Curable composition, cured product and method for forming insulating film

US12312489B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12312489-B2
Application numberUS-202017632396-A
CountryUS
Kind codeB2
Filing dateJul 6, 2020
Priority dateAug 20, 2019
Publication dateMay 27, 2025
Grant dateMay 27, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A curable composition which enables the formation of a cured product having a low dielectric constant, low dielectric loss tangent, high heat resistance, good elongation and excellent tensile strength and which has excellent film forming properties; a cured product of the curable composition; and a method for forming an insulating film using the curable composition. This curable composition contains a modified maleimide compound, a radical generator and a thiol compound. The curable composition may contain a photo-radical generator as the radical generator. The curable composition may contain a protonic acid.

First claim

Opening claim text (preview).

The invention claimed is: 1. A curable composition comprising a modified maleimide compound (A), a radical generator (C), a thiol compound (D), and a protic acid (E), wherein the modified maleimide compound (A) has one or more groups represented by the following formula (a1): and, the group represented by the formula (a1) is bonded to a carbon atom in an aliphatic hydrocarbon group or an aromatic group in the modified maleimide compound (A), wherein R a01 and R a02 are each independently a hydrogen atom, an alkyl group having 1 or more and 6 or less carbon atoms, a cycloalkyl group having 3 or more and 8 or less carbon atoms, or an aryl group having 6 or more and 12 or less carbon atoms, and wherein the protic acid (E) is selected from the group consisting of formic acid, propionic acid, butyric acid, valeric acid, isovaleric acid, oxalic acid, phthalic acid, benzoic acid, salicylic acid, 4-hydroxybenzoic acid, lactic acid, citric acid, tartaric acid, malonic acid, malic acid, succinic acid, glycolic acid, glutamic acid, aspartic acid, maleic acid, caproic acid, caprylic acid, myristic acid, stearic acid, palmitic acid, pyruvic acid, ascorbic acid, adipic acid, phenol, 1-naphthol, 2-naphtholmethanesulfonic acid, methylphosphonic acid, ethylphosphonic acid, and phenylphosphonic acid. 2. The curable composition according to claim 1 , wherein the radical generator (C) comprises a photoradical generator (C1), and the curable composition is capable of being cured by exposure. 3. The curable composition according to claim 1 , wherein the modified maleimide compound (A) is a maleimide modified polyphenylene ether resin (A1-1). 4. The curable composition according to claim 1 , wherein the thiol compound (D) is a mercaptoalkanoate of a polyol having two or more hydroxyl groups. 5. The curable composition according to claim 4 , wherein the thiol compound (D) is 3-mercaptobutanoate of the polyol. 6. The curable composition according to claim 1 , wherein the curable composition is a multi-agent mixed curable composition consisting of two or more agents comprising a first agent comprising the modified maleimide compound (A) and a second agent comprising the thiol compound (D). 7. The curable composition according to claim 1 , wherein the curable composition is used to form an insulating film. 8. A cured product of the curable composition according to claim 1 . 9. A method for forming an insulating film comprising: coating the curable composition according to claim 1 on an insulating film formation place to form a coating film; and curing the coating film. 10. The method for forming an insulating film according to claim 9 , wherein the curable composition comprises a photoradical generator (C1) as a radical generator (C), and the coating film is cured by exposure. 11. The method for forming an insulating film according to claim 10 , wherein the exposure to the coating film is position-selectively carried out, and the method further comprises developing the exposed coating film with a developing solution.

Assignees

Inventors

Classifications

  • Reaction with unsaturated dicarboxylic acids or anhydrides thereof, e.g. maleinisation · CPC title

  • Lactonisation · CPC title

  • Imagewise removal using liquid means · CPC title

  • Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

  • with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

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What does patent US12312489B2 cover?
A curable composition which enables the formation of a cured product having a low dielectric constant, low dielectric loss tangent, high heat resistance, good elongation and excellent tensile strength and which has excellent film forming properties; a cured product of the curable composition; and a method for forming an insulating film using the curable composition. This curable composition con…
Who is the assignee on this patent?
Tokyo Ohka Kogyo Co Ltd
What technology area does this patent fall under?
Primary CPC classification C08G75/045. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 27 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).