Electron beam source and the use of the same

US12350754B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12350754-B2
Application numberUS-201816195995-A
CountryUS
Kind codeB2
Filing dateNov 20, 2018
Priority dateDec 22, 2017
Publication dateJul 8, 2025
Grant dateJul 8, 2025

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Provided is an electron beam source for generating an electron beam comprising a cathode, an anode and a grid for regulating an electron beam current. The cathode has a base and a protrusion with sidewalls and a top surface. The base surface and the top surface are essentially flat. The base surface and the top surface are arranged at a predetermined distance from each other. The base is larger than the protrusion. The electron beam source further comprising a control unit adapted for changing an applied voltage to the grid for switching a spot size of the electron beam on a target surface between at least a first a first spot size corresponding to emission from the top surface of the cathode only and to a second spot size corresponding to emission from the top surface and the base surface of the cathode.

First claim

Opening claim text (preview).

The invention claimed is: 1. An electron beam source for generating an electron beam, the source comprising: a cathode, an anode, and a grid for regulating an electron beam current, the grid comprising a grid aperture; wherein: the cathode has a base and a protrusion with sidewalls and a top surface, the base having: a base surface which is essentially parallel with the top surface; and freely exposed sidewall surfaces extending away from the base surface in a direction away from the protrusion, the base surface and the top surface are essentially flat and facing towards the anode, the base surface and the top surface are arranged at a predetermined distance from each other, wherein the predetermined distance of the top surface and the base surface is 0.2-2 mm, the base surface has a circumference that is larger than a circumference of the top surface and is less than or equal to a circumference of the grid aperture, the sidewalls are essentially perpendicular to the base surface and the top surface, and a control unit is configured to switch a spot size of the electron beam on a target surface between at least a first spot size corresponding to emission from the top surface of the cathode only by applying a first grid voltage and to a second spot size corresponding to emission from the top surface and the base surface of the cathode by applying a second grid voltage, wherein a voltage variation between the first grid voltage and the second grid voltage corresponds to the predetermined distance between the top surface and the base surface. 2. The electron beam source according to claim 1 , wherein the base and the protrusion are circular. 3. The electron beam source according to claim 1 , wherein the center of the protrusion is aligned with the center of the base. 4. The electron beam source according to claim 1 , wherein at least one of: the base and the protrusion are circular, or the center of the protrusion is aligned with the center of the base. 5. The electron beam source according to claim 1 , wherein the cathode is made of hafnium carbide, a rare earth metal hexaboride or an alkaline earth metal hexaboride. 6. The electron beam source according to claim 1 , wherein the control unit is further configured to: adjust the electron beam current from 0-40 mA when applying the first grid voltage to produce the first spot size corresponding to emission from the top surface of the cathode only; and adjust the electron beam current from 40-200 mA when applying the second grid voltage to produce the second spot size corresponding to emission from top surface and the base surface of the cathode. 7. An apparatus for forming a three-dimensional article through successively depositing individual layers of powder material that are fused together so as to form the article wherein the apparatus comprises: an electron beam source for generating an electron beam, the electron beam source comprising a cathode, an anode, and a grid for regulating an electron beam current, the grid comprising a grid aperture; and a control unit, wherein: the cathode comprises a base and a protrusion with sidewalls and a top surface, the base has: a base surface which is essentially parallel with the top surface; and freely exposed sidewall surfaces extending away from the base surface in a direction away from the protrusion, the base surface and the top surface are essentially flat and facing towards the anode, the base surface and the top surface are arranged at a predetermined distance from each other, wherein the predetermined distance of the top surface and the base surface is 0.2-2 mm, the base surface has a circumference that is larger than a circumference of the top surface and is less than or equal to a circumference of the grid aperture, the sidewalls are essentially perpendicular to the base surface and the top surface, and the control unit is configured to switch a spot size of the electron beam on a target surface between at least a first spot size corresponding to emission from the top surface of the cathode only by applying a first grid voltage and to a second spot size corresponding to emission from the top surface and the base surface of the cathode by applying a second grid voltage, wherein a voltage variation between the first grid voltage and the second grid voltage corresponds to the predetermined distance between the top surface and the base surface.

Assignees

Inventors

Classifications

  • characterised by the shape · CPC title

  • Construction of the gun or parts thereof (H01J3/021 - H01J3/025, H01J3/026 and H01J3/028 take precedence) · CPC title

  • Circuit arrangements therefor, e.g. for temperature control · CPC title

  • using layers of powder being selectively joined, e.g. by selective laser sintering or melting · CPC title

  • for applying thin layers on objects · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US12350754B2 cover?
Provided is an electron beam source for generating an electron beam comprising a cathode, an anode and a grid for regulating an electron beam current. The cathode has a base and a protrusion with sidewalls and a top surface. The base surface and the top surface are essentially flat. The base surface and the top surface are arranged at a predetermined distance from each other. The base is larger…
Who is the assignee on this patent?
Arcam Ab
What technology area does this patent fall under?
Primary CPC classification B33Y30/00. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jul 08 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).