Single antenna with dual circular polarizations and quad feeds for millimeter wave applications

US12355157B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12355157-B2
Application numberUS-202418597231-A
CountryUS
Kind codeB2
Filing dateMar 6, 2024
Priority dateOct 22, 2021
Publication dateJul 8, 2025
Grant dateJul 8, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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Example embodiments relate to a substrate integrated waveguide (SIW) with dual circular polarizations. An example SIW may include a dielectric substrate and a first metallic layer coupled to a top surface of the dielectric substrate with a through-hole extending through the dielectric substrate and the first metallic layer. The SIW also includes a dielectric layer coupled to a top surface of the first metallic layer. A second metallic layer is coupled to a top surface of the dielectric layer. The second metallic layer includes a non-conductive opening, a plurality of feeds with a first end in the non-conductive opening and a second end including a single-ended termination, and an impedance transformer. The SIW also includes a third metallic layer coupled to a bottom of the dielectric substrate, and a set of metallic via-holes proximate the non-conductive opening and coupling the second metallic layer to the third metallic layer.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus comprising: at least two metallic layers, wherein one of the at least two metallic layers comprises: an opening, and a plurality of feeds, wherein a first end of each feed is located in the opening and a second end of each feed is a termination; a dielectric substrate disposed between the at least two metallic layers, wherein a through-hole extends through the dielectric substrate, and wherein the opening is disposed over the through-hole and in the same position as the through-hole; and a set of metallic via-holes positioned around the opening and proximate the through-hole, wherein the set of metallic via-holes electrically couple the at least two metallic layers. 2. The apparatus of claim 1 , further comprising a third metallic layer, wherein the third metallic layer is a middle metallic layer disposed between the dielectric substrate and one of the metallic layers. 3. The apparatus of claim 2 , wherein the through-hole extends through the middle metallic layer. 4. The apparatus of claim 2 , further comprising a dielectric layer disposed between the middle metallic layer and one of the metallic layers. 5. The apparatus of claim 4 , wherein the dielectric layer extends across the through-hole. 6. The apparatus of claim 4 , wherein the set of metallic via-holes extend between the at least two metallic layers, through the dielectric layer, through the middle metallic layer, and through the dielectric substrate. 7. The apparatus of claim 1 , wherein the opening is a non-conductive opening. 8. The apparatus of claim 1 , wherein the termination is a single-ended termination. 9. A system comprising: a waveguide; a substrate integrated waveguide (SIW) transition coupled to the waveguide, wherein the SIW transition comprises: at least two metallic layers, wherein one of the at least two metallic layers comprises: an opening, and a plurality of feeds, wherein a first end of each feed is located in the opening and a second end of each feed is a termination; a dielectric substrate disposed between the at least two metallic layers, wherein a through-hole extends through the dielectric substrate, and wherein the opening is disposed over the through-hole and in the same position as the through-hole; and a set of metallic via-holes positioned around the opening and proximate the through-hole, wherein the set of metallic via-holes electrically couple the at least two metallic layers. 10. The system of claim 9 , further comprising a third metallic layer, wherein the third metallic layer is a middle metallic layer disposed between the dielectric substrate and one of the metallic layers. 11. The system of claim 10 , wherein the through-hole extends through the middle metallic layer. 12. The system of claim 10 , further comprising a dielectric layer disposed between the middle metallic layer and one of the metallic layers. 13. The system of claim 12 , wherein the dielectric layer extends across the through-hole. 14. The system of claim 12 , wherein the set of metallic via-holes extend between the at least two metallic layers, through the dielectric layer, through the middle metallic layer, and through the dielectric substrate. 15. The system of claim 9 , wherein the opening is a non-conductive opening. 16. The system of claim 9 , wherein the termination is a single-ended termination. 17. A method comprising: generating at least two metallic layers; generating an opening and a plurality of feeds on one of the metallic layers, wherein a first end of each feed is located in the opening and a second end of each feed is a termination; layering a dielectric substrate between the at least two metallic layers, wherein a through-hole extends through the dielectric substrate, and wherein the opening is disposed over the through-hole and in the same position as the through-hole; and forming a set of metallic via-holes positioned around the opening and proximate the through-hole, wherein the set of metallic via-holes electrically couple the at least two metallic layers. 18. The method of claim 17 , wherein the metallic layer that includes the opening and the plurality of feeds is covered with a PCB laminate, and wherein generating the opening and the plurality of feeds on one of the metallic layers comprises etching through the PCB laminate to the metallic layer. 19. The apparatus of claim 1 , wherein the opening is a circular shape, and wherein the set of metallic via-holes encircle the opening. 20. The apparatus of claim 19 , wherein the metallic via-holes extend through the dielectric substrate and encircle the through-hole.

Assignees

Inventors

Classifications

  • Dielectric waveguides, i.e. without a longitudinal conductor · CPC title

  • integrated in a substrate · CPC title

  • Combinations of antenna units polarised in different directions for transmitting or receiving circularly and elliptically polarised waves or waves linearly polarised in any direction {(circularly polarised patch antennas H01Q9/0428; circularly polarised horns H01Q13/0241; cross-polarised horns H01Q13/0258; polarisation converters H01Q15/242; cross-polarised rear feeds H01Q19/136; crossed polarisation dual antenna H01Q25/001)} · CPC title

  • Structural association of antennas with earthing switches, lead-in devices or lightning protectors · CPC title

  • Stripline fed arrays (H01Q21/065 takes precedence) · CPC title

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What does patent US12355157B2 cover?
Example embodiments relate to a substrate integrated waveguide (SIW) with dual circular polarizations. An example SIW may include a dielectric substrate and a first metallic layer coupled to a top surface of the dielectric substrate with a through-hole extending through the dielectric substrate and the first metallic layer. The SIW also includes a dielectric layer coupled to a top surface of th…
Who is the assignee on this patent?
Waymo Llc
What technology area does this patent fall under?
Primary CPC classification H01Q21/0006. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 08 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).