Piezoelectric sensor with increased sensitivity and devices having the same

US12329033B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12329033-B2
Application numberUS-202218047443-A
CountryUS
Kind codeB2
Filing dateOct 18, 2022
Priority dateOct 21, 2021
Publication dateJun 10, 2025
Grant dateJun 10, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A piezoelectric sensor (e.g., for use in a piezoelectric MEMS microphone) includes a substrate and a cantilever beam attached to the substrate. The cantilever beam has a proximal portion attached to the substrate and extending to an unsupported distal end. An electrode is disposed on or in the proximal portion of the beam and has an outer boundary with a shape substantially corresponding to a contour line of a strain distribution plot for the cantilever beam resulting from a force applied to the cantilever beam.

First claim

Opening claim text (preview).

What is claimed is: 1. A piezoelectric sensor, comprising: a substrate; a cantilever beam having a proximal portion attached to the substrate and extending to an unsupported distal end of the beam; and an electrode disposed on or in the proximal portion of the beam, the electrode having an outer boundary with a shape substantially corresponding to a contour line of a strain distribution plot for the cantilever beam resulting from a force applied to the cantilever beam. 2. The sensor of claim 1 wherein the cantilever beam is a triangular beam, the unsupported distal end being a distal tip of the triangular beam. 3. The sensor of claim 1 wherein at least a portion of two edges of the outer boundary of the electrode are disposed inward of a pair of outer edges of the cantilever beam. 4. The sensor of claim 1 wherein two corners of the proximal portion of the cantilever beam are not covered by the electrode. 5. The sensor of claim 1 wherein at least a portion of the outer boundary of the electrode is non-linear. 6. The sensor of claim 1 wherein the cantilever beam has a rectangular shape. 7. A piezoelectric microelectromechanical systems microphone, comprising: a substrate; and a plurality of piezoelectric sensors movably coupled to the substrate, each of the piezoelectric sensors spaced apart from an adjacent piezoelectric sensor by a gap and including: a cantilever beam having a proximal portion attached to the substrate and extending to an unsupported distal end of the beam, and an electrode disposed on or in the proximal portion of the beam, the electrode having an outer boundary with a shape substantially corresponding to a contour line of a strain distribution plot for the cantilever beam resulting from a force applied to the cantilever beam, the plurality of piezoelectric sensors configured to deflect when subjected to sound pressure. 8. The microphone of claim 7 wherein the cantilever beam is a triangular beam, the unsupported distal end being a distal tip of the triangular beam. 9. The microphone of claim 7 wherein at least a portion of two edges of the outer boundary of the electrode are disposed inward of a pair of outer edges of the cantilever beam. 10. The microphone of claim 7 wherein two corners of the proximal portion of the cantilever beam are not covered by the electrode. 11. The microphone of claim 7 wherein at least a portion of the outer boundary of the electrode is non-linear. 12. The microphone of claim 7 wherein the cantilever beam has a rectangular shape. 13. An audio subsystem, comprising: an audio codec; and one or more piezoelectric microelectromechanical systems microphones in communication with the audio codec, each microphone including: a substrate and a plurality of piezoelectric sensors movably coupled to the substrate, each of the piezoelectric sensors spaced apart from an adjacent piezoelectric sensor by a gap and including a cantilever beam having a proximal portion attached to the substrate and extending to an unsupported distal end of the beam, and an electrode disposed on or in the proximal portion of the beam, the electrode having an outer boundary with a shape substantially corresponding to a contour line of a strain distribution plot for the cantilever beam resulting from a force applied to the cantilever beam. 14. The audio subsystem of claim 13 wherein the cantilever beam is a triangular beam, the unsupported distal end being a distal tip of the triangular beam. 15. The audio subsystem of claim 13 wherein at least a portion of two edges of the outer boundary of the electrode are disposed inward of a pair of outer edges of the cantilever beam. 16. The audio subsystem of claim 13 wherein two corners of the proximal portion of the cantilever beam are not covered by the electrode. 17. The audio subsystem of claim 13 wherein at least a portion of the outer boundary of the electrode is non-linear. 18. The audio subsystem of claim 13 wherein the cantilever beam has a rectangular shape.

Assignees

Inventors

Classifications

  • Mems transducers or their use · CPC title

  • Microphones · CPC title

  • comprising superposed layers in contact · CPC title

  • for combining the signals of two or more microphones (specially adapted for hearing aids H04R25/407) · CPC title

  • Sensors · CPC title

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Frequently asked questions

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What does patent US12329033B2 cover?
A piezoelectric sensor (e.g., for use in a piezoelectric MEMS microphone) includes a substrate and a cantilever beam attached to the substrate. The cantilever beam has a proximal portion attached to the substrate and extending to an unsupported distal end. An electrode is disposed on or in the proximal portion of the beam and has an outer boundary with a shape substantially corresponding to a c…
Who is the assignee on this patent?
Skyworks Solutions Inc
What technology area does this patent fall under?
Primary CPC classification H10N30/08. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 10 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).