frame configured to be secured to an end of an insert in a cryostat; a top configured to be connected to a base of a scanning probe microscope head that is configured to be disposed inside the insert; and a vibration control system disposed between the frame and the top; wherein the vibration control system comprises a bellows, wherein an upper end of the bellows is secured to the top and a lower end of the bellows is secured to the frame. 2. The apparatus of claim 1 , the top further comprising a universal electrical connection comprising half of a plug/socket arrangement, wherein the plug/socket arrangement is configured to provide electrical communication between the top and the base of the scanning probe microscope head which has a second half of the plug/socket arrangement when the scanning probe microscope head is lowered onto the top. 3. The apparatus of claim 2 , wherein the plug/socket arrangement comprises a plurality of pins disposed in a pattern on the top, each pin of the plurality of pins being configured to fit into a respective receptacle of a plurality of receptacles disposed in the pattern on the base. 4. The apparatus of claim 1 , wherein the bellows is configured to seal the end of the insert, thereby separating an ultra-high vacuum environment in the insert from a high vacuum environment surrounding the end of the insert and also thereby positioning an upper surface of the top in the ultra-high vacuum environment. 5. The apparatus of claim 4 , wherein the vibration control system further comprises a first seal between the lower end of the bellows and the insert, and a second seal that seals the upper end of the bellows. 6. The apparatus of claim 1 , wherein the bellows comprises a first section that oscillates at a first frequency range and a second section that oscillates at a second frequency range that is different than the first frequency range. 7. The apparatus of claim 1 , wherein the vibration control system further comprises a negative k mechanism secured to the upper end of the bellows and to the frame. 8. The apparatus of claim 7 , wherein the vibration control system further comprises an arm comprising an upper end secured to the upper end of the bellows, and wherein the negative k mechanism comprises a first pair of opposed springs connected at respective inner ends to the arm, and a second pair of opposed springs oriented transverse to the first pair of opposed springs and connected at respective inner ends to the arm. 9. The apparatus of claim 8 , wherein the vibration control system further comprises a Z positioner set apart from a lower end of the arm and configured to selectively engage the lower end of the arm, wherein in a passive mode the Z positioner is configured to raise to a position within reach of the arm and thereby limit an amplitude of vibrations in the arm. 10. The apparatus of claim 8 , wherein the vibration control system further comprises a Z positioner set apart from a lower end of the arm and configured to selectively engage the lower end of the arm, wherein in an active mode the Z positioner is raised to engage with the arm and then a height of the Z positioner can be continuously adjusted to compensate for vibrations in the arm. 11. The apparatus of claim 10 , wherein the vibration control system further comprises a capacitance sensor configured to detect the vibrations in the arm, and wherein the Z positioner is configured to continually adjust to compensate for the vibrations in the arm based on the vibrations detected by the capacitance sensor. 12. The apparatus of claim 1 , wherein the vibration control system further comprises an arm secured to the upper end of the bellows, and a capacitance sensor configured to detect vibrations in the arm, and wherein the vibration control system is configured to control the arm to mitigate the vibrations detected by the capacitance sensor. 13. The apparatus of claim 1 , wherein the vibration control system further comprises an arm comprising an upper end secured to the upper end of the bellows, and a Z positioner set apart from a lower end of the arm and configured to selectively engage the lower end of the arm, wherein in a passive mode the Z positioner is configured to raise to a position within reach of the arm and thereby limit an amplitude of vibrations in the arm. 14. The apparatus of claim 1 , wherein the vibration control system further comprises an arm comprising an upper end secured to the upper end of the bellows, and a Z positioner set apart from a lower end of the arm and configured to selectively engage the lower end of the arm, wherein in an active mode the Z positioner is raised to engage with the arm and then a height of the Z positioner can be continuously adjusted to compensate for vibrations in the arm. 15. The apparatus of claim 14 , wherein the vibration control system further comprises a capacitance sensor configured to detect the vibrations in the arm, and wherein the Z positioner is configured to continually adjust to compensate for the vibrations in the arm based on the vibrations detected by the capacitance sensor. 16. The apparatus of claim 1 , wherein the vibration control system further comprises: an arm secured to the upper end of the bellows; a negative k mechanism comprising a first pair of opposed springs connected at respective inner ends to the arm, and a second pair of opposed springs oriented perpendicular to the first pair of opposed springs and connected at respective inner ends to the arm; and a capacitance sensor configured to detect vibrations in the arm; wherein the vibration control system is configured to continually adjust to compensate for the vibrations in the arm based on the vibrations detected by the capacitance sensor. 17. An apparatus, comprising a scanning probe microscope base comprising: a frame configured to be secured to an end of an insert in a cryostat; a top configured to be connected to a base of a scanning probe microscope head that is configured to be disposed inside the insert; and a damping system disposed between the frame and the top and comprising a bellows that seals the end of the insert thereby separating an ultra-high vacuum (UHV) environment in the insert from a high vacuum (HV) environment surrounding the end of the insert and also thereby positioning an upper surface of the top in the UHV environment. 18. The apparatus of claim 17 , wherein the damping system further comprises a negative k mechanism disposed in the HV environment and secured to an upper end of the bellows and to the frame. 19. The apparatus of claim 18 , wherein the damping system further comprises an arm secured to the upper end of the bellows, and wherein the negative k mechanism comprises a first pair of opposed springs connected at respective inner ends to the arm, and a second pair of opposed springs oriented transverse to the first pair of opposed springs and connected at respective inner ends to the arm, wherein in a middle position where the inner ends and outer ends of the first pair and the inner ends and outer ends of the second pair are all at a same height, springs of the first pair of opposed springs and springs of the second pair of opposed springs are in compression. 20. The apparatus of claim 18 , wherein the damping system further comprises: an arm secured to the upper end of the bellows, wherein the negative k mechanism is secured to the upper end of the bellows via
Probes, their manufacture, or their related instrumentation, e.g. holders · CPC title
Means for protecting or isolating the interior of a sample chamber from external environmental conditions or influences, e.g. vibrations or electromagnetic fields · CPC title
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Vacuum environment · CPC title
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