MOE-based illumination projector

US12313812B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12313812-B2
Application numberUS-202318307820-A
CountryUS
Kind codeB2
Filing dateApr 27, 2023
Priority dateSep 20, 2022
Publication dateMay 27, 2025
Grant dateMay 27, 2025

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

An optoelectronic apparatus includes an array of emitters configured to emit beams of optical radiation. An optical substrate is mounted over the array. An optical metasurface is disposed on the optical substrate and configured to collimate and split each of the emitted beams into a respective group of collimated sub-beams, and to direct the collimated sub-beams toward a target to form a pattern of spots on the target.

First claim

Opening claim text (preview).

The invention claimed is: 1. An optoelectronic apparatus, comprising: an array of emitters configured to emit beams of optical radiation, wherein each of the beams is emitted from the array along a respective first axis; an optical substrate mounted over the array; and an optical metasurface disposed on the optical substrate and configured to collimate and split each of the emitted beams into a respective group of collimated sub-beams centered on a respective second axis, and to direct the collimated sub-beams toward a target to form a pattern of spots on the target, wherein the optical metasurface is configured to implement an optical phase function that includes a tilt component having a tilt coefficient selected to apply a predefined angular tilt to each respective second axis relative to the respective first axis. 2. The optoelectronic apparatus according to claim 1 , and comprising a camera, which is configured to capture an image of the target over a given field of view, wherein the optical metasurface is configured to apply the angular tilt to each respective second axis so that the pattern of spots extends across the field of view. 3. The optoelectronic apparatus according to claim 1 , wherein the pattern of spots is formed over an area of the target, and wherein the apparatus comprises a camera, which is configured to capture an image of the target over a given field of view, and wherein the camera comprises a further optical metasurface configured to apply an angular tilt to the field of view of the camera so that the field of view covers the area over which the pattern of spots is formed. 4. The apparatus according to claim 1 , wherein the emitters comprise vertical-cavity surface-emitting lasers (VCSELs). 5. The optoelectronic apparatus according to claim 1 , wherein the optical metasurface comprises an arrangement of pillars of varying diameters, which are formed on a surface of the optical substrate. 6. The optoelectronic apparatus according to claim 5 , wherein the pillars comprise a semiconductor material. 7. The optoelectronic apparatus according to claim 6 , wherein the pillars comprise a metallic material. 8. The optoelectronic apparatus according to claim 1 , wherein the beams that are split by the optical metasurface are first beams, and the optical metasurface that splits the first beams is a first optical metasurface, and wherein the apparatus comprises a further array of emitters configured to emit second beams of optical radiation, and a second optical metasurface configured to diffuse the second beams and to direct the diffused second beams toward the target and to illuminate the target with flood illumination. 9. The optoelectronic apparatus according to claim 8 , and wherein the second optical metasurface is configured to focus and tilt the diffused second beams toward the target. 10. The optoelectronic apparatus according to claim 8 , wherein the first and second optical metasurfaces are both formed on the same optical substrate. 11. The optoelectronic apparatus according to claim 8 , and comprising a controller, which is configured to actuate the emitters selectively, so as to illuminate the target alternately with the pattern of spots and with the flood illumination. 12. A method for optical projection, comprising: driving an array of emitters to emit beams of optical radiation, wherein each of the beams is emitted from the array along a respective first axis; and using an optical metasurface, collimating and splitting each of the emitted beams into a respective group of collimated sub-beams centered on a respective second axis, and directing the collimated sub-beams toward a target to form a pattern of spots on the target, wherein the optical metasurface is configured to implement an optical phase function that includes a tilt component having a tilt coefficient selected to apply a predefined angular tilt to each respective second axis relative to the respective first axis. 13. The method according to claim 12 , and comprising capturing an image of the target over a given field of view, wherein applying the angular tilt comprises directing each respective second axis so that the pattern of spots extends across the field of view. 14. The method according to claim 12 , wherein directing the collimated sub-beams comprises forming the pattern of spots over an area of the target, and wherein the method comprises capturing an image of the target over a field of view of a camera using a further optical metasurface to apply an angular tilt to the field of view so that the field of view covers the area over which the pattern of spots is formed. 15. The method according to claim 12 , wherein the optical metasurface comprises forming an arrangement of pillars of varying diameters on a surface of an optical substrate. 16. The method according to claim 12 , wherein the beams that are split by the optical metasurface are first beams, and the optical metasurface that splits the first beams is a first optical metasurface, and wherein the method comprises driving a further array of emitters to emit second beams of optical radiation, and applying a second optical metasurface to diffuse the second beams and to direct the diffused second beams toward the target and to illuminate the target with flood illumination. 17. The method according to claim 16 , and wherein applying the second optical metasurface comprises focusing and tilting the diffused second beams toward the target. 18. The method according to claim 16 , wherein driving the array and the further array comprises actuating the emitters selectively, so as to illuminate the target alternately with the pattern of spots and with the flood illumination.

Assignees

Inventors

Classifications

  • G02B27/30Primary

    Collimators · CPC title

  • Projection of a pattern, viewing through a pattern, e.g. moiré · CPC title

  • made of crystals, e.g. rock-salt, semi-conductors (G02B1/08 takes precedence) · CPC title

  • having a vertical cavity · CPC title

  • G02B1/002Primary

    made of materials engineered to provide properties not available in nature, e.g. metamaterials · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US12313812B2 cover?
An optoelectronic apparatus includes an array of emitters configured to emit beams of optical radiation. An optical substrate is mounted over the array. An optical metasurface is disposed on the optical substrate and configured to collimate and split each of the emitted beams into a respective group of collimated sub-beams, and to direct the collimated sub-beams toward a target to form a patter…
Who is the assignee on this patent?
Apple Inc
What technology area does this patent fall under?
Primary CPC classification G02B27/30. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 27 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).