Liquid feeder and polishing apparatus

Patent metadata

Field	Value
Publication number	US-12358098-B2
Application number	US-202217809074-A
Country	US
Kind code	B2
Filing date	Jun 27, 2022
Priority date	Jun 30, 2021
Publication date	Jul 15, 2025
Grant date	Jul 15, 2025

Abstract

A liquid feeder includes: a first arm having a first nozzle; a second arm having a second nozzle; a first rotation shaft supporting a proximal end part of the first arm; a second rotation shaft supporting a proximal end part of the second arm; a first rotation driver configured to rotate the first rotation shaft to turn the first arm from a fluid feed position to a retracted position; a second rotation driver configured to rotate the second rotation shaft to turn the second arm from a fluid feed position to a retracted position; and a controller. The first rotation shaft and the second rotation shaft are disposed coaxially with each other. The controller is capable of controlling the operation of the first rotation driver and the operation of the second rotation driver independently of each other.

First claim

What is claimed is:

1. A liquid feeder comprising:
a first arm horizontally extending above a polishing table and having a first nozzle configured to eject a first fluid onto the polishing table;
a second arm horizontally extending above the polishing table and having a second nozzle configured to eject a second fluid onto the polishing table;
a first rotation shaft supporting a proximal end part of the first arm;
a second rotation shaft supporting a proximal end part of the second arm;
wherein the second nozzle is closer to the first rotation shaft and the second rotation shaft relative to the first nozzle;
a first rotation driver configured to rotate the first rotation shaft around an axis thereof to turn the first arm from a fluid feed position inside the polishing table to a retracted position outside the polishing table;
a second rotation driver configured to rotate the second rotation shaft around an axis thereof to turn the second arm from a fluid feed position inside the polishing table to a retracted position outside the polishing table; and
a controller configured to control an operation of the first rotation driver and an operation of the second rotation driver, wherein
the first rotation shaft and the second rotation shaft are disposed coaxially with each other, and
the controller is capable of controlling the operation of the first rotation driver and the operation of the second rotation driver independently of each other.

2. The liquid feeder according to claim 1 , wherein the first arm and the second arm are disposed at different height positions.

3. The liquid feeder according to claim 1 , wherein
the first fluid is one or more of an abrasive liquid, a chemical solution, water, nitrogen, and compressed air, and
the second fluid is one or more of an abrasive liquid, a chemical solution, water, nitrogen, and compressed air.

4. The liquid feeder according to claim 1 , wherein
the first nozzle has a plurality of ejection orifices, and/or
the second nozzle has a plurality of ejection orifices.

5. The liquid feeder according to claim 1 , wherein the controller is capable of controlling ejection of the first fluid from the first nozzle and ejection of the second fluid from the second nozzle independently of each other.

6. The liquid feeder according to claim 1 , wherein the controller is capable of feeding the first fluid from the first nozzle regardless of a position of the first arm and capable of feeding the second fluid from the second nozzle regardless of a position of the second arm.

7. The liquid feeder according to claim 1 , wherein the controller is capable of ejecting the first fluid from the first nozzle while swinging the first arm and capable of feeding the second fluid from the second nozzle while swinging the second arm.

8. A polishing apparatus comprising the liquid feeder according to claim 1 .

9. The polishing apparatus according to claim 8 , wherein the first arm and the second arm are disposed at different height positions.

10. The polishing apparatus according to claim 8 , wherein
the first fluid is one or more of an abrasive liquid, a chemical solution, water, nitrogen, and compressed air, and
the second fluid is one or more of an abrasive liquid, a chemical solution, water, nitrogen, and compressed air.

11. The polishing apparatus according to claim 8 , wherein
the first nozzle has a plurality of ejection orifices, and/or
the second nozzle has a plurality of ejection orifices.

12. The polishing apparatus according to claim 8 , wherein the controller is capable of controlling ejection of the first fluid from the first nozzle and ejection of the second fluid from the second nozzle independently of each other.

13. The polishing apparatus according to claim 8 , wherein the controller is capable of feeding the first fluid from the first nozzle regardless of a position of the first arm and capable of feeding the second fluid from the second nozzle regardless of a position of the second arm.

14. The polishing apparatus according to claim 8 , wherein the controller is capable of ejecting the first fluid from the first nozzle while swinging the first arm and capable of feeding the second fluid from the second nozzle while swinging the second arm.

Assignees

• Ebara Corp

Inventors

• Yamaguchi Kuniaki
• Tamura Masayuki
• Shinkai Kenji
• Isobe Soichi
• Mochida Yusuke

Classifications

• B24B53/017

  Devices or means for dressing, cleaning or otherwise conditioning lapping tools · CPC title

• B24B57/02 Primary

  for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents · CPC title

• B24B37/005

  Control means for lapping machines or devices · CPC title

• B24B53/003 Primary

  using at least two conditioning tools · CPC title

• B24B37/34

  Accessories · CPC title