Photosensitive resin composition for flexographic printing

US12332564B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12332564-B2
Application numberUS-202117923873-A
CountryUS
Kind codeB2
Filing dateMay 12, 2021
Priority dateMay 15, 2020
Publication dateJun 17, 2025
Grant dateJun 17, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A photosensitive resin composition for flexographic printing includes components (A) to (E) below: (A) a first styrene-butadiene-styrene block copolymer (SBS); (B) a second styrene-butadiene-styrene block copolymer (SBS); (C) a polybutadiene or a derivative thereof; (D) a photopolymerizable monomer; and (E) a photopolymerization initiator, and comprises with respect to (A), 5 to 100 wt % of (B), 10 to 40 wt % of (C), 40 to 200 wt % of (D), and 4 to 20 wt % of (E).

First claim

Opening claim text (preview).

The invention claimed is: 1. A photosensitive resin composition for flexographic printing, comprising: (A) a first styrene-butadiene-styrene block copolymer (SBS), wherein a weight ratio of the styrene block to the butadiene block is 10:90 to 80:20, and a molar ratio of 1,2 bond structures to 1,4 bond structures in the butadiene block is 0:100 to 70:30; (B) a second styrene-butadiene-styrene block copolymer (SBS), wherein a weight ratio of the styrene block to the butadiene block is 10:90 to 80:20, and a molar ratio of 1,2 bond structures to 1,4 bond structures in the butadiene block is 80:20 to 100:0; (C) a polybutadiene or a derivative thereof, wherein a molar ratio of 1,2 bond structures to 1,4 bond structures is 80:20 to 100:0; (D) a photopolymerizable monomer; and (E) a photopolymerization initiator, comprising 5 to 100 wt % of the second styrene-butadiene-styrene block copolymer (SBS) (B) with respect to the amount of the first styrene-butadiene-styrene block copolymer (SBS) (A), comprising 10 to 40 wt % of the polybutadiene or a derivative thereof (C) with respect to the amount of the first styrene-butadiene-styrene block copolymer (SBS) (A), comprising 40 to 200 wt % of the photopolymerizable monomer (D) with respect to the amount of the first styrene-butadiene-styrene block copolymer (SBS) (A), and comprising 4 to 20 wt % of the photopolymerization initiator (E) with respect to the amount of the first styrene-butadiene-styrene block copolymer (SBS) (A). 2. The photosensitive resin composition for flexographic printing according to claim 1 , wherein the first styrene-butadiene-styrene block copolymer (SBS) (A) has a weight-average molecular weight (Mw) of 50,000 to 500,000. 3. The photosensitive resin composition for flexographic printing according to claim 1 , wherein the first styrene-butadiene-styrene block copolymer (SBS) (A) has a molecular weight distribution (Mw/Mn) of 1 to 10. 4. The photosensitive resin composition for flexographic printing according to claim 1 , wherein the second styrene-butadiene-styrene block copolymer (SBS) (B) has a weight-average molecular weight (Mw) of 10,000 to 100,000. 5. The photosensitive resin composition for flexographic printing according to claim 1 , wherein the second styrene-butadiene-styrene block copolymer (SBS) (B) has a molecular weight distribution (Mw/Mn) of 1 to 3. 6. The photosensitive resin composition for flexographic printing according to claim 1 , wherein the polybutadiene or a derivative thereof (C) has a weight-average molecular weight (Mw) of 1,000 to 10,000. 7. The photosensitive resin composition for flexographic printing according to claim 1 , wherein the polybutadiene or a derivative thereof (C) has a molecular weight distribution (Mw/Mn) of 1 to 3.

Assignees

Inventors

Classifications

  • polymerising vinyl aromatic monomers and conjugated dienes · CPC title

  • Macromolecular compounds obtained by polymerising monomers on to block polymers · CPC title

  • with ethylenic or acetylenic bands in the main chain of the photopolymer · CPC title

  • Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur · CPC title

  • Compositions of homopolymers or copolymers of conjugated diene hydrocarbons · CPC title

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Frequently asked questions

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What does patent US12332564B2 cover?
A photosensitive resin composition for flexographic printing includes components (A) to (E) below: (A) a first styrene-butadiene-styrene block copolymer (SBS); (B) a second styrene-butadiene-styrene block copolymer (SBS); (C) a polybutadiene or a derivative thereof; (D) a photopolymerizable monomer; and (E) a photopolymerization initiator, and comprises with respect to (A), 5 to 100 wt % of (B)…
Who is the assignee on this patent?
Nippon Soda Co
What technology area does this patent fall under?
Primary CPC classification G03F7/033. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jun 17 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).