Graphene functionalization method, apparatus, and functionalized graphene product

Patent metadata

Field	Value
Publication number	US-12344527-B2
Application number	US-202017593837-A
Country	US
Kind code	B2
Filing date	Mar 26, 2020
Priority date	Mar 26, 2019
Publication date	Jul 1, 2025
Grant date	Jul 1, 2025

Abstract

Provided are a method of functionalizing graphene on a substrate, the method comprising the step of: exposing a substrate having a layer of graphene thereon to a plasma comprising helium and at least one functionalizing compound; as well as an apparatus for conducting the method and products formed by it.

First claim

The invention claimed is:

1. An apparatus for functionalizing graphene or graphene oxide, the apparatus comprising:
a plasma generator;
a vacuum chamber connected to the plasma generator;
a substrate holder, positioned to hold a substrate having a graphene or graphene oxide layer thereon within the vacuum chamber, and having a mounting area configured to have the substrate mounted therein;
a shutter movable between an open position, in which the mounting area of the substrate holder is exposed to the vacuum chamber, and a closed position, in which the mounting area of the substrate holder is concealed;
an injector, for injecting a functionalizing compound into the vacuum chamber; and
a helium source, for supplying helium to the plasma generator.

2. An apparatus according to claim 1 , wherein the apparatus further comprises a mask for masking an area of the substrate.

3. An apparatus according to claim 2 , wherein the mask is moveable, and/or removable from the remainder of the apparatus.

4. An apparatus according to claim 2 , wherein the apparatus is configured such that the mask is not in contact with the graphene or graphene oxide layer of the substrate when the substrate is held in the substrate holder, optionally wherein the mask is positioned less than 200 μm above the surface of the substrate.

5. An apparatus according to claim 1 , further comprising a hydrogen source, for supplying hydrogen to the plasma generator.

6. An apparatus according to claim 1 , further comprising a viewport opening into the vacuum chamber and a UV-vis spectrometer configured to analyse radiation emitted from the vacuum chamber through the viewport.

7. An apparatus according to claim 1 , further comprising one or more functionalizing compound sources, each being connected to the injector, for supplying the functionalizing compound or compounds to the injector.

8. An apparatus according to claim 1 , comprising a plurality of injectors, each injector being connected to a respective functionalizing compound source for supplying the functionalizing compound to the respective injector.

9. An apparatus according to claim 1 , wherein the injector is a gas injector.

Assignees

• Res & Innovation Uk
• Medical Res Council As Part Of United Kingdom Res And Innovation

Inventors

• Russo Christopher
• Peet Mathew
• Naydenova Katerina
• Scotcher Steve
• Palmer Chris
• Cattermole David

Classifications

• H01J2237/3321

  CVD [Chemical Vapor Deposition] · CPC title

• H01J37/32917

  Plasma diagnostics · CPC title

• H01J37/3244

  Gas supply means · CPC title

• H01J37/321

  the radio frequency energy being inductively coupled to the plasma · CPC title

• H01J37/26

  Electron or ion microscopes; Electron or ion diffraction tubes · CPC title