Method for protecting air-sensitive or evaporation-sensitive objects

Patent metadata

Field	Value
Publication number	US-12325044-B2
Application number	US-202017774582-A
Country	US
Kind code	B2
Filing date	Nov 6, 2020
Priority date	Nov 8, 2019
Publication date	Jun 10, 2025
Grant date	Jun 10, 2025

Abstract

A method for depositing a film on a substrate, which includes the steps of forming a film using a liquid composition that includes a neutral surfactant and a charged lamellar compound, placing the film in contact with the substrate and depositing the film on substrate. Also, a process for analyzing a substrate onto which a film has been deposited by the method.

First claim

The invention claimed is:

1. A process for depositing a film onto a substrate using a liquid composition, comprising the following steps:
a) formation of a film in the form of a bubble using the liquid composition,
b) placing the film in the form of a bubble in contact with the substrate, and
c) depositing the film in the form of a bubble on the substrate,
wherein the liquid composition comprises a neutral surfactant and a charged lamellar compound, in which the liquid composition is obtained by mixing the charged lamellar compound with the neutral surfactant and the concentration of neutral surfactant before mixing with the charged lamellar compound is less than 0.95 of the critical micelle concentration (CMC) of said surfactant.

2. The deposition process as claimed in claim 1 , in which the neutral surfactant is chosen from a nonionic surfactant, a zwitterionic surfactant, an amphoteric surfactant and mixtures thereof.

3. The deposition process as claimed in claim 2 , in which the neutral surfactant is a nonionic surfactant chosen from an ethoxylated alcohol, an ethoxylated alkylphenol, an ethoxylated fatty acid, an ethoxylated monoalkanolamide, an ethoxylated sorbitan ester, an ethoxylated amine, a glycol ester, a glycerol ester, a polyglycerol ester, a sorbitol ester, a glucoside, a polyglucoside, a sucrose ester, an amine oxide, a block copolymer including at least one amphiphilic block, and mixtures thereof.

4. The deposition process as claimed in claim 3 , in which the nonionic surfactant is a block copolymer including at least one amphiphilic block chosen from fluoro unit blocks, biological unit blocks, dendrimer unit blocks and poly(alkylene oxide) unit blocks.

5. The deposition process as claimed in claim 1 , in which the charged lamellar compound is chosen from a lamellar clay, a lamellar hydroxide, a lamellar double hydroxide, H 3(1-x-y-z) Li 3x Na 3y K 3z Sb 3 P 2 O 14 with 0≤x≤1; 0≤y≤1; 0≤z≤0.5 and 0≤x+y+z≤1, H (1-x-y-z) Li x Na y K z SbP 2 O 8 with 0≤x≤1; 0≤y≤1; 0≤z≤0.5 and 0≤x+y+z≤1, a lamellar oxide, a lamellar perovskite, a lamellar phosphate, a lamellar sulfide, a lamellar halide, a lamellar carbide and mixtures thereof.

6. The deposition process as claimed in claim 1 , in which the substrate is an organic substrate or an inorganic substrate.

7. The deposition process as claimed in claim 6 , in which the organic substrate is chosen from a polymer, biological material, an organic semiconductor and an organic light-emitting diode.

8. The deposition process as claimed in claim 6 , in which the inorganic substrate is chosen from a ceramic, an aluminum oxide, a silicon substrate, a semiconductor material, a metal and a light-emitting diode.

9. The deposition process as claimed in claim 1 , in which the neutral surfactant is a compound of formula (PEO) w -(PPO) y -(PEO) z in which w is between 5 and 300 and y is between 33 and 300 and z is between 5 and 300, the charged lamellar compound is H 3(1-x-y-z) Li 3x Na 3y K 3z Sb 3 P 2 O 14 with 0≤x≤1; 0≤y≤1; 0≤z≤0.5 and x+y+z=1 and the substrate is a protein crystal.

10. The deposition process as claimed in claim 1 , in which steps a) to c) are repeated.

11. The deposition process as claimed in claim 1 , wherein the concentration of neutral surfactant before mixing with the charged lamellar compound is from 0.15 to 0.5 of the CMC of the neutral surfactant.

12. The deposition process as claimed in claim 1 , wherein the substrate comprises a protein or a protein crystal.

13. The deposition process as claimed in claim 1 , wherein steps a) to c) are repeated to form a multilayer film.

14. A process for analyzing a substrate onto which a film is deposited, comprising the steps of the process of depositing a film as defined in claim 1 and a step d) of analyzing the substrate onto which a film is deposited.

15. The process for analyzing a substrate onto which a film is deposited as claimed in claim 14 , wherein the analyzing comprises one or more of X-ray diffraction and neutron diffraction.

Assignees

• Commissariat Energie Atomique

Inventors

• Gabriel Jean Christophe
• Spano Monika
• Hami Fatima-Ezzahra

Classifications

• H10K2102/00

  Constructional details relating to the organic devices covered by this subclass · CPC title

• H10K85/701

  Langmuir Blodgett films · CPC title

• H10K85/324

  comprising aluminium, e.g. Alq3 · CPC title

• H10K85/40

  Organosilicon compounds, e.g. TIPS pentacene · CPC title

• H10K71/10

  Deposition of organic active material · CPC title