Solid oxide cell stack with a pressure difference between anode and cathode compartments

US12288913B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12288913-B2
Application numberUS-202017640001-A
CountryUS
Kind codeB2
Filing dateOct 7, 2020
Priority dateOct 28, 2019
Publication dateApr 29, 2025
Grant dateApr 29, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A SOC stack has interconnects with a maximum distance between the contact points which are designed to compensate for pressure difference between one side of the interconnect to the other side.

First claim

Opening claim text (preview).

What is claimed is: 1. Solid Oxide Cell stack, comprising a plurality of stacked cell units, each unit comprises a solid oxide cell in a cell layer and an interconnect in an interconnect layer, wherein one interconnect layer separates one cell layer from the adjacent cell layer in the cell stack, each interconnect comprises one or more protruding contact areas on a first side and one or more second protruding contact areas on a second side of the interconnect adapted to provide mechanical and electrical contact between the solid oxide cells, wherein each solid oxide cell has a high-pressure side facing the first side of an adjacent interconnect and a low-pressure side facing a second side of an adjacent interconnect and wherein a maximum distance between two adjacent edges of the contact areas on the first side of the interconnects is larger than the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects, and wherein the maximum distance between the two adjacent edges of the contact areas on the second side of the interconnects does not exceed 2.5 mm. 2. Solid Oxide Cell stack according to claim 1 , wherein the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects is 2.0 mm. 3. Solid Oxide Cell stack according to claim 1 , wherein the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects is 1.8 mm. 4. Solid Oxide Cell stack according to claim 1 , wherein the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects is 1.5 mm. 5. Solid Oxide Cell stack according to claim 1 , wherein the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects is 1.2 mm. 6. Solid Oxide Cell stack according to claim 1 , wherein the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects is 1.0 mm. 7. Solid Oxide Cell stack according to claim 1 , wherein the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects is 0.9 mm. 8. Solid Oxide Cell stack according to claim 1 , wherein the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects is 0.8 mm. 9. Solid Oxide Cell stack according to claim 1 , wherein the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects is 0.7 mm. 10. Solid Oxide Cell stack according to claim 1 , wherein the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects is 0.6 mm. 11. Solid Oxide Cell stack according to claim 1 , wherein the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects is 0.5 mm. 12. Solid Oxide Cell stack according to claim 1 , wherein the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects is 0.4 mm. 13. Solid Oxide Cell stack according to claim 1 , wherein the maximum distance between two adjacent edges of the contact areas on the second side of the interconnects is 0.3 mm. 14. Solid Oxide Cell stack according to claim 1 , wherein an area of each of the interconnects is between 15 cm 2 and 10000 cm 2 . 15. Solid Oxide Cell stack according to claim 1 , wherein the solid oxide cells are ceramic cells. 16. Solid Oxide Cell stack according to claim 1 , wherein the interconnects comprise one or more intermediate contact enhancing layers. 17. Solid Oxide Cell stack according to claim 1 , wherein the Solid Oxide Cell stack is a Solid Oxide Electrolysis cell stack. 18. Solid Oxide Cell stack according to claim 1 , wherein the pressure difference between the high-pressure side and the low-pressure side is minimum 300 mBar. 19. Solid Oxide Cell stack according to claim 1 , wherein the pressure difference between the high-pressure side and the low-pressure side is minimum 1 Bar. 20. Solid Oxide Cell stack according to claim 1 , wherein at least one of the first protruding contact areas aligns with at least one of the second protruding contact areas.

Assignees

Inventors

Classifications

  • characterised by grooves, e.g. their pitch or depth · CPC title

  • H01M8/0254Primary

    corrugated or undulated · CPC title

  • H01M8/0247Primary

    characterised by the form (characterised by a channel configuration H01M8/0258) · CPC title

  • Oxides · CPC title

  • Fuel cells with solid oxide electrolytes · CPC title

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What does patent US12288913B2 cover?
A SOC stack has interconnects with a maximum distance between the contact points which are designed to compensate for pressure difference between one side of the interconnect to the other side.
Who is the assignee on this patent?
Haldor Topsoe As, Topsoe As
What technology area does this patent fall under?
Primary CPC classification H01M8/0254. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 29 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).