SPAD pixel

US12328962B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12328962-B2
Application numberUS-202318386859-A
CountryUS
Kind codeB2
Filing dateNov 3, 2023
Priority dateOct 12, 2020
Publication dateJun 10, 2025
Grant dateJun 10, 2025

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An electronic device includes a stack of a first level having a SPAD, a second level having a quench circuit for said SPAD, and a third level having a circuit for processing data generated by said SPAD. A method for making the device includes: a) forming of the first level; b) bonding, on the first level, by molecular bonding, of a stack of layers including a semiconductor layer; and c) forming the quench circuit of the second level in the semiconductor layer.

First claim

Opening claim text (preview).

The invention claimed is: 1. An electronic device, comprising: a processing circuit level comprising a first semiconductor substrate, first transistors formed in and on top of the first semiconductor substrate, a first insulating layer covering the first transistors, a first stack of insulating layers with conductive tracks over the first insulating layer, first vias passing through the first insulating layer to electrically connect the first transistors to the conductive tracks of the first stack of insulating layers, and first metal pads at an upper surface of the first stack of insulating layers and electrically connected to the conductive tracks of the first stack of insulating layers; a quench circuit level comprising a layer with plural semiconductor regions insulated from one another by insulating regions, second transistors formed in and on top of the plural semiconductor regions, a second insulating layer covering the second transistors, a third insulating layer covering a side of the layer opposite the second insulating layer, a second stack of insulating layers with conductive tracks over the second insulating layer, second vias passing through the second insulating layer to electrically connect the second transistors to the conductive tracks of the second stack of insulating layers, and second metal pads at an upper surface of the second stack of insulating layers and electrically connected to the conductive tracks of the second stack of insulating layers; wherein a hybrid bond is made between the first metal pads and the upper surface of the first stack of insulating layers and the second metal pads and the upper surface of the second stack of insulating layers; a SPAD circuit level comprising a second semiconductor substrate with a photodiode region; wherein a bond is made between the second insulating layer and the SPAD circuit level; and wherein a third via extends through the second insulating layer, the insulating regions and the third insulating layer to electrically connect the photodiode region to the conductive tracks of the second stack of insulating layers. 2. The electronic device of claim 1 , wherein the layer of the quench circuit level further includes a ground plane positioned between the third insulating layer and each semiconductor region of the plural semiconductor regions. 3. The electronic device of claim 2 , wherein the layer of the quench circuit level further includes an insulating region positioned between each ground plane and each semiconductor region of the plural semiconductor regions. 4. The electronic device of claim 2 , further comprising a connection via that electrically connects each ground plane to the conductive tracks of the second stack of insulating layers. 5. The electronic device of claim 1 , wherein the first transistors formed in and on top of the first semiconductor substrate comprise digital processing circuit transistors. 6. The electronic device of claim 1 , wherein the second transistors formed in and on top of the semiconductor regions comprise transistors for a quench circuit electrically connected to the photodiode region. 7. The electronic device of claim 6 , wherein the second transistors formed in and on top of the semiconductor regions further comprise transistors for a SPAD disabling circuit electrically connected to the photodiode region. 8. The electronic device of claim 1 , wherein the second semiconductor substrate further comprises a pull-up diode electrically connected to the photodiode region. 9. The electronic device of claim 1 , wherein the SPAD circuit level further comprises a fourth insulating layer over the second semiconductor substrate, and wherein the bond between the second insulating layer and the SPAD circuit level comprises a molecular bond between the third and fourth insulating layers. 10. The electronic device of claim 1 , wherein the SPAD circuit level comprises a single SPAD. 11. The electronic device of claim 1 , wherein the SPAD circuit level comprises no electronic component other than a SPAD. 12. The electronic device according to claim 1 , wherein the quench circuit level only comprises circuitry for providing a quench function for a SPAD in the SPAD circuit level.

Assignees

Inventors

Classifications

  • H10F39/809Primary

    of hybrid image sensors · CPC title

  • the potential barrier working in avalanche mode, e.g. avalanche photodiodes · CPC title

  • SSIS architectures; Circuits associated therewith · CPC title

  • Avalanche · CPC title

  • Electric circuits {(for command of an exposure part G03B7/02)} · CPC title

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Frequently asked questions

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What does patent US12328962B2 cover?
An electronic device includes a stack of a first level having a SPAD, a second level having a quench circuit for said SPAD, and a third level having a circuit for processing data generated by said SPAD. A method for making the device includes: a) forming of the first level; b) bonding, on the first level, by molecular bonding, of a stack of layers including a semiconductor layer; and c) forming…
Who is the assignee on this patent?
St Microelectronics Crolles 2 Sas, St Microelectronics Res & Dev Ltd, Stmicroelectronics Res &Development Limited
What technology area does this patent fall under?
Primary CPC classification H10F39/809. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 10 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).