Noble gas hydride, fuel, and method for producing noble gas hydride

US12286348B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12286348-B2
Application numberUS-202017624939-A
CountryUS
Kind codeB2
Filing dateJul 6, 2020
Priority dateJul 5, 2019
Publication dateApr 29, 2025
Grant dateApr 29, 2025

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An embodiment of the present invention provides a noble gas hydride having the following formula 1: Ng n H m . In formula 1, Ng represents a noble gas atom, n represents an integer from 1-8, and m represents an integer from 1-46.

First claim

Opening claim text (preview).

The invention claimed is: 1. A noble gas hydride selected from the group consisting of: HeH m where m represents an integer of from 1 to 4, NeH m where m represents an integer of 1 or 2, and ArH m where m represents an integer of from 1 to 4. 2. A fuel or a noble gas hydride releasing material for releasing a noble gas hydride according to claim 1 . 3. A method for producing a noble gas hydride according to claim 1 , comprising: (a) bringing a surface of a metal or a metal oxide into contact with a noble gas to perform at least one of adsorption of noble gas atoms to the surface or occlusion of noble gas atoms into an interior of the metal or the metal oxide, and (b) bringing the noble gas atoms present at at least one of the surface or the interior into contact with hydrogen atoms under a temperature condition of from 50 K to 298 K; (c) bringing a metal or a metal oxide into contact with a hydrogen-containing gas under a temperature condition of from 50 K to 298 K to allow hydrogen atoms to be present at at least one of a surface or an interior of the metal or the metal oxide, and (d) bringing the hydrogen atoms present at the metal or the metal oxide into contact with a noble gas; or (e) supplying both a hydrogen-containing gas and a noble gas to a surface of a metal or a metal oxide; and (f) bringing hydrogen atoms and noble gas atoms into contact on the surface of the metal or the metal oxide under a temperature condition of from 50 K to 298 K. 4. The method for producing a noble gas hydride according to claim 3 , wherein, in (b), the hydrogen atoms are produced by bringing the metal or the metal oxide into contact with a hydrogen-containing gas. 5. The method for producing a noble gas hydride according to claim 3 , wherein the metal or a metal of the metal oxide comprises at least one of nickel, copper, or palladium. 6. The method for producing a noble gas hydride according to claim 3 , wherein the noble gas atom is helium, neon, argon, krypton, or xenon. 7. The method for producing a noble gas hydride according to claim 3 , comprising heating the metal or the metal oxide before or after contact between noble gas atoms or a noble gas and hydrogen atoms, or simultaneously with contact between noble gas atoms or a noble gas and hydrogen atoms. 8. The noble gas hydride releasing material according to claim 2 , which releases a noble gas hydride by temperature elevation. 9. The noble gas hydride releasing material according to claim 8 , wherein the material is a metal or a metal oxide, and the metal or a metal of the metal oxide comprises at least one of nickel, or palladium.

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Classifications

  • Hydrogen storage · CPC title

  • Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen; Reversible storage of hydrogen (production of water-gas or synthesis gas from solid carbonaceous material C10J) · CPC title

  • Noble gases; Compounds thereof (liquefying F25J {; noble gases obtained by rectification F25J3/028}) · CPC title

  • Compounds of noble gases · CPC title

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What does patent US12286348B2 cover?
An embodiment of the present invention provides a noble gas hydride having the following formula 1: Ng n H m . In formula 1, Ng represents a noble gas atom, n represents an integer from 1-8, and m represents an integer from 1-46.
Who is the assignee on this patent?
Univ Tokyo Science Found
What technology area does this patent fall under?
Primary CPC classification C01B23/0005. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 29 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).