Ultraviolet light receiving device

US12349473B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12349473-B2
Application numberUS-202117759040-A
CountryUS
Kind codeB2
Filing dateJan 15, 2021
Priority dateJan 20, 2020
Publication dateJul 1, 2025
Grant dateJul 1, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is an ultraviolet light receiving device having photosensitivity effective to target wavelengths in the ultraviolet region. A Schottky junction ultraviolet light receiving device has the photosensitivity peak wavelength in an ultraviolet region of 230 nm or more and 320 nm or less, and exhibits a rejection ratio of 10 5 or more, the rejection ratio being the ratio of the responsivity Rp to the peak photosensitivity wavelength to the average of the responsivity Rv to a visible region of 400 nm or more and 680 nm or less (Rp/Rv).

First claim

Opening claim text (preview).

The invention claimed is: 1. A Schottky ultraviolet light receiving device configured to have a peak photosensitivity wavelength in an ultraviolet region of 230 nm or more and 320 nm or less, wherein a rejection ratio that is a ratio of a responsivity Rp to the peak photosensitivity wavelength to an average of responsivity Rv to a visible region of 400 nm or more and 680 nm or less (Rp/Rv) is 10 5 or more, the Schottky ultraviolet light receiving device comprises an AlN layer on a sapphire substrate and an AlGaN laminate made up of a plurality of AlGaN layers having different Al composition ratios on the AlN layer, wherein the AlGaN laminate has an Al w Ga 1-w N buffer layer (0.5≤w≤0.95) and an Al z Ga 1-z N light receiving layer in this order from the AlN layer side; the values of the Al composition ratios satisfy a relationship of z<w; the AlGaN laminate has an n-type Al x Ga 1-x N current spreading layer and an n-type Al y Ga 1-y N ohmic contact layer in this order from the AlN layer side between the Al w Ga 1-w N buffer layer and the Al z Ga 1-z N light receiving layer; the values of the Al composition ratios satisfy a relationship of z≤y<x≤w; illumination light for measuring the responsivity enters through the sapphire substrate; and a half width of a photosensitivity spectrum of the ultraviolet light receiving device is 40 nm or less. 2. The ultraviolet light receiving device according to claim 1 , wherein the Al z Ga 1-2 N light receiving layer has an etched portion where the n-type Al y Ga 1-y N ohmic contact layer is exposed, an n-type ohmic electrode is provided on the exposed n-type Al y Ga 1-y N ohmic contact layer, and a Schottky electrode is placed on the Al z Ga 1-z N light receiving layer.

Assignees

Inventors

Classifications

  • having three or more elements, e.g. GaAlAs, InGaAs or InGaAsP · CPC title

  • for devices having potential barriers · CPC title

  • H10F30/227Primary

    the potential barrier being a Schottky barrier · CPC title

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What does patent US12349473B2 cover?
Provided is an ultraviolet light receiving device having photosensitivity effective to target wavelengths in the ultraviolet region. A Schottky junction ultraviolet light receiving device has the photosensitivity peak wavelength in an ultraviolet region of 230 nm or more and 320 nm or less, and exhibits a rejection ratio of 10 5 or more, the rejection ratio being the ratio of the responsivity …
Who is the assignee on this patent?
Dowa Holdings Co Ltd, Dowa Electronics Materials Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10F77/1248. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 01 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).