Deposition mask, deposition device, deposition method, and deposition mask manufacturing method
US-10090467-B2 · Oct 2, 2018 · US
Mask assembly, deposition apparatus including the same, and fabricating method of the mask assembly
US12286700B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12286700-B2 |
| Application number | US-202318122644-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 16, 2023 |
| Priority date | Sep 27, 2016 |
| Publication date | Apr 29, 2025 |
| Grant date | Apr 29, 2025 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A mask assembly includes: a mask frame; a mask supported by the mask frame, the mask including a plurality of pattern holes; and a magnetic part disposed on one surface of the mask. The magnetic part provides a magnetic force between the mask and a target substrate and improves an adhesion between the mask and the target substrate to prevent deposition defects.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for fabricating a mask assembly, the method comprising: forming a mask having a plurality of pattern holes arranged in a matrix form, the mask comprising: a first rib, and a second rib forming a plurality of intersection portions with the first rib; disposing a magnetic part on a surface of the mask; and magnetically adhering the mask onto a mask frame, wherein the magnetic part is positioned at only each of the plurality of intersection portions of the first rib and the second rib, an outline of the magnetic part is spaced apart from the plurality of pattern holes surrounded by the first rib and the second rib on a plane, the magnetic part has a first pitch along a first direction and a second pitch along a second direction intersecting the first direction with reference to the plurality of pattern holes, and the magnetic part comprises a magnetic particle and a resin. 2. The method of claim 1 , wherein the disposing of the magnetic part comprises: disposing a solvent mixture comprising the magnetic particle and the resin on the surface of the mask; and curing the solvent mixture. 3. The method of claim 2 , wherein the magnetic particle is formed by coating a ferromagnetic material on a plastic particle.
Assignees
Inventors
Classifications
using selective deposition, e.g. using a mask · CPC title
Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title
Coating on selected surface areas, e.g. using masks · CPC title
Vacuum evaporation · CPC title
Crucibles for source material (C23C14/28, C23C14/30 take precedence) · CPC title
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Frequently asked questions
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- What does patent US12286700B2 cover?
- A mask assembly includes: a mask frame; a mask supported by the mask frame, the mask including a plurality of pattern holes; and a magnetic part disposed on one surface of the mask. The magnetic part provides a magnetic force between the mask and a target substrate and improves an adhesion between the mask and the target substrate to prevent deposition defects.
- Who is the assignee on this patent?
- Samsung Display Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Apr 29 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).