Apparatus for and methods of combining multiple laser beams

US12298670B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12298670-B2
Application numberUS-202017779362-A
CountryUS
Kind codeB2
Filing dateOct 27, 2020
Priority dateNov 29, 2019
Publication dateMay 13, 2025
Grant dateMay 13, 2025

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Apparatus for and methods of combining multiple, i.e., two or more laser beams to reduce even to the point of elimination a transverse gap between the two or more beams caused, for example, by a space between a coating on a surface of the mirror and the edge of the mirror, or by optic geometry, is avoided.

First claim

Opening claim text (preview).

What is claimed is: 1. A gas discharge laser system comprising: a first laser chamber module adapted to generate a first beam of laser radiation; a second laser chamber module adapted to generate a second beam of laser radiation; and a beam combiner arranged to receive the first beam and the second beam and adapted to propagate the first beam and the second beam in a common direction, the beam combiner comprising a mirror and an actuator mechanically coupled to the mirror, the first beam of laser radiation initially travelling in a first direction and striking the mirror at a first location and the second beam of laser radiation initially travelling in a second direction at an angle to the first direction and striking the mirror at the first location, the actuator being arranged to rotate the mirror between a first position in which the mirror redirects the first beam of laser radiation to propagate in the common direction and a second position in which the mirror redirects the second beam of laser radiation to propagate in the common direction. 2. A gas discharge laser system as in claim 1 wherein the first direction is at an angle θ to the second direction and in which the actuator is adapted to rotate the mirror by an angle θ/2. 3. A gas discharge laser system as in claim 1 wherein the first laser chamber module is adapted to generate a first pulsed beam of laser radiation and the second laser chamber module is adapted to generate a second pulsed beam of laser radiation between pulses of the first pulsed beam of laser radiation and wherein the actuator is adapted to place the mirror in the first position during a pulse of the first pulsed beam of laser radiation and to place the mirror in the second position during a pulse of the second pulsed beam of laser radiation. 4. A gas discharge laser system comprising: a first laser chamber module adapted to generate a first beam of laser radiation; a second laser chamber module adapted to generate a second beam of laser radiation; and a mirror, wherein the mirror is configured to receive the first beam of laser radiation initially travelling in a first direction and striking the mirror at a first location and to receive the second beam of laser radiation initially travelling in a second direction at an angle to the first direction and striking the mirror at the first location, and the mirror has a first rotational orientation configured to reflect the first beam of laser radiation into a third direction and has a second rotational orientation configured to reflect the second beam of laser radiation into the third direction. 5. A gas discharge laser as in claim 4 further comprising an actuator mechanically coupled to the mirror and arranged to rotate the mirror between the first rotational orientation and the second rotational orientation. 6. A gas discharge laser system as in claim 4 wherein the first direction is at an angle θ with respect to the second direction and wherein the mirror in the second rotational orientation is rotated by the angle θ/2 from the first rotational orientation. 7. A gas discharge laser system as in claim 4 wherein the first laser chamber module is adapted to generate a first pulsed beam of laser radiation and the second laser chamber module is adapted to generate a second pulsed beam of laser radiation between pulses of the first pulsed beam of laser radiation and wherein the mirror is adapted to be in the first rotational orientation during a pulse of the first pulsed beam of laser radiation and the mirror is adapted to be in the second rotational orientation during a pulse of the second pulsed beam of laser radiation. 8. A laser system comprising: a first source of laser radiation adapted to generate a first beam of laser radiation traveling along a first linear path; a second source of laser radiation adapted to generate a second beam of laser radiation traveling along a second linear path; and a mirror capable of alternating between a first rotational orientation and a second rotational orientation, wherein the mirror is configured to receive the first beam when the mirror is in the first rotational orientation and is configured to receive the second beam when the mirror is in the second rotational orientation such that the first beam is reflected by the mirror to travel along a third linear path and the second beam is alternately reflected by the mirror to travel the linear third path. 9. A gas discharge laser as in claim 8 further comprising an actuator mechanically coupled to the mirror and arranged to dither the mirror between the first rotational orientation and the second rotational orientation. 10. A laser system as in claim 8 wherein the first linear path is at an angle θ with respect to the second linear path and wherein second rotational orientation is rotated by an angle θ/2 from the first rotational orientation. 11. A laser system as in claim 8 wherein the first source of laser radiation is adapted to generate a first pulsed beam of laser radiation and the second laser chamber source is adapted to generate a second pulsed beam of laser such that pulses of the first pulsed beam and pulses of the second pulsed beam alternately strike the mirror, and wherein the mirror is in the first rotational orientation when struck by pulses of the first pulsed beam of laser radiation and the mirror is in the second rotational orientation when struck by pulses of the second pulsed beam of laser radiation. 12. A gas discharge laser as in claim 11 further comprising an actuator mechanically coupled to the mirror and arranged to dither the mirror between the first rotational orientation and the second rotational orientation.

Assignees

Inventors

Classifications

  • emitting at different wavelengths · CPC title

  • comprising an excimer or exciplex · CPC title

  • Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction · CPC title

  • by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control · CPC title

  • by lasers · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US12298670B2 cover?
Apparatus for and methods of combining multiple, i.e., two or more laser beams to reduce even to the point of elimination a transverse gap between the two or more beams caused, for example, by a space between a coating on a surface of the mirror and the edge of the mirror, or by optic geometry, is avoided.
Who is the assignee on this patent?
Cymer LLC
What technology area does this patent fall under?
Primary CPC classification G03F7/70025. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 13 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).